Global Rapid Thermal Processing Equipment Market 2015-2019
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Summary ď ś Manufacture of semiconductors involves semiconductor silicon wafer production, wafer processing, assembly, and testing. Rapid thermal processing refers to the heating of silicon wafers to temperatures above 2,192 degree Fahrenheit within seconds to attain nitridation, dopant activation, metal reflow, thermal oxidation, and chemical vapor deposition within the silicon wafers of a semiconductor. Silicon wafers are heated using either lamps or lasers. Rapid thermal processing equipment offers advantages such as lower power consumption and cost savings. Rapid thermal annealing equipment is used to activate dopants in the wafer and for interfacial reaction of metal contacts.
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Key Regions • Americas • APAC • EMEA
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Key vendors
• Applied Materials • Hitachi Kokusai Electric • Mattson Technology • Screen Holdings • Ultratech
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Companies Mentioned • • • • • • • • • •
Applied Materials, Hitachi Kokusai Electric, Mattson Technology, Screen Holdings, Ultratech , AG Associates, AnnealSys, Jilepec, Modular ProcessTechnology, SemiTEq
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Contact: debora@reportstack.com Reportstack Market Research