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Advantages Over Existing Trivalent

Chromium Chemistries:

Lower Carbon in deposit alloy, maintaining color stability over time

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Eliminates the need for numerous additives, complexing agents, and chelation chemistry

No post dip required

Up to 0.5 microns thickness, provides a uniform bright deposit that closely matches Hex deposit color.

Easily deposits over Electroless Nickel (NiP alloys) providing greater application development and improved corrosion performance for complex shape geometries

Easier to operate, process provides a self-regulating pH system, similar to a Hex process

Anodes do not require membranes

Easily deposits over brass substrates, eliminating the need for Nickel in certain applications

Provides a wider range of operational parameters versus existing Trivalent systems on the market

Eliminates need for costly ion exchange resins and equipment required for most aqueous trivalent solutions on the market

Higher cathode efficiencies and higher plating throughput equates to lower cost

Eliminates creation of hexavalent chromium by-product often experienced with aqueous trivalent chemistry systems

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