晶硅太阳能电池 by Pixelstein GmbH & Co KG

Crystalline Solar Cells Production Equipment

晶硅太阳能电池生产设备

SINGULUS TECHNOLOGIES Developer, Enabler and Supplier for the PV Market 是光伏市场的开发者、推动者及供应商。

PRODUCTION EQUIPMENT for Crystalline Solar Cells

晶硅太阳能电池生产设备

SINGULUS TECHNOLOGIES

SINGULUS TECHNOLOGIES is a supplier of manufacturing solutions and production equipment for the markets Optical Disc, Semiconductor and Solar. With new machine concepts and manufacturing processes in the crystalline and thin-film solar technology SINGULUS TECHNOLOGIES establishes itself as development partner and equipment supplier for investments in new high-performance solar cell concepts. As market leader for Optical Disc production systems we have gained extensive know-how in vacuum coating, automation, and process integration.

德国新格拉斯科技集团为光盘、半导体和太阳能电池提供生产解决方案和生产设备。凭借晶硅和薄膜太阳能科技领域新颖的设备概念和生产工艺，德国新格拉斯科技集团成为高性能太阳能电池新概念的领先开发伙伴和设备供应商。作为光盘生产系统的领头羊，集团在真空镀膜、自动化和工艺整合方面积累了广泛的技术经验。

SINGULUS TECHNOLOGIES cooperates with cell manufacturers worldwide and develops processes which improve the efficiency of solar cells and at the same time reduce production costs. Evolutionary improvement in cell concepts like PERC or PERT, n-type material, IBC cell or heterojunction cells will drive the future of crystalline solar cells. Production of PERC Solar Cells →→ Single side polish etch with LINEA II →→ Rear side passivation with SINGULAR XP →→ PERCEUS Production Package for PERC solar cells Other process applications improving cell performance →→ LINEA II parasitic emitter etching and edge isolation →→ LINEA II isotexture or PSG removal →→ Wet process equipment for poly silicon chunk etching, cleaning & drying – MATERIA →→ ICP-PECVD coating equipment – SINGULAR →→ IPA-free wet process equipment – SILEX →→ Evaporator for metallization of high-efficiency solar cells →→ Low-cost and high-efficient cleaning process (Upgrade SILEX with Ozone) →→ Complete production lines – SOLARE

德国新格拉斯科技集团携手世界各地的电池制造商共同改进生产工艺，在提高太阳能电池效率的同时降低生产成本。电池概念方面的进展，如PERC/ PERT、N型材料、全背面接触式电池或异质结太阳电池将推动晶硅太阳能电池的未来。 PERC太阳能电池的生产 →→ LINEA II单面抛光腐蚀 →→ SINGULAR XP的背面钝化 →→ PERC太阳能电池的PERCEUS综合生产设备其它提高电池性能的流程应用程序 →→ LINEA II寄生发射极蚀刻与边缘绝缘处理 →→ LINEA II均匀制绒或去磷硅玻璃（PSG）清洗 →→ 用于硅块蚀刻、清洁与干燥的湿处理设备– MATERIA →→ ICP-PECVD镀膜设备– SINGULAR →→ 无异丙醇（IPA）的湿法处理– SILEX →→ 用于高效太阳能电池金属蒸镀的蒸发设备 →→ 低成本及高效能的清洁过程（用臭氧升级 SILEX） →→ 完整生产线– SOLARE

MATERIA PCE/OCC Poly Silicon Chunk Etching, Cleaning & Drying 用于硅块蚀刻、清洁与干燥的湿处理

SINGULUS TECHNOLOGIES developed a new machine concept with the product name MATERIA PCE/OCC for the cleaning of Si chunks, Si-Off-Cuts and ingot saw off cuts for the manufacturing of crystalline solar cells. The first MATERIA cleaning machine was delivered to a renowned US customer. The system was successfully installed at the customer’s site in the 1st quarter 2012. In the MATERIA, silicon is cleared of interfering particles, organic and metallic contaminations. With state-of-the-art technology, the fully automated and intelligent carrier management, which is operating in the absence of manual labor, achieves a maximum throughput with reductions of operators. With very good process results, the efficient process steps and the economical use of water and chemical substances as well as the low energy consumption reduce the cost of operation compared with the traditionally available machines.

德国新格拉斯科技集团为清洁晶硅太阳能电池生产所留下的硅块、硅下脚料和切锭锯下脚料而开发了一种新的设备概念，产品名为MATERIA 。第一台 MATERIA 清洁设备交付给了一家知名美国客户。该系统于2012年第一季度在客户现场成功安装。 MATERIA设备可以去除硅的干扰颗粒、有机和金属污染。先进全自动的智能硅片承载器管理技术无需人工操作，从而在减少操作员的同时最大程度地提高产量。优异的工艺结果、高效的工序以及对水、化学试剂和能源更低的消耗使得运营成本与传统设备相比大大降低。

Main Features MATERIA PCE/OCC

主要特点

→→ Surface cleaning & metal removal →→ Revolving barrel system →→ Smart DI rinse system →→ Clean, spot free & dry chunks →→ Excellent process results (metal values sufficiently lower than competitors)

→→ 表面清洁及去除金属 →→ 转筒系统 →→ 智能DI清洗系统 →→ 洁净、无污点的干燥硅块 →→ 优异的加工结果（金属含量显著低于竞争对手）

GERULUS Wafer Block Pre-Clean & Deglue System 硅晶片预清洁及脱胶系统

Virtually all silicon based wafers are cut by wire saw technology. The SINGULUS Pre-clean & Deglue system processes the wafers after being cut. This includes removal of slurry as well as degluing the wafers from their carrier beam. The GERULUS system can be configured in a wide range to adapt to all kinds of slurry and glue types. To guarantee lowest possible water and surfactant consumption, the system can be equipped with a water & SiC recycling system.

几乎所有硅晶片都是通过线锯来切割的。德国新格拉斯科技集团的预清洁及脱胶系统对切割后的硅晶片进行了加工。其中包括去除泥浆，并将硅晶片从其承载器上脱胶。 GERULUS 系统可通过多种配置方式来处理任何泥浆和胶水型号。为保证水与表面活性剂的消耗量达到最低，该系统可以配置一台水与碳化硅循环系统。

Main Features

主要特点

→→ Patented wafer block cleaning →→ Proven, highly integrated design →→ High throughput up to 7,200 wph →→ Built for non-stop utilization: 24/7, 360 days/year →→ High availability (uptime > 95 %) →→ Sophisticated pre-cleaning concept for best process results and minimal process times →→ Compliance with international safety regulations

→→ 专利硅晶片清洁 →→ 高度集成的成熟设计 →→ 高达7,200 wph的产量 →→ 适合不间断使用： 24小时/7天，360天/年 →→ 高可靠性（稼动率> 95 %） →→ 尖端的预清洁概念实现了最佳加工结果和最少的加工时间 →→ 符合国际安全规定

9 8

7 6 1

1 Transport cart 2 Input buffer 3 Pre clean-bath 4 Deglue chamber 5 Output buffer 6 Installation area 7 Waste water pump stations (optional) 8 Hot DI water station (optional) 9 Surfactant dosage 10 Dirt and pure water tanks 11 Centrifuge

1 运输车 2 输入缓冲区 3 预清洗-浸洗 4 除胶室 5 输出缓冲区 6 安装区域 7 废水泵站（自选） 8 去离子热水站（自选） 9 表面活性剂用量 10 污水与净水水箱 11 离心机

SILEX II Create the Wet Process Equipment to your own Specification with Standard Modules! 为不同规格的标准模块量身定做湿法处理设备

SINGULUS TECHNOLOGIES provides complete automated dry-in/dry-out solutions for wetchemical treatment of Si-wafers in standard and high-efficiency cell lines. The modular SILEX II batch system offers a wide range of process options. With respect to highest flexibility in configuration, the new generation of the SILEX II machines is characterized by a clear modular design and compact footprint. The SILEX II machine concept fulfill current and future requirements of capacity, flexibility, and stability for mass production. The basic SILEX II system achieves an output of up to 3,000 wph, upscaling of batch size will cover tool capacity up to 6,000 wph, running with very low scrap rates down to 0.01 % and high process yield. Processing wafer with thickness down to 120 μm, the system is in advance to the newest SEMI roadmap guidelines.

德国新格拉斯科技集团为标准及高效电池生产线上硅晶片的化学处理提供完整的干进/干出解决方案。 SILEX II间歇式设备提供各种各样的加工选项。为了实现设计构型的最高灵活性，新一代的SILEX II设备采用了透明模块化设计，占地空间紧凑。SILEX II设备概念满足了目前和未来大规模生产对于产能、灵活性和稳定性的需求。基本版SILEX II系统能实现高达3,000 wph的产量，进一步扩大工作台尺寸后可达到6,000 wph的产量，同时保证低于0.01 %废品率以及较高的工艺出品率。该设备能处理薄至120 μm的硅晶片，在前端电池工艺中领先于最新的SEMI光伏发展蓝图指导文件。

SILEX II – Create the Wet Process Equipment to your own Specification with Standard Modules 为不同规格的标准模块量身定做湿法处理设备

The core of the current and future batch process applications is the alkaline texturing process of mono-crystalline silicon, generating pyramidaletched surfaces with optimal light trapping, passivation and contacting properties. The SILEX II ALTEX machine is designed to apply IPA-free texturing processes, offering substantial cost advantages compared to traditional etching systems. This texturing process completely refrains from using flammable, volatile solvents such as Isopropanol (IPA) and enables a stable, wetchemical texturing process for silicon wafers. Based on commercially available chemicals the process is adjustable to the individual requirements of standard and advanced cell technology.

目前和未来的批量加工应用的核心在于单晶硅的碱性制绒加工，通过优化工艺生成的角锥形蚀刻表面具有最适宜的陷光性和接触性。 SILEX II ALTEX设备应用了无异丙醇制绒工艺，较之传统蚀刻系统，能显著节省成本。这一制绒工艺完全不使用异丙醇（IPA）之类的易燃、挥发性溶剂，而是根据标准和先进电池技术各自的需求采用市场有售的添加剂来对硅晶片进行湿法化学制绒加工。

SILEX II SDE LOAD

CLEAN / ETCH / RINSE

CLEAN / RINSE

ETCH / RINSE

DRY

UNLOAD

SILEX II ALTEX LOAD

CLEAN / RINSE

DRY

UNLOAD

SILEX II CLEANTEX LOAD

CLEAN / ETCH / RINSE

ETCH / RINSE

SILEX II CLEAN LOAD

CLEAN / RINSE

DRY

SILEX II C-CLEAN LOAD

CLEAN / RINSE

DRY

UNLOAD

CLEAN / RINSE

DRY

UNLOAD

SILEX II – Create the Wet Process Equipment to your own Specification with Standard Modules 为不同规格的标准模块量身定做湿法处理设备

The second pillar of wet batch process applications in front-end cell production are wet cleaning processes. Advanced cleaning steps are going to become an indispensable part of existing present and future cell lines as a key for further improvement of cell performance and cost reduction. Ozonebased cleaning operations, applied on SILEX wet bench, combine efficient organic and metal removal with appropriate surface conditioning. Due to low chemical cost and consumption, simple process control, and high metal removal efficiency, ozonized acidic cleaning bathes are the perfect substitute for traditional, expensive multi-step RCA cleanings, known from semiconductor industry.

前端电池生产中湿法批量加工应用的第二大核心在于湿法清洗。在目前和未来电池生产线上，先进的清洁程序将成为不可或缺的一环，成为进一步提高电池性能和降低成本的关键所在。基于臭氧的清洁操作在SILEX湿台架上进行，在进行表面修整的同时能有效地去除有机和金属杂质。由于化学品的成本和消耗量较低，工艺控制简单且金属去除效率较高，根据半导体行业经验，臭氧化酸洗是传统工艺中昂贵的多步RCA清洗的理想替代品。

Main Features

主要特点

→→ Versatile batch tool platform for wet processes in clean technology →→ Flexible line configuration due to modular machine design (2/3/4/5-tank modules) →→ Individual process sequencing by flexible software structure →→ Advanced process control by onboard data-log and event tracking →→ Complete metal-free design of process tank systems →→ High throughput performance up to 3,000 wph →→ High uptime > 95 % →→ Low breakage rate down to 0.01 % →→ Wafer thickness down to 120 μm (post process) →→ Compact footprint with integrated switch boxes →→ Component kit prepared for batch size and capacity doubling →→ Integration of common and advanced cleaning, etching and drying processes →→ Upgradable by common and customized options →→ Designed for container shipment

→→ 多样化槽式湿法处理清洗工具平台 →→ 模块化设备设计(2/3/4/5罐式模块)灵活的生产线配置 →→ 凭借灵活的软件结构进行个性化工艺排序 →→ 通过机载数据日志和时间跟踪实现先进的工艺控制 →→ 完整的无金属工艺罐系统设计 →→ 高达3,000 wph的高产量 →→ 高稼动率> 95 % →→ 低至0.01%的破损率 →→ 硅晶片厚度薄至120 μm（加工后） →→ 集成开关盒，占地空间紧凑 →→ 用于扩大槽尺寸并实现产量翻倍的组件套件 →→ 集成常规和先进的清洁、蚀刻以及干燥工艺 →→ 可进行常规的和客户指定的升级 →→ 可用集装箱装运

LINEA II Inline Wet Process Equipment for Cleaning, Texturing and PSG Removal 用于清洁、制绒和清洗去磷硅玻璃的在线式湿法设备

SINGULUS TECHNOLOGIES provides complete automated dry-in/dry-out solutions for wet treatment of Si-wafers in standard and high-efficiency cell lines. Current and future market requirements of machines, processes, and materials for solar cell manufacturing sets new standards for cost reduction, productivity, process capability, and integrability of wet-chemical production. The ongoing evolution of proven concepts in process management and the integration of innovative approaches are the basis for the development of a new generation of horizontal etching systems. LINEA II is a horizontally working inline wet process platform for cleaning and etching of crystalline solar wafers. The SINGULUS LINEA II combines an advanced transportation system, sustainable and innovative processing modules with proven and efficient chemical etching and cleaning processes. In addition to proven processes like texture etching, PSG etching or RCA cleaning, the focus is on newer applications with one or two sides processes, such as polish etching, emitter etching, and ozonebased or ultrasonic cleaning respectively. The highly integrated design, high throughput, high availability, and low breakage rate make LINEA II attractive for solar cell manufacturers worldwide.

德国新格拉斯科技集团为标准及高效电池生产线上硅晶片的化学处理提供完整的干进/干出解决方案。当前和未来市场对于太阳能电池生产的设备、工艺以及材料的需求，为成本节约、生产能力、加工能力以及湿法化学生产的可集成性设定了新标准。工艺管理方面成熟概念的不断进步以及创新方式的集成为新一代蚀刻系统的开发奠定了基础。LINEA II是用来清洁和蚀刻晶体太阳能硅晶片的水平工作在线式湿法加工平台。德国新格拉斯科技集团的LINEA II将先进的运输系统、可持续的创新加工模块与成熟而有效的化学蚀刻和清洁工艺融为一体。除了制绒、去磷硅玻璃蚀刻或RCA清洁等成熟的工艺，该设备还侧重于较新颖的应用，涉及抛光蚀刻、发射极蚀刻和臭氧或超声清洁等单面或双面加工。高度集成的设计、高产能、高可靠性和低破损率使 LINEA II 获得世界各地的太阳能电池制造商青睐。

LINEA II – Inline Wet Process Equipment for Cleaning, Texturing and PSG Removal | 用于清洁、制绒和清洗去磷硅玻璃的在线式湿法设备

Main Characteristics

主要特点

Effective, Economical, Flexible

有效、经济、灵活

→→ Platform for all inline processes →→ From R&D tool to the fully integrated 10-lane facility →→ Uniform media flow on wafer surface →→ Consistant flow conditions from lane to lane →→ Economical because of small bath volumes and high wafer throughput →→ Fast media exchange on wafer surface →→ Fast discharging of process reaction products →→ Low exhaust volumes through intelligent airflow next to each wafer lane →→ Future-proof and flexible with modular process units →→ Easy integration of new or additional process options

→→ 所有在线式加工的平台 →→ 从研发工具到完全一体化的10通道设施 →→ 硅晶片表面上统一的介质流动 →→ 通道之间的流动条件稳定 →→ 由于腐蚀液用量小和高硅晶片产量高而实现经济节约 →→ 在硅晶片表面上实现快速介质交换 →→ 过程反应产品的快速排出 →→ 通过每条硅晶片通道旁的智能气流而降低排气量 →→ 适应于未来发展的灵活的模块化加工单元 →→ 方便集成新加的工艺选项

Controlled, Precise, Intelligent →→ Fully automated tool with integrated process control →→ Compact process chambers with innovative media and process management →→ Simple and robust „spider-chain“ wafer transport system without mechanical contacts on top side →→ Shadow-free contact of the wafer surfaces with the process media →→ Wafer tracking and wafer thickness measurement

Safe, Clean, User-Friendly →→ Safe for persons, environment, and in the process →→ Cleanroom compatible design according to ISO and SEMI standards →→ Friction-free, gentle wafer transport through the process media →→ Excellent accessibility of the process chamber from all sides through the separation of process and installation modules

控制、精确、智能 →→ 采用集成工艺控制的全自动工具 →→ 紧凑的加工室运用了创新介质和工艺管理 →→ 简单而牢固的“蜘蛛链条”硅晶片传输系统，正面无机械接触 →→ 硅晶片表面与加工介质的无暗影接触 →→ 硅晶片的跟踪和硅晶片厚度测量

安全、洁净、用户友好 →→ 在加工过程中，对操作员与环境都很安全 →→ 按照ISO和SEMI标准进行能兼容净化室的设计 →→ 通过加工介质进行无摩擦的温和硅晶片运输 →→ 通过将加工及安装模块分离，可方便地从各个侧面进入加工室

LINEA II – Inline Wet Process Equipment for Cleaning, Texturing and PSG Removal | 用于清洁、制绒和清洗去磷硅玻璃的在线式湿法设备

LINEA II – Standard and advanced production methods for crystalline solar cells

ISOTEX

Acidic SDE / Isotexturing

LOAD ISOTEX RINSE

PorSi

PSG

P-SiO2 -Glass / Removal

PSG-EE

P-SiO2 -Glass / Removal / Edge Isolation

US-Clean / Alkaline / Acidic

Polish Etching

RINSE CLEAN RINSE

DRY

LOAD

PSG ETCH

RINSE

DRY

RINSE

PSG ETCH

UNLOAD

LOAD

EMITTER RINSE ETCH

PorSi

RINSE

DRY

UNLOAD

LOAD

US RINSE CLEAN

US ACIDIC RINSE RINSE CLEAN CLEAN

DRY

UNLOAD

LOAD

POLISH RINSE ETCH

PorSi

DRY

UNLOAD

RINSE CLEAN RINSE

LINEA II – Single Side Polish Etch | 单面抛光蚀刻

LINEA II Single Side Polish Etch 单面抛光蚀刻 SINGULUS TECHNOLOGIES cooperates with cell manufacturers worldwide and develops processes which improve the efficiency of solar cells and at the same time reduce production costs. Evolutionary improvement in cell concepts like PERC or PERT, n-type material, IBC cell or heterojunction cells will drive the future of crystalline solar cells. Standard silicon solar cells have a textured front and rear side. In order to optimize the light trapping within the cell and the conditions for a good rear side passivation with local contacts, a planar rear surface is most suitable. The differently structured front and rear surfaces of the wafer make the implementation of a single side etching process step essential. For the market of silicon solar cells, SINGULUS presents a new production solution for rear side passivated silicon solar cells (e.g. PERC – Passivated Emitter and Rear Cell). This solution was developed especially for the upgrade of existing cell production lines. For the upgrade of a production line, three additional production steps, which SINGULUS offers solutions for, are required. Before coating the rear side is smoothed with a wet-chemical polish in a LINEA II Single Side Polish Etch machine. The dielectric passivation layer is emitted in the ICP-PECVD machine SINGULAR. For the rear side contacts through a laser process, SINGULUS is closely cooperating with a partner.With the integration of these additional production steps into existing manufacturing lines PERC cells with levels of efficiency of up to 20 % can be achieved. SINGULUS TECHNOLOGIES offers for R&D single lanes and machine versions up to 10 lanes for high throughput.

德国新格拉斯科技集团携手世界各地的电池制造商共同改进生产工艺，在提高太阳能电池的效率的同时降低生产成本。电池概念方面的进展，如PERC/ PERT，N型材料、全背面接触式电池或异质结太阳电池将推动晶硅太阳能电池的未来。标准的硅太阳能电池的采用正反面制绒。为了优化电池内的陷光并改善带有局部接触的背面钝化的条件，最适宜采用平坦的背面。硅晶片正面和背面的结构不同，因而有必要实施单面蚀刻工序。集团为硅太阳能市场推出了背面钝化硅太阳能电池的一种新生产方案（例如PERC——钝化发射极和钝化背面电池）。这一方案是专门为了升级现有电池生产线而开发的。为了按新格拉斯科技集团的方案升级生产线，需要增加三个生产工序。在镀膜之前，先用LINEA II 的单面抛光蚀刻设备，通过湿法化学抛光来抛光背面。这一电介质钝化层在 ICP-PECVD设备SINGULAR中进行放射。为了生产激光加工中的背面接触层，集团是与合作伙伴进行了密切合作。通过将附加的生产工序集成到现有生产线，可以将 PERC电池的效能提高20%。德国新格拉斯科技集团可为实验室研发和大规模生产分别提供单通道以及多达10通道的生产设备。

Linea II SSE-PE Technical Data Linea II SSE-PE (Standard Production Tool)

Lanes

Dimensions

Process Compartment: 9500 * 1800 * 1400 Media Compartment: 9500 * 1000 * 2200

Throughput

3600 wph

Wafer

156 mm; > 150 µm; mono, multi, mono-cast

Utilities

N2, CDA, DI-water, PCW, Tap Water HF, KOH, HCl, HF, HNO3, Additives Waste Drains Exhaust Electrical Power 400 VAC 3/PE

Main Characteristics

主要特点

Rear Polishing: →→ Increase of internal reflection →→ Reduction of surface defects →→ Reduction of recombination centres →→ longer carrier life time →→ Better passivation quality

背面抛光： →→ 增加内部反射 →→ 减少表面缺陷 →→ 减少复合中心 →→ 延长了少子寿命 →→ 提高了钝化质量

Tool: →→ Compact process chambers with innovative organisation of media and process →→ Simple and robust „spider-chain“ wafer transport system with no mechanical contact on top side →→ Shadow free contact of the wafer surfaces with process media →→ Friction-free, gentle wafer transport through process media →→ Excellent accessibility of the process chamber from all sides by the separation process and PSG SDE/TEXTURE DIFFUSION PECVD installing modules

工具 →→ 通过创新的介质和工艺安排而实现紧凑的加工室 →→ 简单而牢固的“蜘蛛链条”硅晶片传输系统，正面无机械接触 →→ 硅晶片表面与加工介质的无暗影接触 →→ 通过加工介质进行无摩擦的温和硅晶片运输 →→ 通过将加工及安装模块分离，可方便地从各个侧面进入加工室

SDE/TEXTURE

PSG

DIFFUSION

LINEA II Single Side Polish Etch

PECVD

SDE/TEXTURE

SINGLE SIDE POLISH

SDE/TEXTURE

DIFFUSION

PRINTING

FIRING

SINGULAR XP Rear Side Passivation

▼ PERCEUS Upgrade Package for PERC Cells

PRINTING

Laser Contact

▼ DIFFUSION

PSG

▼

PSG EE

REAR PECVD

FRONT PECVD

LCO

PRINTING

FIRING

SINGLE SIDE POLISH/ CLEANING

REAR PECVD

FRONT PECVD

LCO

PRINTING

FIRING

SINGULAR XP The innovative SINGULAR XP tool is based on static inline production, which combines the advantages of inline substrate transport and static processing. 创新的SINGULAR XP工具基于静态在线式生产，集在线式衬底传输和静态加工的优点于一身。

SINGULAR XP Fully automized ICP-PECVD Production Platform

SINGULAR XP 全自动 ICP-PECVD生产平台

SINGULAR XP ICP-PECVD is a fully automated innovative and modular PECVD coating tool for the mass production of crystalline silicon solar cells. In addition, SINGULAR is increasingly being applied for the development of passivation layers for high-efficiency solar cells following conventional and new cell concepts. Thereby, the coating system meets the demands for both current and future PV cell production.

SINGULAR XP ICP-PECVD是一种全自动的创新模块化PECVD镀膜工具，适用于晶硅太阳能电池的大规模生产。此外，SINGULAR正越来越多地应用于适用于高效太阳能电池钝化层的开发，不论电池是采用传统的还是新的电池概念。借此，镀膜设备同时满足了当前和未来光伏电池生产的需求

The SINGULAR system provides an automation module and a coating module. The coating module consists of several customizable vacuum chambers.

创新的SINGULAR工具以静态在线式生产为基础，集在线式衬底传输和静态加工的优点于一身。它方便了复杂膜层的镀膜，例如AlOx/SiNy等不同材料的堆积。这一工具的关键特点在于ICP-PECVD 技术。电感耦合等离子体（ICP）的激发可以在高沉积速度下完美控制SiNx、AlOx、 SiOxNy等各种材料的膜层性能。

The innovative SINGULAR tool is based on static inline production which combines the advantages of inline substrate transport and static processing. It allows the coating of complex layers, such as layer stacks of different materials e. g. AlOx/SiNy. The key feature of the tool is the ICP-PECVD technology. The inductively coupled plasma (ICP) excitation allows ideal control of film properties for various materials such as SiNx, AlOx, SiOxNy at high deposition rates. The process variability, the small tool footprint in combination with an excellent total ”Cost Of Ownership“ makes SINGULAR ideally suitable for upgrades of existing production lines. SINGULAR allows developing new manufacturing processes for cell efficiencies above 20 % on proven production platforms. Therewith, SINGULUS makes a valuable contribution to continuous improvements with respect to efficiency and manufacturing cost of PV modules, being a necessity to reduce the costs and enable the largescale deployment of PV electricity.

SINGULAR系统具有自动化模块和镀膜模块。镀膜模块由多个可定制的真空腔组成。

工艺的多样性，较小的工具占地面积，再加上低廉的总体“购置成本”，使得SINGULAR成为为现有生产线实现升级换代的理想之选。SINGULAR有助于开发新的制造工艺，使成熟生产平台生产的电池效能提高至20 %以上。新格拉斯集团通过该系统为持续提升光伏模块的效能和降低其制造成本做出了宝贵贡献。而这二者正是降低光伏度电成本并实现大规模发电的前提条件。

SINGULAR XP Fully Automized ICP-PECVD Production Platform 全自动ICP-PECVD生产平台 Main Characteristics

主要特点

→→ Industrial proven multi-chamber ICP-PECVD coating tool →→ Lowest cost of ownership →→ Modular design for various processes (e. g. SiNx, SiOxNy, AlOx, a-Si …) →→ Single- and multi-layer capability →→ Double-side coating capability →→ Small footprint →→ Integrated electrical and gas cabinets →→ Efficient use of raw materials like electrical power, process gases … →→ Low noise level (no grey room necessary) →→ High uptime →→ Easy to operate →→ Easy to maintain →→ Inline cleaning processes available (e. g. for a-Si) →→ Customized tool configuration, e. g. usage of special gases e. g. TMB, phosphine, organic precursors like TMAl →→ Integrated automation solution →→ Inline and cluster operation possible →→ All types of automation cassettes suitable

→→ 业内成熟的多腔ICP-PECVD镀膜工具 →→ 低廉的购置成本 →→ 适合多种工艺的模块化设计（如SiNx、 SiOxNy、AlOx、 a-Si …） →→ 单层和多层镀膜能力 →→ 双面镀膜能力 →→ 占地面积小 →→ 电器柜与气体柜集成于设备之中 →→ 有效利用电力、加工气体等原材料 →→ 低噪音（无需灰区） →→ 工作时间长 →→ 便于操作 →→ 便于维修 →→ 在线式清洁工序（例如清洁a-Si） →→ 定制工具配置，如使用TMB、磷化氢等特别气体，TMAl 等有机前驱体 →→ 集成的自动化解决方案 →→ 可进行在线式集群操作 →→ 可使用各类自动片架盒

Standard Configuration

singular xp for Rear Side Passivation PECVD SiNy

PECVD Process Station 3

PECVD Process Station 2

PECVD Process Station 4

IR-Process Station 1

PECVD Process Station 5

Load Lock

PECVD AlOx

IR-Station

PECVD SiNy

PERCEUS Production Package for PERC Solar Cells PERC太阳能电池综合生产设备 PERCEUS Up to 1 % Improvement of Cell Performance with LINEA/SINGULAR Rear Passivation & Laser Contact Opening In order to make the manufacturing of silicon photovoltaic modules competitive, a further reduction of the production costs with an increase of the efficiency at the same time is required. SINGULUS presents PERCEUS, a new production solution for rear side passivated silicon solar cell. PERCEUS was developed to upgrade existing cell production lines to manufacture PERC-type silicon solar cells (PERC – Passivated Emitter and Rear Cells).

PERCEUS 通过LINEA/SINGULAR背面钝化与激光开口为了提升硅光伏模块生产的竞争力，需要在提高效率的同时进一步降低成本。德国新格拉斯科技集团为背面钝化硅太阳能电池的生产推出了一种新的方案—— PERCEUS。PERCEUS的开发目的在于为制造 PERC型硅太阳能电池（PERC——钝化发射极和钝化背面电池）而对现有电池生产线进行升级。

SINGULUS TECHNOLOGIES offers additional process steps for the production upgrade PERCEUS. A wet-chemical process step polishes the rear side of the cell using a LINEA II Single Side Polish

SDE/TEXTURE

DIFFUSION

PSG

PECVD

SDE/TEXTURE

DIFFUSION

PSG

PECVD

LINEA II Single Side Polish Etch

SDE/TEXTURE

SINGLE SIDE POLISH

SDE/TEXTURE

DIFFUSION

PRINTING

FIRING

SINGULAR XP Rear Side Passivation

▼ PERCEUS Upgrade Package for PERC Cells

PRINTING

Laser Contact

▼ DIFFUSION

PSG

▼

PSG EE

REAR PECVD

FRONT PECVD

LCO

PRINTING

FIRING

SINGLE SIDE POLISH/ CLEANING

REAR PECVD

FRONT PECVD

LCO

PRINTING

FIRING

PERCEUS – Production Package for PERC Solar Cells | PERC太阳能电池综合生产设备

Etch. The dielectric passivation layer on the rear of the solar cell, consisting of a layer stack of AlOx and SiNx, is coated by the ICP-PECVD production tool SINGULAR XP. For the final step, the rear contact formation done by Laser Contact Opening (LCO), SINGULUS TECHNOLOGIES is cooperating closely with partners. With the integration of these additional production steps into existing production lines, PERC cells with efficiencies of up to 20 % can be made. In March 2012, the Institute for Solar Energy Research Hameln (ISFH) increased the conversion efficiency of screen-printed silicon solar cells in cooperation with SINGULUS from today’s industry typical 18.5 % to a record value of 20.1 %. This was also confirmed by an independent measurement from the photovoltaics calibration laboratory of the Fraunhofer ISE (CalLab). An improved cell rear side with an ICP-AIOx/SiNy double layer (ICP: “Inductively Coupled Plasma”) enables this progress without “selective emitter” technology. 20.1 % is one of the highest efficiencies worldwide reported for industrial type silicon solar cells with screen-printed metallization.

德国新格拉斯科技集团为生产升级方案PERCEUS 而推出了附加的加工工序。在湿法化学加工工序中，通过LINEA II 单面抛光蚀刻设备来抛光电池的背面。太阳能电池背面由AlOx 和 SiNx组成的的电介质钝化层通过ICP-PECVD生产工具SINGULAR XP 进行镀膜。在最后一步，通过激光开槽形成背面接触，集团与合作伙伴进行了密切合作。通过将这些附加的生产工序集成到现有生产线，PERC电池的效能可提高到20 %。 2012年3月，哈默尔恩太阳能研究机构（ISFH）通过与SINGULUS合作，将丝网印刷硅太阳能电池的转换效率从行业内通常的18.5 % 提高到创纪录的 20.1 %。Fraunhofer ISE (CalLab)的光伏校准实验室通过独立检测对这一点也进行了证实。改进后的电池带有ICP-AIOx/SiNy双重镀层(ICP：“电感耦合等离子体”)，无需“选择性发射极”就能实现这一转换过程。20.1 %是已报道的全球范围内采用丝网印花金属化的工业类硅太阳能电池的最高转化率。

SOLARE Turn-key Production System for Crystalline Cells 晶硅电池的交钥匙生产系统

SOLARE Turn-key Production Systems for Standard Cells as well as new PERC Cells

SOLARE 标准电池及新PERC 电池的交钥匙生产系统

德国新格拉斯科技集团携手世界各地的电池制造商共同改进生产工艺，在提高太阳能电池的效率的同时降低生产成本。电池概念方面的进展，如PERC/ PERT，N型材料、全背面接触式电池或异质结太阳电池将推动晶硅太阳能电池的未来。一个标准的 SOLARE系统一般包括以下生产步骤：

01 Wafer Stack Splitting, Loading/Inspection 02 Saw Damage Etch (SDE) and Texturing 03 Junction Formation 04 Phosphorus Silicate Glass Removal/ Edge Isolation 05 SINGULAR – ICP-PECVD Production Platform for Passivation and Anti-reflection Coatings 6/7 Printing/Firing 08 Testing/Sorting

01 硅晶片分离、装载/检验 02 切割损伤蚀刻（SDE）与制绒 03 结合点形成 04 去磷硅玻璃/边缘隔离 05 钝化和防反光镀膜的ICP-PECVD生产平台 6/7 印刷/烧制 08 测试/分拣

SOLARE – Turn-key Production System for Crystalline Cells | 晶硅电池的交钥匙生产系统

Standard Production Line

SDE/TEXTURE

DIFFUSION

PSG

PECVD

PRINTING

FIRING

SDE/TEXTURE SDE/TEXTURE

DIFFUSION DIFFUSION

PSG PSG

PECVD PECVD

PRINTING PRINTING

FIRING FIRING

SDE/TEXTURE SDE/TEXTURE

SINGLE DIFFUSION SIDE POLISH DIFFUSION PSG

PSG EE PECVD

REAR PECVD

FRONT PECVD FIRING

LCO

PRINTING

FIRING

REAR PECVD REAR

FRONT PECVD FRONT PECVD

LCO LCO

PRINTING PRINTING

FIRING FIRING

PRINTING

标准生产线

Production Line for PERC Cells PERC电池生产线

SDE/TEXTURE SDE/TEXTURE

PSG DIFFUSION SINGLE DIFFUSION SIDE POLISH

SINGLE SIDE POLISH/ PSG EE CLEANING

PECVD

SINGLE

SIDE SINGULUS TECHNOLOGIES offers PSG turn-key SDE/TEXTURE DIFFUSION POLISH/ production lines for all cell types of today CLEANING and tomorrow.

REAR FRONT 目前和未来，德国新格拉斯科技集团为各种类型的 LCO PRINTING FIRING PECVD PECVD

电池提供交钥匙生产线。

Delivery Range of Products

交付的产品范围

→→ Standard production line →→ Production line for PERC like cells and as upgrade →→ PERCEUS production package for PERC cells

→→ 标准生产线 →→ PERC类电池的生产线及其升级版 →→ 适用于PERC电池的PERCEUS整线生产设备

总部

全球子公司

Subsidiaries Offices ←

←

Headquarters

中国 SINGULUS TECHNOLOGIES SHANGHAI Tel. +86 13918298537 junwan.ren@singulus.de

台湾 SINGULUS TECHNOLOGIES Taiwan LTD. Tel. +886-2-2748-3366, sales@singulus.com.tw

印度 SOLAR TECH GROUP Tel. +91-2266-923-263 odt@bom5.vsnl.net.in

日本 MEDIKEN INC. Tel. +81-3-6228-7651 hyakusoku@mediken.jp

新加坡 SINGULUS TECHNOLOGIES ASIA PACIFIC PTE LTD. Tel. +65-6741-1912 sales@singulus.com.sg

韩国 DKSH Korea Ltd. Tel. +82-2-2192-9742 tae-hwan.Joo@dksh.com 中东/非洲 Disc Tech FZE Tel. +971-655-748-46 yasserg@disctech.net

09/2014 MetaCom - Printed in Germany - Technical alterations reserved

德国总部 SINGULUS TECHNOLOGIES AG Hanauer Landstrasse 103 D - 63796 Kahl, Germany Tel. +49 6188 440-0 Fax +49 6188 440-110 sales@singulus.de www.singulus.de