Global Nanoimprint Lithography System market will reach 140 million US$ by the end of 2025

Global Nanoimprint Lithography System market will reach 140 million US$ by the end of 2025 QYRESEARCH FOCUS ON MARKET SURVEY AND RESEARCH

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Nanoimprint lithography is based on surface structuring with a template consisting of topographic patterns. After imprinting, the patterns have to be transferred in order to obtain different functionalities. As lithography method, nanoimprint is fully compatible to the standard micro-fabrication techniques, including different transfer processes such as etching, lift-off, selective re-growth or diffusion. In most cases, a thin layer of resist is deposited on the substrate and then imprinted, resulting in a thickness contrast. This may need a further treatment by reactive ion etching (RIE) to remove the residual resist layer and to transfer the features into the used substrate material.

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The world leading vendors in the market are Obducat which accounted the revenue market share of 35.56%, followed by EV Group and Canon.

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Globally, 145 units nanoimprint lithography system have been put into the market in the year 2017, while Europe attributes close to 59.31% of the world production, North America close to 28.97%, China 6.21%, and Japan 5.52%. Optical equipment accounts for 47.59% of all nanoimprint lithography system consumption, compared to 40.69% for consumer electronics.

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The global Nanoimprint Lithography System market is valued at 61 million US$ in 2017 and will reach 140 million US$ by the end of 2025, growing at a CAGR of 10.9% during 2018-2025.

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