薄膜太阳能

Thin-Film Solar Production Equipment

薄膜太阳能 生产设备

02

SINGULUS TECHNOLOGIES Developer, Enabler and Supplier for the PV Market 是光伏市场的开发者、推动者及供应商。

SINGULUS offers modern Production Systems for CIS/CIGS 德国新格拉斯科技集团为 CIS/CIGS的生产提供现代 化的生产系统

03

SINGULUS TECHNOLOGIES

德国新格拉斯科技集团

SINGULUS TECHNOLOGIES is a supplier of manufacturing solutions and production equipment for the markets Optical Disc, Semiconductor and Solar. With new machine concepts and manufacturing processes in the crystalline and thin-film solar technology, SINGULUS TECHNOLOGIES establishes itself as development partner and equipment supplier for investments in new high-performance solar cell concepts. As market leader for Optical Disc production systems, we have gained extensive know-how in vacuum coating, automation and process integration. SINGULUS TECHNOLOGIES continues to expand its activities in the Solar segment. We cooperate with cell manufacturers worldwide and develop processes which improve the efficiency of solar cells and at the same time reduce production costs. In addition, SINGULUS TECHNOLOGIES has set up development partnerships with universities, institutes, and leading solar companies to establish a proprietary technology as standard for the development of the new cell concepts.

德国新格拉斯科技集团为光盘、半导体和太阳能电 池提供生产解决方案和生产设备。凭借晶硅和薄膜 太阳能科技领域的新颖设备概念和生产工艺，德国 新格拉斯科技集团成为高性能太阳能电池新概念的 领先开发伙伴和设备供应商。作为光盘生产系统的 领头羊，集团在真空镀膜、自动化和工艺整合方面 积累了广泛的技术经验。德国新格拉斯科技集团在 太阳能行业领域不断开拓。集团携手世界各地的电 池制造商共同改进生产工艺，在提高太阳能电池的 效率的同时降低生产成本。此外，集团还与高校、 科研机构和领先的太阳能公司合作开发，为新概念 电池的开发创立专利技术。

Thin-film solar panels offer specific advantages compared to the silicon solar technology. Amongst these is the fact that efficiency is retained during periods of weak sun intensity, and that they are easily integrated into architectural design elements.

SINGULUS is the market leader for the wet-chemical process applying CIS and CdTe processes. New plant concepts expand the value-added chain of the company in the area of thin-film solar technology.

The company‘s target is to position itself at the forefront for the introduction of new technologies with respect to silicon as well as thin-film solar technology.

→→ →→ →→ →→ →→ →→ →→ →→

SINGULUS offers modern production systems for CIS/CIGS & CdTe →→ Cleaning and etching machines →→ Equipment employing spray ion layer gas reaction processes →→ Metal free glass washing machines →→ R & D tools for CIGS development →→ Selenisation furnace for an optimized CIGS absorber formation →→ Sputtering & Evaporation machines →→ Systems for the manufacturing of cadmium free buffer layers →→ Wet-chemical systems

相比与晶硅电池技术，薄膜太阳能电池板有不少优 势。其中之一就是它在光照强度较弱时能保持效 率，并方便地集成到建筑设计元素中。 德国新格拉 斯科技集团是在CIS 及CdTe制造的湿法化学工艺市 场领军者。新的电站概念拓宽了集团在薄膜电池技 术的增值链。集团的目标就是成为晶硅与薄膜电池 新技术领域受尊敬的佼佼者。

德国新格拉斯科技集团为CIS/CIGS以及CdTe 的生产提供现代化的生产系统 清洗与蚀刻设备 离子层气体反应工艺设备 无含金属玻璃清洗设备 用于CIGS电池开发的研发设备 硒化炉，用于形成优化的CIGS吸收层 溅射与蒸镀机 无镉缓冲层的生产系统 湿法化学设备

04

VITRUM II Inline Wet Process Equipment, Etching,Cleaning & Single Side Coating 在线湿法设备，用于蚀刻，清洗与单面镀膜 As part of the product family VITRUM the new processing machine, VITRUM II Cover, is dedicated to cleaning wrap around coatings at rear sides and edges of thin-film solar cells in a single working step. While the edges and the rear side are cleaned with brushes and chemicals the active layer is protected by means of a process hood. Therefore, the VITRUM II Cover is best suited for cleaning after dipping processes as well as the etching of undesirable coatings on rear side and edges, for example CdTe or CdS. The modular design of the VITRUM II allows the easy integration of different process steps according to the requirements of CIS, a-Si or CdTe technology (etching, rear side and substrate edge etching, cleaning and single side coating).

VITRUM II

VITRUM II Cover是VITRUM 系列产品中的新工艺设 备，专门用于以单一工序来清洁薄膜太阳能电池的 后侧和边缘部位包裹的涂层。在用刷子和化学品清 洁边缘和后侧的同时，活性层得到了工艺罩的保 护。因此VITRUM II 罩最适用于槽式镀膜工艺过程 之后的清洁，以及对后侧和边缘不需要的覆膜进行 蚀刻，如CdTe 或 CdS。 VITRUM II 的模块化设计便于根据CIS、 a-Si 或 CdTe 技术（蚀刻、后侧和衬底边缘蚀刻、清洗以 及单侧覆膜）整合不同工序。

VITRUM II – Inline Wet Process Equipment, Etching,Cleaning & Single Side Coating 在线湿法设备，用于蚀刻，清洗与单面镀膜

Main Features

主要特点

→→ Modular design →→ Up to 30 % cost reduction →→ Better accessibility →→ Smaller footprint →→ Low cost of ownership →→ High throughput →→ High availability (uptime > 99 %*) →→ Standard and customer specific substrate sizes up to 2,600 mm →→ Parallel carrier transport for higher throughput →→ Reproducible process results

→→ →→ →→ →→ →→ →→ →→ →→ →→ →→

The VITRUM II provides the platform for wetchemical inline process steps: In a CdTe manufacturing line it performs several process steps, starting with glass washing, removal of rear side coating, CdCl2 deposition using a roller, CdCl2 salt removal as well as chemical NP etch.

VITRUM II为在线湿法工序提供了平台：在一条 CdTe 生产线上，它能执行多道工序，从清洗玻 璃开始，一直到去除后侧覆膜、用滚动滤芯沉积 CdCl2、去除CdCl2以及磷酸硝酸刻蚀。

When producing a thin-film silicon or CIS/CIGS cell, VITRUM is capable of glass washing as well as TCO etching, KCN etching or NH3 treatment respectively. In addition, it also provides NP, DAE and EDTA etching for substrate sizes up to 2,200 mm. With our newly developed and unique soft shower process, a homogeneous, reliable, and reproducible etching is now reality.

Furthermore, it features several advantages compared with inline dipping baths such as reduced process volume, saving energy, and chemicals as well as a higher process speed of up to 5 m/min with minimized carryover.

The design of the VITRUM II features similar piping for all liquid circuits and generously dimensioned installation compartments for optimized maintenance work. lt offers a high cycle rate and due to the modular concept it is easy to integrate into existing production lines.

With the new VITRUM II process cost can be reduced substantially.

* depends on application * 取决于具体应用

05

模块化设计 最多节省30%的成本 更容易的进入维护 占地面积较小 使用成本低 高产能 高可靠性（架动率> 99 %*） 标准衬底和客户定制的衬底最大达2,600 毫米 高产能平行载具 可重复的工艺结果

在生产薄膜硅太阳能电池或CIS/CIGS电池的过程 中，VITRUM能够清洗玻璃以及进行TCO蚀刻、KCN 蚀刻或NH3处理。此外，它还能为厚达2,200 毫米 的衬底进行NP、DAE 以及 EDTA 蚀刻。通过我们 新开发的独特温和喷淋工艺，实现了均匀、可靠而 可复制的蚀刻。不仅如此，与在线浸渍相比，它还 具备诸多优势，例如减少工艺体积、节省能耗和化 学品，以及以最小的带药量将工艺速度提高到5 米/ 分钟。 VITRUM II的设计对各种液体回路采用了类似的管 路系统，并安装了足够空间的安装柜来优化维修工 作。由于生产节拍高,并且采用了模块化概念，很容 易集成到现有生产线中。有了新型VITRUM II，就能 充分降低工艺成本。

06

VITRUM II – Inline Wet Process Equipment, Etching,Cleaning & Single Side Coating 在线湿法设备，用于蚀刻，清洗与单面镀膜

VITRUM II Clean

VITRUM II Clean

→→ Inline cleaning equipment (2200/1400/600) →→ Pre-rinse and single side brush off (acid/caustic) →→ Inline final rinse (cascade cleaner), metal free →→ Inline standard cleaning, polishing, and brushing machine (glass corrosion) →→ Ultrasonic and megasonic support (particle removal)

→→ →→ →→ →→ →→

VITRUM II Etch →→ Inline etching equipment (2200/1400/600) →→ Inline TCO etcher (HCl/HF) →→ Inline KCN etcher →→ Inline NP etcher →→ Inline CuCl2 etcher →→ Inline developer for photoresist →→ Inline CdCl2 salt removal

VITRUM II Cover →→ Inline etching equipment →→ Removal of wrap around coating on edges and rear side →→ Active layer protection (neither liquids nor vapors attack the active layer)

VITRUM II Coat →→ Inline wet deposition of thin salt films by means of a soft roller (e. g. CdCl2, CuCl2 or NaCl) →→ Automated process control →→ Single side coating →→ Very high material usage

Facility Management SINGULUS STANGL SOLAR also supplies: →→ Chemical supply and mixing systems →→ Waste water treatment →→ Exhaust scrubber →→ DI-water make up

在线清洁设备（2200/1400/600） 预冲洗和单侧刷洗（酸/腐蚀剂） 在线最终冲洗（瀑布式清洗机），无金属 在线标准冲洗、抛光与刷涂机（玻璃腐蚀） 超声波和兆声波辅助（颗粒去除）

VITRUM II蚀刻 →→ →→ →→ →→ →→ →→ →→

在线蚀刻设备（2200/1400/600） 在线TCO蚀刻机（HCl/HF） 在线 KCN蚀刻机 在线NP蚀刻机 在线CuCl2蚀刻机 在线光刻胶显影剂 在线CdCl2去除

VITRUM II Cover →→ 在线蚀刻设备 →→ 去除边缘和背面周围包裹的涂层 →→ 活性层保护（液体或水蒸气都无法侵袭 到活性层）

VITRUM II Coat →→ 通过软体滚芯进行薄盐膜的在线湿法 沉积（如CdCl2、CuCl2 或 NaCl） →→ 自动过程控制 →→ 单侧覆膜 →→ 极高的材料利用率

周边设施管理 SINGULUS STANGL SOLAR公司同时还供应： →→ 化学品和药剂混合系统 →→ 废水处理 →→ 废气清扫装置 →→ 去离子水

07

TENUIS II Process System for the Application of Buffer Layer 应用缓冲层的工艺系统

SINGULUS TECHNOLOGIES presents a new development on the way to the efficient wetchemical coating of thin-film solar modules made of copper-indium-gallium-diselenide (CIGS) on glass: the second generation of the TENUIS production line has a modular cluster build basis and enables both significant savings in terms of required floor space and the simultaneous one-side coating of two substrates.

The TENUIS II also provides advantages upon commissioning and in the ramp-up stage. Because of the new cluster design, the commissioning can commence modularly after a short installation time and the first substrates can be coated. The following cluster can be assembled simultaneously or consecutively.

Correspondingly, the TENUIS II meets the ever increasing demands of the market with respect to the reduction of the commissioning and ramp-up times.

SINGULUS offers wet processing systems from R&D over pilot use to full production range 60, 120, 180 and more MW. Due to new and unique concepts in terms of dosing and temperature control, the developers at SINGULUS were successful in reducing the process time by up to 20 %, which has a positive effect and a considerably higher output in production.

德国新格拉斯科技集团在玻璃上进行铜铟镓硒 (CIGS) 薄膜太阳能模块的镀膜，展示了有效湿法化 学覆膜的一项新开发成果：第二代的TENUIS生产 线具有模块化集群构造基础，能利用所需的占地面 积对两面衬底同时进行镀膜，从而大大节省成本。 TENUIS II 同时还在调试时和量产阶段就优势显 现。凭借新的集群设计，经过短暂的安装之后就可 以开始调试，并可以镀第一面衬底。剩余集群可以 同时或先后进行组装。相应地，TENUIS II满足了缩 减调试和量产时间方面日益增长的市场需求。 德国新格拉斯科技集团提供的湿法处理系统从研发 型到实验线以及可用于60、120、180 MW以上的全 套生产系列。凭借加药系统和温度控制方面新颖而 独特的理念，集团的开发人员成功地将加工时间缩 短了20%，效果显著并大大提高了产量。

08

TENUIS II – Process System for the Application of Buffer Layer | 应用缓冲层的工艺系统

The new TENUIS generation offers substantial cost advantages in the production of high performance CIS/CIGS thin-film solar cells. Furthermore, the costs are significantly reduced by temperature profiles adjusted to the process and by very efficient use of process chemicals, so that the new system consistently exploits the savings potential in the manufacturing of thin-film solar cells.

Compared with its predecessor, the TENUIS II version not only reduces the production time but also the required floor space by 30 % and saves footprint and maintenance costs accordingly. Due to the space-saving design, the new system is easily integrated into existing production lines. For a higher throughput, several production machines can be combined to a large production complex.

新一代的TENUIS在生产高性能CIS/CIGS太阳能薄 膜电池方面具有实实在在的成本优势。除此以外， 通过根据可随工艺设定温度曲线以及高效工艺化 学品的利用，显著降低了成本，因此这一新系统 为薄膜太阳能电池生产的成本节约方面不断挖掘 了潜力。

与上一代产品相比，TENUIS II不仅减少了生产时 间，还将占地面积减少了30%，并相应节省了空间 和维修成本。新系统因为节省空间，还能方便地整 合到现有生产线中。为了提高生产量，多个生产设 备可以组成一个大型生产综合体。

Advantages

优势

→→ Standard proven process: low risk →→ High solar cell efficiencies →→ More than 150 process modules in production (world leader) →→ Lowest possible chemical consumption →→ Completely automated inline system →→ Single side deposition incl. protection against backside contamination →→ Modular system (easy upgrade for higher throughput) →→ Reproducible process results →→ Automatic dosage and mixing system →→ In-situ cleaning of the absorber surface during deposition process

→→ →→ →→ →→ →→ →→ →→ →→ →→ →→

公认成熟工艺：低风险 电池转换效率高 已超过150个工艺模组在使用中 （世界领先） 化学品消耗量最低 全自动化的在线系统 单面沉积，包括防止背面污染 模块化系统（为提高产量而实现轻松升级) 可重复工艺结果 自动加药和混药系统 在沉积处理过程中对吸收层表面进行原位清洁

TENUIS II – Process System for the Application of Buffer Layer | 应用缓冲层的工艺系统

Manual Experimental Setup for Process Evaluation and R&D →→ Substrate size for foil and glass:

300 x 300 mm² up to 500 x 400 mm²

用于工艺过程评估和研发的手动试验装置 →→ 薄膜和玻璃的衬底尺寸： 300 x 300 平方毫米 到500 x 400 平方毫米 →→ 人工装载

→→ Manual loading

→→ 自动加热（流体加热）

→→ Automatic heating (fluid heating)

→→ 自动摇晃（移动）

→→ Automatic wobbling (movement)

→→ 手动加药

→→ Manual dosing

→→ 工艺转移到生产线可实现1:1

→→ Process transfer to production line 1:1 possible

→→ 可选择排风柜和自动配量程序

→→ Option for fume hood and automatic dosing

modus possible

用于工艺过程评估的半自动试验装置 →→ 薄膜和玻璃的衬底尺寸：

Semi-automated Experimental Setup for Process Evaluation

→→ 人工装载

→→ Substrate size for foil and glass:

→→ 自动加热

→→ 自动摇晃（移动)

600 x 900 mm² up to 1400 x 1100 mm²

→→ Manual loading

600 x 900 平方毫米到1400 x 1100 平方毫米

→→ 自动配量

→→ Automatic heating →→ Automatic wobbling (movement)

用于半商业生产线的全自动试验装置

→→ Automatic dosage

→→ 薄膜和玻璃的衬底尺寸：

Fully-automated Experimental Setup for a Semi Commercial Line

→→ 自动装载

→→ Substrate size for foil and glass:

→→ 自动摇晃（移动）

→→ 自动加药系统

600 x 900 平方毫米到1400 x 1100 平方毫米

600 x 900 mm² up to 1400 x 1100 mm²

→→ 自动加热

→→ Automatic loading

→→ 自动缓冲系统

→→ Automatic heating

→→ 自动混药系统

→→ Automatic wobbling (movement) →→ Automatic dosage

适用于1 GW产能的模块化生产系统

→→ Automatic buffer system

→→ 模块化系统

→→ Automatic mixing

→→ 占地面积减少30% →→ 降低维修成本

Modular Production System for Capacities up to 1 GW

→→ 替代性缓冲层（硫化锌）的新工艺

→→ Modular system

→→ 新软件界面和应用提高了灵活性

→→ Reduced footprint of up to 30 % →→ Reduced maintenance costs →→ New processes of alternative buffer (ZnS) →→ Aggressive uniform temperature ramps

(even shorter process time)

→→ New software surface and applications

for more flexibility

→→ 快速的升温速率（可缩短工艺时间）

09

10

CISARIS Selenisation Furnace for an Optimized CIGS Absorber Formation 硒化反应炉，用于形成理想的CIGS吸收层 The CISARIS oven is an inline rapid thermal processing equipment designed for the CIGSSe absorber formation on large area glass substrates.

CISARIS consists of a handling station, a vacuum tight process section, and a return conveyor and is optimized for the mass production of CIS solar modules.

The main features of the CISARIS include a high uptime and mechanical yield, as well as a fast cycle time which, in combination with the robust selenisation process, lead to a production capacity of over 25 MWp per year (depending on configuration).

CISARIS

CISARIS 反应炉是一种在线快速热处理RTP设 备，用于在大面积玻璃衬底上形成CIGSSe吸收 层。CISARIS由一个装卸站、一个真空密封工艺站 以及一个回转传送带构成，是大规模生产CIS太阳 能组件的理想设备。 CISARIS的主要特点包括高开动率、高机械成品 率、快生产节拍，再加上强大的硒化工艺，根据配 置的不同，能实现年均25MWp以上的生产能力。

CISARIS – Selenisation Furnace for an Optimized CIGS Absorber Formation| 硒化反应炉，用于形成理想的CIGS吸收层

11

Main Features

主要特点

→→ Second generation inline selenisation furnace with optimized cycle time →→ Rapid heating (up to ~ 4 °C/s) of large glass substrates with metal precursor coating (CIG) →→ Homogeneous gas distribution and low gas consumption through optimized inlet system →→ Introduction of H2S and H2Se gas at various stages of the process possible →→ Uniform heating of large substrates up to 550 °C and beyond by using optimized IR radiators for achieving the required crystal quality →→ Uniform cooling of the substrate to avoid glass warpage →→ Excellent temperature control (mean variation < 5 °C) at all process stages →→ Process under vacuum at atmospheric pressure →→ Oxygen and water vapor free process atmosphere guaranteed through pump/ purge cycles →→ Excellent maintenance concept with maximum accessibility of all machine components →→ Proven safety system based on a solid risk management and safety engineering

→→ 第二代在线硒化加热炉，优化了生产节拍 →→ 对带有金属前驱体涂层（CIG） 的玻璃衬底进 行快速加热（高达 4 °C/秒） →→ 均匀的气体分布，通过优化进气系统而降低了 耗气量 →→ 可在各种工艺过程阶段引进H2S和硒化氢气体 →→ 通过运用优化的红外线辐射器而将大型衬底均 匀加热到 550 °C 以上，从而按要求保证结晶 质量 →→ 将衬底均匀冷却，避免玻璃翘曲变形 →→ 在各工艺过程阶段都能实现优异的温度 控制（平均温度变化 < 5 °C） →→ 在大气压强下进行真空工艺处理 →→ 通过抽真空和吹扫循环保证了工艺过程环境中 没有氧气和水蒸气 →→ 先进的维修理念，所有机器部件都能最方便 维护 →→ 成熟的安全系统源于可靠的风险管理和安全工 程设计

CISARIS is a proven innovative and reliable equipment, which has been newly developed at SINGULUS based on the previous generation of selenisation ovens.

CISARIS can safely handle the thermal processing of large glass substrates of over 1 sqm at temperatures up to 550 °C and beyond under a toxic and corrosive gas atmosphere. High heating and cooling rates, combined with an excellent temperature homogeneity during all process stages are the key factors, which allow the formation of an optimal CIGSSe absorber, required for the production of high efficiency solar modules.

CISARIS最近由德国新格拉斯科技集团根据上一代 的硒化反应炉研发而成，是一种成熟而富于创新而 可靠的设备。 CISARIS可以在温度高达550 °C以上 的有毒腐蚀性 气体环境中，对1平方米以上的大型玻璃衬底进行 安全的热加工。出色的加热和冷却速度，再加上在 各加工阶段都能保持优异的温度均匀性，使得生产 高效能太阳能模块所需的理想CIGSSe吸收体得以 形成。

12

VISTARIS PVD Sputtering Machines for Thin-Film Solar 太阳能薄膜PVD 溅射机 PVD Sputtering Machines for Thin-Film Solar

太阳能薄膜PVD 溅射机

SINGULUS TECHNOLOGIES offers processing systems for vacuum-coating CIGS/CIS thin-film solar cells. The new systems respond to demand in the photovoltaic industry for development and production tools that enhance the efficiency of thin-film solar cells, while cutting production costs by using the state of the art technologies.

For photovoltaic technology, SINGULUS develops and manufactures coating systems, which can apply special layers and layer systems on different materials. Inline sputter systems are important in today’s thin-film solar cell production.

德国新格拉斯科技集团提供适用于CIGS/CIS 薄膜 太阳能电池真空镀膜的处理系统。这一新系统响 应了光伏产业对于提升薄膜太阳能电池效率的开 发和生产工具的需求，同时通过先进科技降低了 生产成本。 在光伏技术方面，集团开发并制造了镀膜系统， 该系统可以镀特殊膜以及不同材料的多层膜。 在线溅射系统对于如今的薄膜太阳能电池生产而 言相当重要。

Examples are transparent front or metallic back contact layers as well as multilayered precursors with a broad range of diverse materials. The main advantage of the new system is that it can be used for vertical vacuum based coating of glass substrates. This gives SINGULUS access to operations in the high-growth market for thinfilm photovoltaic and adds another production stage to its range of processing systems for the manufacture of CIGS/CIS cells.

VISTARIS

以正面透明或背面金属导电层以及各种材料组成的 多层前驱体涂层为例，新系统的主要优势在于， 它可以用来对玻璃衬底进行真空立式镀膜。集团 借此得以进入快速成长的薄膜光伏市场，并将生产 CIGS/CIS电池的加工系统提升到新的生产阶段。

Machine Type

Orientation

Target Length

Cathode in Process Chamber

Transport Mode

VISTARIS

V 600

Fully Vertical

600 mm

Single Sided

Batch Osczilation

VISTARIS

V 900

Fully Vertical

900 mm

Single Sided

Batch Osczilation and Inline

VISTARIS

V 1600

Fully Vertical

1600 mm

Double Sided

Inline

Main Features

主要特点

→→ Pre-heating of substrate in air/dry →→ Fully vertical transport orientation →→ Rotatable cathode for all typical target materials →→ Magnetron sputtern in diverse mode like DC, Pulse DC, Bipolar, and RF available →→ Dry primary vacuum pumps and full magnetic 5-axis turbo pumps →→ Meissner trap and polycold →→ Heating option for all process and buffer chambers →→ Transport system outside the vacuum →→ Modular process chamber configuration

→→ →→ →→ →→ →→ →→ →→ →→ →→

在空气中/干燥环境下预热衬底 完全垂直定向运输 适用于所有典型靶材的旋转阴极 在各种模式下进行磁控溅射，如可用的直流、 脉冲式直流、双极和射频等 干式一级真空泵以及全磁5轴涡轮泵 迈斯纳冷阱及低温泵 适合所有工艺过程和缓冲腔的加热功能可选 真空外的传输系统 模块化工艺腔配置

14

CIGS R&D Platform The CIGS R&D Platform is a Development Tool for the Production and Thermal Treatment for Photovoltaic Applications 新CIGS研发平台是光伏应用生产和热处理的一项开发工具 R&D Tool for CIGS Development

CIGS开发的研发工具

The new CIGS R&D Platform is a development tool for the production and thermal treatment of semiconductor layers based e. g. on copper, indium, and gallium for photovoltaic applications.

With the CIGS R&D Platform, economic research of new manufacturing processes for CIS-CIGS semiconductor films can be realized. In this way, the highest level of efficiency of thin-film solar modules compared to existing concepts can be achieved. With the process results on the basis of the findings from the demonstration plant, industrial manufacturing processes can be developed and optimized, enabling higher cell performances as well as a significant reduction of manufacturing costs for thinfilm photovoltaic modules per watt peak.

新CIGS研发平台是以铜、铟、镓等半导体层为基础 的光伏应用的生产和热处理的一项开发工具。有了 CIGS研发平台，CIS-CIGS半导体膜的新的生产工艺 的研发就能实现成本节约。这样一来，较之现行概 念，薄膜太阳能组件能实现更高效率。根据目前运 行电站的结果发现，可以通过开发和优化工业制造 过程而提高电池性能，并显著降低薄膜光伏模块每 瓦特峰值的生产成本。

The CIGS R&D Platform contains a central handling unit and several process stations.

In the process stations the thermal treatment as well as deposition of the complete layer stack can be conducted. The system is designed for glass substrates up to 300 mm x 300 mm and can be set up in the following configuration:

CIGS研发平台包含一个中央处理单元和多个工艺 腔。在工艺腔可以进行热处理以及完整层堆栈的沉 积。该系统的设计是为了配合最大为300 毫米 x 300 毫米的玻璃衬底，可以通过以下配置进行设置： →→ 集中处理 →→ 装载/卸载站 →→ 溅射单元Mo (第1步) – Cu, In, Ga (第3步) – iZnO, AZO (第8步) →→ 硒沉积（第4步） →→ 热处理及硒化、硫化（ 第5步） →→ 激光刻划（第2、7、9步） →→ 缓冲层模块（第6步）

→→ Central handling →→ Loading/unloading station →→ Sputtering unit Mo (Step 1) – Cu, In, Ga (Step 3) – iZnO, AZO (Step 8) →→ Selenium deposition (Step 4) →→ Thermal treatment & selenization, sulphurization (Step 5) →→ Laser scribing (Step 2, 7 and 9) →→ Buffer layer module (Step 6)

Step 4, 5

Step 6

15

Vacuum Evaporation Tool For CIGS/CIS Thin-Film Solar Cells 用于CIGS/CIS薄膜太阳能电池的真空蒸镀设备

Vacuum Evaporation Tool for Thin-Film Solar The vacuum evaporation tool is based on the thermal evaporation of all CIGS-related precursor materials. It is dedicated to the deposition of copper-indium-gallium-selenium layers for the purpose to form optimum precursor layers in the application of CIGS-thin-film solar cells. The vacuum evaporation tool consists of a handling station, multiple heating/cooling stations and depositionchambers. The vacuum evaporation tool is offering leading-edge thermal deposition technology, that delivers a high material utilization and excellent layer uniformity. In combination with a high uptimeand mechanical yield, the tool leads to a highly optimized and flexible production platform.

Main Features →→ High throughput capability →→ Modular chamber design →→ Flexible layout conception to meet the production requests of the customer →→ Optimized evaporation source utilization through unique chamber design (minimized wall deposition) →→ High deposition speed and repeatability →→ Excellent flux uniformity →→ Easy and fast source refilling/replacement →→ Excellent temperature uniformity →→ Substrate pre-heating →→ In-situ monitoring of flux and temperature

用于薄膜太阳能的真空蒸镀设备 该真空蒸镀设备用于CIGS 相关材料的热蒸镀。 具体应用于CIGS 薄膜太阳能电池中铜-铟-镓-硒层 的沉积。该真空蒸镀设备由传输系统、多个加热/ 冷却站和沉积腔体组成。它能提供尖端的热沉积技 术，该技术材料利用率高，膜层厚度非常均匀。 该设备融合稼动率和机械良率高的特点，可谓最佳 最灵活的生产平台。

主要特征 →→ →→ →→ →→ →→ →→ →→ →→ →→ →→

高产能 模块化腔室设计 布局可灵活多变，以满足不同客户的生产需求 独特的腔室设计，确保蒸发源利用率最大 化（腔室壁上沉积最小化） 较快的沉淀速度和较高的工艺重复性 极佳的流体均匀性 方便快速的蒸镀源补充/更换 温度均匀性优良 基片预加热功能 实时监控流量和温度

总部

全球子公司

Subsidiaries Offices

←

←

Headquarters

中国 SINGULUS TECHNOLOGIES SHANGHAI Tel. +86 13918298537 junwan.ren@singulus.de

台湾 SINGULUS TECHNOLOGIES Taiwan LTD. Tel. +886-2-2748-3366, sales@singulus.com.tw

印度 SOLAR TECH GROUP Tel. +91-2266-923-263 odt@bom5.vsnl.net.in

日本 MEDIKEN INC. Tel. +81-3-6228-7651 hyakusoku@mediken.jp

新加坡 SINGULUS TECHNOLOGIES ASIA PACIFIC PTE LTD. Tel. +65-6741-1912 sales@singulus.com.sg

韩国 DKSH Korea Ltd. Tel. +82-2-2192-9742 tae-hwan.Joo@dksh.com 中东/非洲 Disc Tech FZE Tel. +971-655-748-46 yasserg@disctech.net

05/2014 MetaCom - Printed in Germany - Technical alterations reserved

德国总部 SINGULUS TECHNOLOGIES AG Hanauer Landstrasse 103 D - 63796 Kahl, Germany Tel. +49 6188 440-0 Fax +49 6188 440-110 sales@singulus.de www.singulus.de