JMG Vacuum & Nanotechnology Solutions Guide by JMS Marketing

Solutions Guide

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More than 200 solutions from top International industry leading brands including

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Welcome to the John Morris Group We are proud of our family-owned heritage spanning over 60 years & specialise in the supply, installation & servicing of precision instruments covering diverse industry sectors throughout the South Pacific region

We Pride Ourselves In The Full Range Of Services We Offer: Qualified Product Specialists

National Office Network

who possess in-depth expertise in designing the right solution for you

delivering local assistance & timely support to your door

Highly Trained Sales Personnel

Quality Products

who come to you to understand your needs & tailor individual solutions

from known & respected brands you can trust

Customer Support Team

Australian & New Zealand Compliance

who can immediately assist you over the phone, by email or live chat via our website

through electrical testing prior to delivery on every instrument we deliver

Maintenance & Repair Division

Genuine Local Product Warranty

which stands behind each & every product we sell

backed by a stable organisation that will be around in the years to come

Experienced Engineers

More Than 250,000 Products

who can install your instrument as well as train your staff

able to be purchased online

Managment Systems certified ISO 9001

“Customer service is up to expectations. Thank you for being available when ever I got stuck while operating the equipment “ (Google Review)

For our team it’s about more than simply offering a great product. We commit to serving your end-to-end needs & would love the opportunity to become your laboratory solutions partner. The John Morris Group team is known to be amongst the most knowledgeable in the industry & our obligation is to provide the right solution for you. On behalf of the John Morris Group I look forward to helping you drive your research & testing further. Kind regards,

Andre Wyzenbeek

Managing Director AWyzenbeek@johnmorrisgroup.com

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Vacuum & Nanotechnology Solutions Guide

End-to-End Support In addition to offering an extensive & high quality product range from respected brands around the world, at John Morris Group we focus on providing you with ongoing end-to-end support. We offer service & repair facilities nationwide allowing us to deliver fast local support to ensure your equipment is running at optimum performance plus we can install your equipment & train your staff - we are proud to be chosen by leading organisations in maintaining & repairing their equipment.

Maintenance & Repair Services John Morris Group provides an array of capabilities for the preventative maintenance & repair of every instrument we sell.

Highly Trained Engineers All of our service engineers are tertiary qualified (electrical, mechanical, refrigeration) & attend regular manufacturer conducted factory training programmes to maintain their technical expertise for your equipment.

Service Maintenance Agreements Should your equipment break down, having access to prompt & reliable support in your time of need is critically important to ensure any operational down-time is minimised. To safeguard & enable your equipment to perform to its optimum operating conditions, plus to minimise any likelihood of unforeseen break down, regular calibration/servicing of your equipment is recommended. We offer a choice of Service Maintenance Agreements to suit your requirements: ď Ž Unscheduled equipment break-down service ď Ž Scheduled routine preventative maintenance visits

Mass Flow Controller, Gas Flow & Vacuum Gauge Calibration Our state-of-the-art MKS calibration bench is appointed with multiple NIST traceable standards providing accuracy to 0.02% of reading with a calibration range from 0.0005 to 1000 Torr. We are able to calibrate most sensor technologies including Baratron, Capacitive, Piezo & Pirani.

Environmentally Controlled Facilities NATA certified reference gases Precise CO2 analysers NIST traceable MKS mass flow meters Gas source solenoid actuators (200-15,000 ppm) MKS 247 4-channel MFC controller

Installation, Training & Customisation Our service engineers can install your equipment plus offer training to your staff at your premises. We consult in designing tailored solutions to satisfy your individual requirements to complex problems. For larger projects requiring purpose-built installation or modifications to existing infrastructure, our team can work with you to co-ordinate external contractors to strict deadlines & specifications in delivering customised instrumentation & solutions to meet your needs. Our customised solutions include vacuum systems, acid digestion & reactor systems, thin film deposition systems, freeze drying systems, complete laboratory fit-out (including pumps, tubing, fittings, chillers, taps, instrumentation & integration with other contractors) & much more.

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Index Vacuum Pumps

Diaphragm

Scroll

Rotary Vane/Hybrid

Roots Booster

Multi-Stage Roots Booster

Screw

Central Network Systems

Industrial Vacuum Systems

Turbomolecular

Oil Diffusion

Cryogenic & Cryostats

Ion (Sputter)

Coarse to Rough Pumps

Page

7 - 13

High to Ultra High Vacuum Pumps Page

14 - 16 ▀▀

Vacuum & Roughing Components Page

Standard Spherical & D-Shape

Vacuum Chambers

Page

Leak Detection Page

Vacuum & Pressure Measurement

Bell Jars

Many vacuum applications (eg sample transfer, beamline diagnostic positioning, etc) require precise manipulation along Y or XYZ axes wide selection of instruments to suit your requirements

Detect the smallest leaks - wide selection of instruments to suit your needs

Gauges & Transducers (gas-type independent)

Gauges & Transducers (gas-type dependent)

Vacuum Gauge Controllers

Monitoring & Controlling

Thermal Based MFCs & Meters

In-Situ Mass Flow Verifiers

Flow Ratio Controllers

Pressure Controllers

Vacuum Quality Monitor Systems

Residual Gas Analysers - Quadrupole

Non-Dispersive InfraRed

FTIR

26 - 28

Gas Analysis - Mass Spectrometry

Page

Surface Science Analysis Chambers

21 - 25

Mass Flow, Control & Verification

Page

Cylindrical

Motion & Manipulation

Page

▀▀

Vacuum Components: flanges & fittings, Foreline traps, valves, feedthroughs (electrical, fluid, rotary motion, linear, multi-motion), viewports Roughing Components: hoses, process lines, PVC fittings & components, double-sided flanges, up-to-air valves, pressure burst discs

29 - 30

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Vacuum & Nanotechnology Solutions Guide

Wide selection of instruments to suit your requirements (including PVD, CVD, MOCVD, ALD, PECVD, PE, RIE, PE-ALD, hybrid)

Thin Film Systems Page

31 - 32 Electron beam lithography - wide selection of instruments to suit your requirements

Nano Fabrication 33

Page

Safe & highly efficient to remove water & oxygen from flammable & noxious solvents

Solvent Purification Systems 33

Page

DC Power Generators

Plasma & Surface Modification

Page

36 - 37 Wide selection of instruments to suit your requirements (including lapping & polishing, chemical polishing, bonding & impregnation, test & measurement, slicing & cutting, etc)

38 - 40

Gloveboxes Page

Wide selection of instruments to suit your requirements (various applications including standard, OLED/OPV, chemistry synthesis, nuclear research, etc) 41

Freeze Drying

Page

Benchtop

Essential Lab Instruments Page

45 - 50

Instrument Selection Guides Page

Lab

All-In-One

Stoppering Trays

42 - 43

Containment Enclosures Page

Microwave Power Generators

Wide selection of instruments to suit your requirements (including quantum transport, electron spectroscopy, ARPES & PEEM, hemispherical energy analyzer, channeltron detector, etc)

Chemical Mechanical Polishing Page

Radio Frequency Power Generators

34 - 35

Surface Science Analysis Page

Pulsed DC Power Generators

Wide selection of instruments to suit your requirements (including nanotechnology & process equipment enclosures, DNA/RNA research, etc)

Wide selection of instruments to suit your requirements (including temperature control, centrifuges, balances, pipettes, rotary evaporators, stirring & shaking, etc)

A range of Guides to help you determine the most appropriate instrument for a particular application 51 - 59

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Vacuum Pumps Refer Selection Guide on page 51 to personalise your needs

To determine the correct type of pump for your particular application consider the following factors.

Ultimate Vacuum Range The lower a vacuum pump’s pressure (eg 10-10) the higher the vacuum level (as there are less gas molecules within the vacuum chamber) - measured in millibar (mbar), Torr, Pascal, etc.

Pumping Speed

Pumping Speed Conversion Table

Measures a pump’s capacity to remove gas from the chamber (measure of the gas volume displaced versus time) - common units of measurement are m3/hour & L/second

Vacuum Pump Types

m /sec L/sec m3/hour

m /sec L/sec m3/hour l/mn CFM

1 10-3 2.78 x 10-4 1.67 x 10-5 4.72 x 10-4

Max

3,600 3.6 1 6 x 10-2 1.699

CFM

6 x 104 60 16.7 1 28.32

2.12 x 103 2.12 5.89 x 10-1 3.53 x 10-2 1

Ultimate Vacuum (mbar) <10

-10

-9

-8

-7

Ultra High Coarse to Rough

103 1 0.278 1.67 x 10-2 0.472

Pumping Speed Range Min

l/mn

-6

10-5

High

10-4

10-3

10-2

10-1

Rough

100

101

102

103

Coarse

Pages 7 -13

Diaphragm

- Turbo Backing

0.7 to

25 m3/hour

- Chemistry Resistant

0.7 to

25 m3/hour

- Liquid Aspiration

0.7 m3/hour

Scroll

5.4 to

60 m3/hour

Rotary Vane/Hybrid

1.5 to

1,200 m3/hour

250 to

10,000 m3/hour

16 to

4,800 m3/hour

Screw

270 to

5,000 m3/hour

Central Network Systems

Depends on configuration

Depends on staging configuration

Industrial Vacuum Systems

Depends on configuration

Depends on staging configuration

Roots Blower Multi-Stage Roots Booster

High to Ultra High

Pages 14 -16

Turbomolecular

7.5 to

3,200 L/sec

Oil Diffusion

3,000 to

50,000 L/sec

Cryogenic & Cryostats

2,600 to

60,000 L/sec

Ion (Sputter)

0.2 to

1,200 L/sec

Depends on staging configuration

Transfer v’s Capture Pumps ▀▀ ▀▀

Transfer Pumps - force gas molecules in a preferred direction by positive displacement or momentum exchange where the gas is compressed until slightly above atmospheric pressure when ejected Capture Pumps - immobilise gas molecules from re-entering the vacuum system via a cold surface or by ionisation

Wet v’s Dry Pumps ▀▀ ▀▀

Wet Pumps - use low vapour pressure oil in the pumping mechanism for sealing/lubricating the vacuum compression stages (rotary vane) or compressing the gas molecules in vapour form (diffusion) Dry Pumps - have no oil sealing fluid which avoids hydrocarbon contamination. Some pumps truly have no oil lubricants while others may have lubricated gears/bearings sealed from the vacuum track by o-rings/seals

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Vacuum & Nanotechnology Solutions Guide

Coarse to Rough Vacuum Pumps

Diaphragm Pumps

▀▀

Description Operation

▀▀

Applications

▀▀

Rough Vacuum • Gas Transfer Removal Method • Dry Pump A flexible diaphragm mechanically moves to increase/decrease a pumping chamber volume - this change in volume compresses & expands process gas to create a vacuum Vacuum filtration, rotary evaporation, distillation, gel drying, centrifugal concentration, vacuum drying & turbo backing applications

Turbo Backing

Model

Ultimate Vacuum mbar(without gas ballast)

Divac 0.8 T JMG No: 1029035

Divac 4.8VT JMG No: 1029046

MD 1 JMG No: 1299727

Divac 1.4HV3 JMG No: 1244070

MD 4 NT JMG No: 1300017

Divac 0.8 LT JMG No: 1029037

MV 10 NT VARIO

Pumping Speed (m3/h) 50 Hz

ATEX Category 3

≤3.0

0.77

Suitable for small hybrid turbo pumps (<150 L/s)

≤2.0

4.8

Suitable for small hybrid turbo pumps (<700 L/s)

1.5

1.2

≤1.5

1.3

3.8

≤0.5

0.77

0.3

12.1

(internal Atm only)

Comment/ Application

Suitable for small hybrid turbo pumps (<300 L/s)

For hybrid turbo pumps (<700 L/sec)

Suitable for small hybrid turbo pumps (<150 L/s)

Variable speed control motor & ideal for larger turbo pumps (>500 L/sec)

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Chemistry Resistant

Model

Ultimate Vacuum mbar (without gas ballast)

Ultimate Vacuum mbar (with gas ballast)

Pumping Speed (m3/h) 50 Hz

Base Pump

100

0.7

Both

Solvent filtration & solid phase extraction

100

0.7

Both

Aqueous filtration only

2.0

Both

Multiple filtrations & solid phase extraction

0.75

Rotary/parallel evaporation

≤8

102

Optional

Small volume evaporation (rotary & rotational vacuum)

≤8

2.0

Optional

Evaporation (rotary & rotational vacuum)

≤8

0.6

Optional

Small volume evaporation (rotary & rotational vacuum)

2.0

ME 2C NT

Both

Gel drying

Both

Rotary evaporation, rotational vacuum concentration & vacuum ovens

Both

Evaporating high boiling point solvents

ME 1C #1299898

ME 1 #1299893

ME 2C NT #1299930

MZ 1C #1299903

Divac 1.2L #1029987

Divac 2.2L #1029995

Divac 0.6L #1029984

PC 101 NT #1299985

MZ 2C NT+ AK+EK

2.0

MZ 2C NT

2.0

≤2

1.3

3.4

MD 4C NT

#1299972

PC 3001 VARIO Select #1302737

Divac 1.4HV3C

ATEX Category 3 (internal Atm only)

Inlet/Outlet Catchpot

Optional

#1244077

MD 4C NT+ AK+ EK

1.5

#1300039

Both

Suitability

Variable speed for rotary evaporation & rotational vacuum concentration Rotational vacuum concentrators, multiple rotary evaporators & large vacuum ovens

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Vacuum & Nanotechnology Solutions Guide

Liquid Aspiration ▀▀

▀▀

BVC Basic

BVC Control

BVC Professional

JMG No: 1299908

JMG No: 1299910

JMG No: 1299919

ME 1C

Mechanical

Electronic

Ideal for labs with ‘central house’ vacuum

With integrated ME 1C Vacuum pump - quiet & vibration free

Integrated vacuum pump & non-contact liquid level sensor

Single stage diaphragm pump with good suction power Excellent chemical compatibility for solvent sample & disinfecting Vacuum regulation to define the aspiration flow rate Collection flask with sterile filter to protect the pump & workplace from biological hazards Base Pump 4 L PP Collection Flask Pressure Switch Type

Comments

Scroll Pumps Description

Rough Vacuum • Gas Transfer Removal Method • Dry Pump

Operation

2 open spiral metal strips are nested together (one is fixed & the other ‘orbits’) sealed with a tip seal. As the orbit occurs, the connection with the inlet closes, trapping & compressing a volume of gas until it reaches a minimum volume & maximum pressure at the spirals’ centre (where outlet is located)

Applications Suited in applications requiring dry & clean vacuum (typically replacing rotary vane pumps)

predominantly for backing turbo pumps within leak detection systems, accelerators/synchrotrons, surface analysis instruments, scanning electron microscopes, load lock/transfer chambers, spectroscopy

Low Base Vacuum & High Effective Pumping Speed ▀▀ ▀▀ ▀▀ ▀▀ ▀▀

Low noise & vibration Completely oil free & easy to maintain Nominal Pumping Speed (50 Hz): 5.4 to 60.0 m3/h Attainable Ultimate Vacuum: Down to 0.01 mbar Leak Rate: 10-6 mbar L/s Scrollvac Pumps

Rotary Vane/Hybrid Pumps Description

Coarse or Rough Vacuum • Gas Transfer Removal Method • Wet (Oil-Sealed)

Operation

An eccentric rotor compresses process gas within a pump chamber (stator). Oil is injected into the stator to create the vacuum seal, lubrication & cooling

Applications

Rough Pumps Coarse Pumps

used primarily as backing pumps for roots/high-vacuum gas transfer pumps (eg turbomolecular & diffusion) used in freeze drying, vacuum filtering/vacuum impregnation, materials handling & ‘house’ vacuum systems

Single-Stage Pumps ▀▀ ▀▀ ▀▀ ▀▀ ▀▀

Sogevac range of pumps are market leading for industrial, manufacturing & R&D rough vacuum applications ATEX RL 94/9/EC certified versions available (explosion protected) Pumping Speed (50 Hz): 9.5 to 1,150 m3/h Ultimate Partial Pressure (without gas ballast): Down to 5 x 10-2 mbar Water Vapour Capacity: 20 to 34,000 grams/hour

Sogevac SV 10B JMG No: 1129514

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Dual-Stage Pumps ▀▀ ▀▀ ▀▀ ▀▀

Ideal for continuous operation ATEX RL 94/9/EC certified version available (explosion protected) Low & easy maintenance Large range of accessories to suit your application

Model

Nominal Pumping Speed (m3/h) 50 Hz

Ultimate Vacuum mbar (without gas ballast)

Ultimate Vacuum mbar (with gas ballast)

Water Vapour Capacity (grams/hour)

Inlet Flange (KF)

Motor Rating (Watts)

75.0

10-4

<5 x 10-3

1,925

2,200

#1025031

46.0

10-4

<5 x 10-3

1,185

2,200

Trivac D 25 B

29.5

10-4

<5 x 10-3

480

750

18.9

10-4

<5 x 10-3

305

550 to 750

9.7

10-4

<5 x 10-3

160

370

5.9

4 x 10-4

1 x 10-2

>163

370

5.7

4 x 10-4

1 x 10-2

163

300

4.8

10-4

<5 x 10-3

370

2.3

4 x 10-4

1 x 10-2

180

1.9

3 x 10-2

5 x 10-1

Trivac D 65 B #1025050

Trivac D 40 B

#1024795

Trivac D 16 B #1024786

Trivac D 8 B #1030621

RC 6 Chemical resistant with unique ‘hybrid’ design #1299857

RZ 6 #1299842

Trivac D 4 B #1030618

RZ 2.5 #1299837

S1.5 #1019845

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Vacuum & Nanotechnology Solutions Guide

Roots Booster Pumps Description

Coarse to Rough Vacuum • Gas Transfer Removal Method • Dry Pump

Operation

A positive displacement lobe pump which pumps gases with a pair of contactless meshing lobes

Applications

High gas load/high pumping speed requirements

High Reliability & Rapid Pumpdown ▀▀ ▀▀ ▀▀ ▀▀ ▀▀

Ruvac WH 7000

Ruvac WAU 501

JMG No: 1244100

JMG No: 1026167

Increased process gas throughput via significantly exhanced pumping speed Suitable for multitude of industrial & R&D applications Ultimate Pressure down to 10-4 mbar (3 stage system) Vertical & horizontal gas path configurations ATEX (94/9/EG) compliant versions available

JMG No: 1026167

Nominal Pumping Speed (50 Hz):

710 to 10,000 m3/h

253 to 2,050 m3/h

Max Permissible Pressure Difference (continuous operation)

30 to 75 mbar

50 to 80 mbar

Motor Power

2.2 to 11 kW

≤1.1 to 7.5 kW

Multi-Stage Roots Booster Pumps Description

Rough Vacuum • Gas Transfer Removal Method • Dry Pump (Atmosphere to 10-4 mbar)

Operation

Have multiple stages for improved ultimate vacuum

Applications

Turbo pump backing, load locks, PVD systems, analytical instruments (LCMS, ICPMS), electron microscopes, oxygen plasma systems & helium cryostats - ideal for replacing wet pumps plus Scroll type dry vacuum pumps

Non-Contact Pumping Mechanism ▀▀ ▀▀ ▀▀ ▀▀

EV-A03 JMG No: 1225469

EV-A06 JMG No: 1225470

EV-A10 JMG No: 1335615

Dry roughing pump achieves 10-2 mbar ultimate vacuum Highest water vapour pumping & vacuum level of any air-cooled dry pump Single & three-phase motors also available Low power at ultimate vacuum

Pumping Speed (m3/h) Ultimate Pressure (mbar) - Gas Ballast Off/On Max Water Vapour Pumping Rate - Gas Ballast Off Connection - Gas Inlet/Outlet Power at Ultimate Vacuum (kW)

1 x 10-2/10-1

1 x 10-2/2 x 10-2

250 grams/hour

350 grams/hour

500 grams/hour

NW25/NW25

NW40/NW25

0.34

0.59

1.1

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Screw Pumps Description

Rough Vacuum • Gas Transfer Removal Method • Dry Pump

Operation

Two contra-rotating ‘screws’ mesh (but don’t touch) with each other & when the screws are rotated, gas is compressed/transferred from one end to the other. The construction material enables operation in the harsh environments of aggressive gases & particulates found in semiconductor etching & CVD processes

Applications

Industrial, food & beverage, freeze drying & central vacuum systems

Dry Vacuum Solution for Industrial Applications

▀▀ ▀▀ ▀▀ ▀▀

Dry compressing pumps for special industrial applications where reliable, compact & low maintenance vacuum technology is demanded Ideal alternative to conventional oil-sealed vacuum systems Effective Pumping Speed (50 Hz): 270 to 630 m3/h Ultimate Pressure: ≤0.01 mbar

ScrewLine Pumps

One Design Platform - Numerous Configurations ▀▀ ▀▀ ▀▀ ▀▀

Dry vacuum pumps designed for applications in the photovoltaic production chain (eg PECVD, PVD & crystal growing, etc.), coating applications & process industry in general Rugged, reliable & durable - ready to fulfill stringent process requirements Nominal Pumping Speed (50 Hz): 450 to 5,000 m3/h Ultimate Pressure: 5 x 10-3 mbar

Dryvac

Power plus High Performance ▀▀ ▀▀ ▀▀ ▀▀

Range of pumps ideal for rough applications & high process throughput Optimised performance for light gases Nominal Pumping Speed (50 Hz): 80 to 3,800 m3/h Ultimate Pressure: 1 x 10-2 mbar

Leyvac LV 140 JMG No: 1244021

Central Network Systems At John Morris Group we provide a total solution in catering for your vacuum network needs - from conceptual design, co-ordination of external contractors (plumbers, electricians, etc), complete installation & commissioning plus staff training & equipment servicing. Subject to your particular requirements, we provide a number of options in designing your central vacuum systems requirements - building-wide (‘house’) & local area networks

Building-Wide (‘House’) Central Vacuum Systems ▀▀

▀▀ ▀▀

▀▀ ▀▀ ▀▀ ▀▀

Modular systems engineered for improved operational reliability with frequent varying vacuum requirements … delivery of turnkey ready-to-operate & tested units Industrial duty quality Typically consisting of SOGEVAC pump(s), buffer vessel, electrical cabinet with controller & all connecting components Pumping speeds from as low as 25 m3/h up to large turn-key installations Ultimate pressure down to 10-3 mbar Vessel volume starting from 60 L Control type BASIC or full featured

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Vacuum & Nanotechnology Solutions Guide

Local Area Vacuum Networks (VACUU•LAN) ▀▀

▀▀

▀▀ ▀▀

▀▀

Modular in design allowing you to tailor your specific needs & make it easy to supply several different work stations with 1 vacuum pump Avoids the drawbacks of a central ‘house’ vacuum supply (expensive redundancy, rigid pipe work & limited chemical resistance) Modules are solvent resistant Built-in check valves ensure adjacent applications do not contaminate or interfere with one another Ideal for new or existing laboratories with harsh sovents/chemical vapours

Base Pump Ultimate Vacuum mbar (without gas ballast) Ultimate Vacuum mbar (with gas ballast) Pumping Speed (m3/h) 50 Hz

PC 3004 VARIO

PC 3016 NT VARIO

MD 4C NT VARIO

ME 16C NT VARIO

1.5

100

4.6

19.3

Chemical Resistant ATEX - Category 3 (internal Atm only) Separator Catchpot Exhaust Vapour Condenser

Industrial Vacuum Systems ▀▀ ▀▀ ▀▀ ▀▀ ▀▀ ▀▀

Design & manufacture of custom industrial vacuum solutions High flexibility & reliability Integrated forevacuum & high vacuum pump systems for custom requirements Custom software programming and customisation On-site commissioning & training

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High to Ultra High Vacuum Pumps

Turbomolecular Pumps Description

High & Ultra Vacuum • Gas Transfer Removal Method • Dry Pump

Operation

Pumping effect is created by multiple spinning rotor discs which transfer momentum to gas molecules through various compression stages

Applications

High energy physics, synchrotrons, microscopy, mass spectrometers, surface analysis, thin film coating, space simulation chamber & optical lasers

Mechanical Rotor Suspension ▀▀ ▀▀ ▀▀ ▀▀

Turbovac SL 300

Clean high & ultra high vacuum generation with ceramic life-time lubricated bearings Pumping speed up to 1,150 L/s Versions with high resistance to mechanical shocks & shock venting, plus removable electronics for radiation applications Pumping Speeds (L/sec): N2

33 to 1,150

30 to 960

36 to 1,150

28 to 690

Maintenance-Free Turbo Pump - Hybrid Bearings ▀▀ ▀▀ ▀▀ ▀▀ ▀▀ ▀▀

Hybrid design with permanent magnet upper & ceramic lower bearing Industry leading pumping speeds for light gases (He & H2) Lower ceramic bearing is field replaceable with no oil/operating fluid changes Integrated electronics Forevacuum connection: DN 25 KF Pumping Speeds (L/sec):

Turbovac 450 i

Flange Size

Forevacuum Pressure (Max)

350

DN100 (ISO/CF)

10 mbar

Model

Turbovac 350 i

290

260

360

Turbovac 450 i

430

400

440

420

DN160 (ISO/CF)

10 mbar

Turbovac T 350 i

290

260

360

320

DN100 (ISO/CF)

0.5 mbar

Turbovac T 450 i

430

400

440

400

DN160 (ISO/CF)

0.5 mbar

Magnetically Levitated Turbomolecular Pumps Turbovac Magintegra ▀▀ ▀▀

▀▀

Turbovac Mag Digital

100% maintenance free with no mechanical bearings Eliminate the need for a conventional rack-mounted controller & inter-connecting cables via fully integrated converter & power supply High Vacuum Flange: 100 to 250 ISO-K/CF

Pumping Speeds (L/sec)

• N2

300 to 2,100

300 to 3,200

• Ar

1,050 to 1,900

260 to 3,000

• He

260 to 2,050

260 to 3,000

• H2

190 to 1,750

190 to 2,250

Maximum Forevacuum Pressure (N2) Nominal Speed (min-1)

2.5 to 8.0 mbar

2.0 to 8.0 mbar

30,600 to 58,000

28,800 to 58,800

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Vacuum & Nanotechnology Solutions Guide

Compact Turbomolecular Pump System ▀▀ ▀▀

▀▀ ▀▀ ▀▀ ▀▀ ▀▀

Fully assembled & ready-to-use high vacuum system Wide range turbomolecular pump system with ceramic ball bearings (200,000 hour life-time) Dual-stage, DIVAC 0.8 T diaphragm vacuum pump All connection & sealing components are located within pump system assembly High vacuum connection: DN 63 ISO-K/CF or DN 63 CF Pumping speed for N2: 65 L/sec Ultimate pressure: 10-8 mbar (max) Turbolab 80

Oil Diffusion Pumps Description

High Vacuum • Gas Transfer Removal Method • Wet (Oil-Sealed)

Operation

Vacuum oil is heated, vapourised & accelerated (to speed of sound) & collides with gas molecules, forcing them towards the pump exhaust - thus creating a vacuum

Applications

Suitable for applications requiring huge pumping speeds (molecular beam systems, large scale vacuum furnace processing, space simulation chambers)

High Vacuum Without Moving Parts ▀▀ ▀▀ ▀▀ ▀▀

Inlet Connections: From ISO 250 to ISO 1,000 DN Flange Pumping speed for air: From 3,000 to 50,000 L/s Ultimate total pressure <5 x 10‐7 mbar Integrated water-cooled cold cap baffle guarantees low oil back-streaming into the chamber Leybojet 630 JMG No: 1244918

Cryogenic Pumps & Cryostats

Description

High & Ultra High Vacuum • Gas Capture Removal Method • Dry Pump

Operation

Traps gases & vapours by condensing them on a cold surface

Applications

Suited for non-aggressive processes where oil-free operation & high pumping speeds are essential

Cryopumps & Systems ▀▀ ▀▀ ▀▀ ▀▀ ▀▀ ▀▀ ▀▀ ▀▀

▀▀ ▀▀

No moving parts within vacuum system (low maintenance) Single, double or multiple systems - choose from 30 models Intelligent regeneration prevents formation of ignitable gas mixtures (H2 & O2) Highly effective pumping speed for all gases (water vapour in particular) 100% available pumping speed & capacity after each regeneration run Insensitive to mechanical disturbances (eg process particles or external vibrations) High Vacuum Flange (160 to 1250 ISO-F DN) - Forevacuum Flange (25 KF to 63 ISO-K) Pumping Speeds (L/sec): H2O

2,600 to 18,000

640 to 47,000

800 to 57,000

1,000 to 60,000

Capacity (bar x L): Ar/N2 (300 to 6,500); H2 at 10-6 mbar (4.5 to 150) Max Forevacuum Pressure (N2): 2.5 to 8.0 mbar

Coolvac

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Cold Heads for Cooling Cryo Pumps/Cryostats ▀▀ ▀▀ ▀▀ ▀▀ ▀▀ ▀▀ ▀▀

Gas refrigerating systems for cryogenic temperature generation (based on Gifford-McMahon principle) Designed for cooling super-conductors (magnets, samples) for medical research Long maintenance-free operating time with low vibration Refrigerating capacity: two-stage down to 8 K; single-stage down to 25 K Resistant to particles & deposits Simple & intuitive operation No need for liquid helium & liquid nitrogen Coolpower

Ion (Sputter) Pumps Description Ultra High Vacuum (dependent upon design) • Gas Capture Removal Method • Dry Pump Operation MAGNET

Ti/Ta PLATES

The process gas is ionised & is attracted to a cathode plate (typically titanium) with sufficient force to sputter the titanium. The sputtered material coats the process gas & traps it within the ion pump, creating a vacuum

Applications Primarily the choice for all true UHV chamber - they are clean, bakeable, vibration-free,

operate from 10-5 to 10-12 mbar & have long operating lives

Small & Large Ion Pumps ▀▀ ▀▀ ▀▀ ▀▀ ▀▀

Come in a large wide variety of sizes, dimensions & inlet flange sizes Speed ranges from 0.2 to 1,200 L/second Each pump can be configured with a variety of pumping port options additional ports are available in most designs on top, bottom or side Small pumps can be mounted in any orientation without additional support Large pumps are <300 mm high for standard configurations - custom built to each order, the closed magnetic loop of these pumps reduces the stray magnetic field created by the pump making these pumps ideal for any type of charged particle application

Mini – 75S

1200LX

Titanium Sublimation Pumps (TSP) ▀▀

▀▀ ▀▀ ▀▀

▀▀ ▀▀

Often used in combination with ion pumps or independently to remove reactive gases from the vacuum environment Combined with an ion pump, TSPs allow for low ultimate pressures in shorter time All TSP components are bakeable to 400˚C TSP Filament Cartridges: Feedthrough supports 3 titanium-molybdenum filaments & a return path for ground isolation - each filament contains 1.5 grams of usable titanium Liquid Cryoshroud: Contains 2 liquid nitrogen feedthroughs with flare type fittings - provides 1,578 cm2 of liquid nitrogen cooled surface area - pumping speeds up to 12,000 l/s for hydrogen Ambient Sputter Shield: Maximizes surface area when cooling is not practical or possible provides 827cm2 of ambient temp surface area - pumping speeds up to 2,200 L/s for hydrogen

TSP Filament Cartridge

Ion Pump Controllers ▀▀ ▀▀ ▀▀ ▀▀ ▀▀

Quad pump controller Ion pumps >100 L/s require higher currents for starting & higher pressure operation Supplies up to 4 ion pumps with 125 mA each Easy-to-read colour touchscreen display simultaneously displays pressure, current & voltage Large selection of ion pump controllers available

Digitel QPC

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Vacuum & Nanotechnology Solutions Guide

Vacuum Components Flanges & Fittings: CF (304 & 316 SS), wire seal, ISO KF & LF fittings, etc

Foreline Traps:

Molecular, coaxial, liquid nitrogen

Valves:

Gate, angle & inline, variable leak, butterfly, etc

Feedthroughs:

Electrical (multi-pin, coaxial, thermocouple, power, RF power, breaks & envelopes, connectors, wires & insulators), fluid (UHV, HV, baseplate), rotary motion (standard, high temperature, pneumatic, miniature, precision, magnetic, direct, ferromagnetic fluid), linear & multi-motion

Viewports:

Sapphire, fused silica, zero profile 7056 glass, shutters, etc

Roughing Components Vacuum Hoses & Connectors Wire Reinforced PVC Hose: Strong, flexible & economic solution for mechanical pump roughing lines, suitable for basic vacuum service to levels of 1x10-3 Torr

Flexible Stainless Steel Hose: Braided & un-braided configurations, all hoses can be baked to 450°C, perfect where standard straight-line vacuum plumbing is not practical or where vibration isolation is required

Small Diameter Process Lines/MDC Del-Flex™ Process Lines: Perfect where process lines are not straight-line or where vibration isolation is required, fully vacuum annealed (allows line to be formed with a pre-set static bend for ease of installation)

PVC Fittings & Components: Offer economical solution for long vacuum pump exhaust lines & rough vacuum lines, excellent corrosion resistance & ideally suited for harsh chemical environments

Double-Sided Access Flanges: Provide a convenient method of adding roughing accessories to a vacuum system, double-sided flanges are also offered with no accessory holes

Up-to-Air Valves: Primarily used for venting or back filling of vacuum vessels, vacuum rated to 1x10-8 Torr, when fitted with Del-Seal™ CF metal seal flanges they can be baked to 300°C

Pressure Burst Discs: Prevent accidental pressurizing of a vacuum vessel (as most vacuum vessels are not pressure

vessels & should not be subjected to positive pressure loads in excess of one atmosphere), disc is designed to burst at a positive pressure (from atmosphere to 25 psig

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Vacuum Chambers Standard Spherical ▀▀ ▀▀ ▀▀

▀▀ ▀▀ ▀▀ ▀▀

Versatile & designed for a wide range of analytical studies & experiments Constructed from 304L stainless steel Available in either 12” or 16” nominal diameter - feature a variety of access ports of different sizes to accommodate connection to a variety of experimental devices, analytical instruments, viewports, electrical & motion feedthroughs plus vacuum measurement gauge tubes All access ports are precision aligned with a helium-neon laser Electro-polished surface finish for UHV service Flange ports are non-rotatable Del Seals with thru bolt holes (all ports target chamber centre) Bakeable to 400°C Ultra High Vacuum Series

Standard D-Shape Versatility for a wide range of applications Standard design is 16” wide by 26” tall with semicircular back (8” radius) The chamber body & ports are 304L stainless steel & door from 6061-T6 aluminium Hinged door for quick opening A variety of ISO KF & LF flanged ports accommodate connections for a number of devices (eg pumps, analytical instruments, viewports, electrical or motion feedthroughs, vacuum measurement gauges, etc) Chamber has 4 mounting feet with standard 1/2-13 UNC-2B threads for securing to stand

▀▀ ▀▀ ▀▀ ▀▀ ▀▀

▀▀

High Vacuum Series

Standard Cylindrical ▀▀

▀▀ ▀▀ ▀▀ ▀▀ ▀▀ ▀▀ ▀▀

Sizes available: o 24” chamber (304L stainless steel with Del-Seal™ metal sealing flanged) o 18” chamber (6061-T6 aluminium with ISO KF & LF port flanges) Electro-polished surface finish Hinged door for quick & easy access to interior A variety of different size access ports available Standard cylindrical chambers are designed for high vacuum service but stainless steel versions can be easily configured for UHV service All sealing flanges & machined components have standard 64 micro-inch surface finish Seal surfaces machined with a 32 micro-inch concentric finish suitable for vacuum applications Alternate port options & locations available

Ultra High & High Vacuum Series

Surface Science Analysis Chamber 18 access ports Del-Seal™ CF metal seal flanges Type 304 stainless steel construction Bakeable to 450°C UHV compatible to 1 x 10-11 Torr

▀▀ ▀▀ ▀▀ ▀▀ ▀▀

Bell Jars ▀▀

▀▀ ▀▀ ▀▀ ▀▀

Type 304 stainless steel - designed to be used with flat baseplates, base wells & feedthrough collars PVP-4 Pyrex® Viewport with a 4” diameter viewing area All welds are internal & provide UHV compatibility Single top-centre lift ring (welded to the chamber’s domed top) Electro-polished finish option is available

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Vacuum & Nanotechnology Solutions Guide

Motion & Manipulation Refer Selection Guide on page 52 to personalise your needs

Rotary & Telescopic Arm Extension - 3-AXIS RTTA ▀▀ ▀▀ ▀▀ ▀▀

360° rotation, 760 mm linear extension & 50 mm Z motion to provide arm lift & lower to aid sample transfer Typically <1 mm deflection at full arm extension with 10 N load Linear reproducibility of <0.2 mm & rotational reproducibility of <0.2 mm Motorised options available

3 Axis Radial Telescopic Transfer Arm

XYZT Manipulators ▀▀

▀▀ ▀▀ ▀▀ ▀▀ ▀▀ ▀▀

Large range of manipulators used in isolation or combined with linear shift mechanisms & magnetically coupled rotary drives to build sophisticated manipulators with up to six axes of independent motion Kinematic design ensuring smooth, precise motion, high load capability & a minimum bellows design life of 10,000 cycles Manipulators can be configured using our modular XY in combination with linear shift mechanism (XYZ) & XYZT stages Ideal manipulator platform where space is at a premium 50 to 300 mm Z motion options XY options include ±12 mm (38 mm bore), ±15 mm (64 mm bore) & ±25 mm (102 mm bore) with integrated ±2o tilt High resolution performance

TETRAXE

Linear Motion & Alignment ▀▀ ▀▀ ▀▀ ▀▀ ▀▀ ▀▀

Linear shift mechanisms (LSMs) provide linear motion along the port axis (Z) Typical applications include the positioning of beamline filters, adjustment of sputter sources and deposition stages through to production style applications. Ranging from CF35 to CF150 flanges, up to 1m stroke, tilt & X alignment versions with manual, pneumatic & motorisation options Bakeable to 250°C & supplied on CF flanges plus provide true UHV performance Smooth, precise motion via a kinematically-designed external leadscrew driven mechanism - complete with anti-rotation & anti-deflection systems Bellows manufactured from 316L stainless steel & with minimum design life of 10,000 cycles LSMT Series

Sample Transfer Options ▀▀ ▀▀ ▀▀ ▀▀ ▀▀ ▀▀

Flag Sample Transfer Options

Available for linear & rotary, elevating, puck sample & dual or triple axis probes Unrivalled magnetic coupling strength (4 Nm (3 lbf ft) break-away torque) Unrivalled thrust performance All probes are fully bakeable to 250°C & do not require dismantling Probes are suitable for use between atmospheric pressure & ultra-high vacuum Standard flag sample holder options include: o Linear & rotary movement incorporating flag gripper mechanism o Linear & rotary movement incorporating flag toggle mechanism o Linear only movement incorporating flag gripper o Linear & rotary movement incorporating flag gripper locking mechanism

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Leak Detection Detects Even the Smallest Leak ▀▀ ▀▀ ▀▀ ▀▀ ▀▀ ▀▀ ▀▀ ▀▀ ▀▀ ▀▀

Portable & large colour touch screen Convenient remote control via smartphone or tablet PC (no software to install) Reliable pass-or-fail decisions Save parameter sets for different test parts & upload them quickly & easily Smallest leak rate helium – vacuum mode (mbar x L/second): ≤5 x 10-12 Smallest leak rate helium – sniffer mode (mbar x L/second): <1 x 10-9 Response time <1 second Internal data memory as well as simple data output via USB Oil-free pump system also available (Phoenix Quadro Dry) Ideal for research & development, industrial production & semiconductor industry Phoenix Quadro JMG No: 1308084

Suited for Larger Test Volumes ▀▀ ▀▀ ▀▀ ▀▀ ▀▀ ▀▀ ▀▀ ▀▀

Added fore vacuum suction capacity - ensures very rapid evacuation times & particularly suited for larger test volumes Has same highly-precise measuring system & properties as PHOENIX Quadro Together with integrated SOGEVAC SV16D provides highest suction capacity Portable & large colour touch screen Smallest leak rate helium – vacuum mode (mbar x L/second): ≤5 x 10-12 Smallest leak rate helium – sniffer mode (mbar x L/second): <1 x 10-9 Dry version has integrated SCROLLVAC SC5D for oil-free pump system applications Perfect for research & development, UHV applications, industrial applications & semiconductor industry – small size perfectly suited for systems integration

Phoenix Magno JMG No: 1308087

All Rounder With Variable Pumping Speed ▀▀ ▀▀ ▀▀ ▀▀ ▀▀ ▀▀ ▀▀

▀▀ ▀▀

Has no built-in backing pump (smallest installation space with maximum flexibility) Type & size of backing pump chosen freely depending on applications Combines the excellent properties of Phoenix Quadro with required pumping system Portable & large colour touch screen Smallest leak rate helium – vacuum mode (mbar x L/second): ≤5 x 10-12 Smallest leak rate helium – sniffer mode (mbar x L/second): <1 x 10-9 Both oil-sealed & dry backing pumps can be selected & fore vacuum suction capacity can be adapted perfectly to the target application Perfectly suited for systems integration & research & development, UHV applications, industrial applications & semiconductor industry Phoenix Vario JMG No: 1308083

Suitable for Most Standard Applications ▀▀ ▀▀ ▀▀ ▀▀ ▀▀ ▀▀

▀▀

Oil sealed vacuum system Portable & large colour touch screen Smallest leak rate helium – vacuum mode (mbar x L/second): ≤5 x 10-12 Smallest leak rate helium – sniffer mode (mbar x L/second): ≤1 x 10-7 Specially designed turbo molecular pump for improving pumping speed & helium background characteristic Options include: o Entirely oil-free system (Phoenix L300i Dry) – integrated helium contamination protection o Additional fore vacuum system, oil-sealed or dry (Phoenix L300i module) Ideal for industrial production testing, QA, research & development, power plants, analytical instruments, plant engineering, semiconductor industry, high & ultra-high vacuum technology

Phoenix L300i JMG No: 1045343

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Vacuum & Nanotechnology Solutions Guide

Vacuum & Pressure Measurement Refer Selection Guide on page 53 to personalise your needs

2 common types of pressure measurement - the right choice depends on the pressure range & the residual gases in the vacuum for your application. Gas-Type Independent: Gas-Type Dependent:

▀▀ ▀▀

Have liquid or solid diaphragms that change position under the force of all the gas molecules bouncing off them & measure absolute pressures unaffected by gas/vapour properties Measure a bulk property (thermal conductivity, ionisation or viscosity) & the pressure is dependent upon gas composition

Ultimate Vacuum (mbar)

Vacuum Gauge Types & Pressure Ranges Gas-Type Independent

<10

-10

-9

-8

-7

-6

10-5

10-4

10-2

10-3

10-1

100

101

102

103

Pages 23 - 24

Bourdon Capsule Diaphragm Capacitance Manometers (Baratron®) Pages 24 - 25

Gas-Type Dependent Piezo Gauge Thermocouple Pirani Convection/Pirani Spinning Rotor Hot Cathode (Ionization)

Cold Cathode (Ionization)

In addition to pressure range other features need to be considered: how it is affected by radiation, magnetism, temperature, vibration & corrosive gases; damage caused by switching it on at atmospheric pressure

Pressure Unit Conversion Table

1 Pa

1 bar

bar

Kg/cm2 atm g/cm2 Torr

mbar inch.Hg psi

1.02 x 10

0.9869 x 10

1.02 x 10

0.75 x 10

10-2

105

1.02

0.9869

1,020

750

1,000

29.53

14.51

1 Kg/cm2

0.980 x 105

0.980

0.968

1,000

735

980

28.94

14.22

1 atm

1.013 x 10

1.013

1.033

1,033

760

1,013

29.92

14.70

1 g/cm

0.098 x 10

0.968 x 10

0.735

0.98

0.02894

1.422 x 10-2

1 Torr

133.3

0.1333 x 10-2

1.36 x 10-3

1.31 x 10-3

1.36

1.33

0.0394

0.0193

1 mbar

-5

-2

-3

-5

-2

-3

-2

0.2953 x 10-3 0.1451 x 10-3

100

1 x 10

1.02 x 10

0.9869 x 10

1.02

0.750

0.02953

0.01451

1 inch.Hg

3,386

3.386 x 10-2

0.03454

0.03327

34.53

25.4

33.78

0.4910

1 psi

6,890

6.89 x 10

0.0703

0.068

70.3

51.71

68.947

2.036

-3

-2

-3

1 Torr = 1 mm Hg

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Vacuum Gauge Descriptions Bourdon Gauge The circular arc (Bourdon tube) is connected to the vacuum system & due to the external atmospheric pressure exerted, the end of the tube bends (more or less) during the evacuation process which moves the pointer

Capsule Vacuum Gauge Contains a hermetically sealed, evacuated, thin-walled diaphragm capsule - as the pressure reduces, the capsule deflects & mechanically moves a pointer to display a vacuum reading

Diaphragm Vacuum Gauge A sealed & evacuated vacuum chamber is separated by a diaphragm from the vacuum pressure to be measured. This serves as the reference quantity. With increasing evacuation, the difference between the pressure (which is to be measured) & the pressure within the reference chamber becomes less, causing the diaphragm to flex.

Piezo A silicon crystal diaphragm is placed over a vacuum reference pressure. The measured change in resistance (as a result of diaphragm deflection) serves as a parameter for the pressure. These gauges are accurate between the pressures of 1 mbar to ATM.

Thermocouple A wire filament is heated by running current through it. A thermocouple or resistance thermometer (RTD) is used to measure the temperature of the filament. This temperature is dependent on the rate at which the filament loses heat to the surrounding gas & therefore indicates vacuum level.

Pirani (Thermal Conductivity) Gauge Utilises the thermal conductivity of gases. The filament within the gauge head forms one arm of a Wheatstone bridge. The heating voltage which is applied to the bridge is controlled in such a way that the filament resistance & thus the temperature of the filament remains constant regardless of the quantity of heat given off by the filament. Since the heat transfer from the filament to the gas increases with increasing pressures, the voltage across the bridge is a measure of the pressure.

Convection/Pirani A standard Pirani gauge has an accurate measuring range 10-4 to 10 mbar. By taking advantage of the convection currents that are generated above 1 mbar, convection-enhanced Pirani gauges increase the accuracy of the vacuum range to atmosphere.

Spinning Rotor Measures the amount a rotating ball is slowed by the viscosity of the gas being measured. The ball is magnetically levitated inside a steel tube closed at one end & exposed to the gas to be measured at the other. The ball is brought up to speed & the speed measured after switching off the drive, by electromagnetic transducers - most useful in calibration & R&D laboratories where high accuracy is required.

Hot Cathode (Ionization) Gauge Commonly use 3 electrodes. A hot cathode emits electrons which impinge on an anode. The gas is ionized & the resulting positive ion current is detected through the third electrode (ion detector) & this current is used as the pressure measurement (hot cathode sensors are based on the Bayard-Alpert principle).

Cold Cathode (Ionization) Gauge (Penning) Pressure is measured through a gas discharge (within a gauge head) which is ignited using a magnetron source - the resulting ion current is measured & is proportional to the prevailing pressure.

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Vacuum & Nanotechnology Solutions Guide

Vacuum Gauges & Transducers Gas-Type Independent Single Range Gauges Capacitance Manometers (Baratron® Gauges) ‘Capacitive measurement’ is a plate capacitor comprising of a variable diaphragm & a fixed electrode. When the distance between the 2 plates change, a change in capacitance results. This change, proportional to the pressure, is then converted into a corresponding electrical measurement signal. An evacuated reference chamber serves as the reference for the pressure measurements.

Instrument

Measurement

Range mbar (Full Scale)

Heated or Ambient

Temp

Comments

141A

Absolute

1 to 1,300

Ambient

0 to 50°C

142A

Absolute

1 to 1,300

Heated

100°C

722B

Absolute

1 to 1,300

Ambient

0 to 50°C

727A

Absolute

1 to 1,300

Heated

45°C

a-Baratron®

Absolute

0.1 to 1,300

Heated

• Accurate to 0.1% of Reading 45° to 100°C • 15-pin D subminiature electrical connector • RoHS compliant

631D Baratron®

Absolute

1 to 1,300

Heated

45°C/200°C

627C e-Baratron®

Absolute

1 to 1,300

Heated

45°C

• Ethernet/IP-compatible • External LEDs indicate device status • Uses MKS’ standard capacitance sensor

i-Baratron® DMB (45°C)

Absolute

1 to 1,300

Heated

45°C

• DeviceNet digital or analog • Etch sensor available below 130 mbar • RoHS compliant

Absolute

1 to 1,300

Ambient

45°C

• Five decades of measurement range • Independent of gas composition • Integrated signal conditioner

Absolute

1 to 1,300

Heated

45°C

• Accurate to 0.05% of Reading • High accuracy for process or metrology environments

Differential

1 to 1,300

Heated

45°C

• Accurate to 0.05% of Reading • High accuracy for process or metrology enviroments

Absolute

1 to 33,000

Ambient

Bakeable to 200°C

Entry Level

#1030937

#1031114

#1219048

• Fully adjustable set point from 0.2% to 100% of Full Scale • Corrosion resistant • Fast response switching • Fully adjustable set point from 0.2% to 100% of Full Scale • Corrosion resistant; Fast response switching • Helps reduce system size • 0-10 VDC or 0-5 VDC output available • Corrosion resistant; RoHS compliant • Smallest heated Baratron® manometer • Designed for semiconductor precursor gas delivery, biopharm & thermal processing, etc

Mid Range #1226963

• Ideal for freeze drying & demanding etch applications • Can be sterilised

High End 120AD/AD #1286590

690A #1282550

698A #1289203

121A #1027895

• • • •

0-10 VDC for 10% or 100% of Full Scale Five decades of measurement range Independent of gas composition Optimal for engine testing, flow test stands

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Gas-Type Independent

Ultimate Vacuum (mbar)

Single Range Gauges

<10-10 10-10

10-9

10-8

10-7

Capsule Vacuum Gauge Capsule Vacuum Gauge #1244180

#1290609

Absolute Piezo

Gas-Type Dependent <10-10 10-10

Provides high accuracy & repeatability

925

Measurement 1-2 decades lower than standard Pirani

354 #1250720 Micro-Ion®

Stand-alone compact cold cathode

Smallest Bayard-Alper style with greater burnout resistance

347

Stabil-Ion gauge provides unmatched stability/ repeatability over time

274

Available with burn-out resistant filaments & standard connections

#1066256 Stabil-Ion®

#1282661 Bayard-Alpert Ionization

423, 431 #1290679 I-Mag® Cold Cathode

103

10-9

10-8

10-7

10-6

10-5

10-4

10-3

10-2

10-1

100

101

102

103

Cold Cathode Ion Sensor

High sensitivity for low noise & higher accuracy

355

#1222790 Micro-Ion® Bayard-Alpert

102

Convection enhanced Pirani & factory calibrated

275

UniMag™

101

Ultimate Vacuum (mbar)

Single Range Gauges

971B

100

MEMS based Piezo sensor with diaphragm based sensor

902B

#1250631

10-1

Leybold classic diaphragm gauge

#1244181

Micro Pirani

10-2

Classic mechanical diaphragm tube gauge

Diavac DV 1000 (Diaphragm)

#1307310 Convectron® Pirani

10-3

Classic mechanical diaphragm tube gauge

#1244179

275

10-4

Classic mechanical bourdon tube gauge

Bourdonvac C #1244185

#1249698

10-5

Classic mechanical bourdon tube gauge

Bourdonvac A #1244178

Mini-Convectron®

10-6

Glass Nude

Based on inverted magnetron design with unique dual feedthrough

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Vacuum & Nanotechnology Solutions Guide

Wide Range Gauges

Ultimate Vacuum (mbar) <10-10 10-10

910

#1124823 Dual Trans™ Micro Pirani/Absolute Piezo

390

#1219049 Micro-Ion ATM

972B

Combination cold cathode, Micro Pirani

974B #1243880 QuadMag™

392

#1282654 Micro-Ion Plus

10-7

946

Vacuum System Controller

307

#1055203 Bayard-Alpert

350

#1226991 Bayard-Alpert UHV

358

#1068225 Micro-Ion®

370

#1069977 Stabil-Ion®

475

#1302385 Convectron®

937B #1249475 Vacuum Gauge Controller

10-4

10-2

10-3

10-1

Cold Cathode Ion Sensor

Micro-Ion & Conductron are combined for full range measurement

101

102

103

Absolute/Differential Diaphragm Sensor

Heat-Loss Sensor

Absolute/Differential Diaphragm Sensor

Cold Cathode Ion Sensor

Combination cold cathode, Micro Pirani, differential Piezo

100

Absolute/Differential Diaphragm Sensor

Heat-Loss Sensor

Hot Cathode Ion Sensor

Absolute/Differential Diaphragm Sensor

Heat-Loss Sensor

Ultimate Vacuum (mbar) <10-10 10-10

#1187632 For Series 900 Transducers

10-5

Hot Cathode Ion Sensor

Vacuum Gauge Controllers

PDR900

10-6

Heat-Loss Sensor

Micro-Ion, Conductron & 2 Piezo sensors for extended range Fast, accurate, gas independent atmospheric measurement on loadlocks

#1301370 DualMag™

10-8

Micro Pirani & absolute Piezo for increased accuracy

901P

#1123304 Micro Pirani ™/Piezo Loadlock

10-9

10-8

10-7

10-6

10-5

10-4

10-3

10-2

10-1

100

101

102

103

Stand-alone, single channel or for configuration & advanced system diagnostics Versatile half-rack controller - pressure measurement plus flow & pressure control

Flow Range 2 x 10-3 sccm to 1,000 SLM Pressure Control Range 1 or 2 Gauges

Bayard-Alpert full rack controller with optional 2 Convectron gauges

Optional UHV Gauge Optional 2 Convectron Gauges

Bayard-Alpert UHV half rack controller with optional 2 Convectron gauges

1 UHV Gauge Optional 2 Convectron Gauges

1 Micro-Ion Gauge

Micro-Ion half rack with optional 2 convectrons

Dual (sequential) Stabil-Ion full rack controller - high accuracy & repeatability

Optional 2 Convectron Gauges

1 or 2 Stabil-Ion Gauge Optional 2 Convectron Gauges

Single controller includes pre-programmed gas curves Supports wide range of sensor technologies (eg cold & hot cathode, Pirani, Piezo & Baratron® gauges)

1 Convectron Gauge

Cold Cathode Sensor Heat-Loss Sensor Capacitance Diaphragm & Piezo Diaphragm Gauge

Monitor & Control the Entire Vacuum Process ▀▀ ▀▀ ▀▀ ▀▀

Control of all vacuum components (eg fore & high vacuum pumps, up to 5 valves & 5 active sensors) Self-detection of connected vacuum devices Visualisation of the entire vacuum system on a large TFT graphic display Intuitive & easy to program with plug-&-play compatibility Vacvision

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Vacuum Gauge Descriptions Mass Flow, Control & Verification (Gas & Vapour) Refer Selection Guide on page 54 to personalise your needs

A mass flow controller (MFC) is a device which sets, measures & controls the flow of a particular gas or liquid. Our range of MKS flow controllers are designed for control of gases. Applications for MFCs include the semiconductor & coating industry, flat panel display production, gas & emission analysis as well as fuel cell technology. MFCs can be configured for either analog or digital communications. Connector Board

All MFCs have an inlet port, an outlet port, a mass flow sensor & a proportional control valve. The MFC is fitted with a closed loop control system which is given an input signal by the operator (or an external circuit/computer) that it compares to the value from the mass flow sensor & adjusts the proportional valve accordingly to achieve the required flow. The flow rate is specified as a percentage of its calibrated full scale flow & is supplied to the MFC as a voltage signal.

Valve Body

MKS integrated products combine mass flow control options with pressure measurement & control - saving space plus helps optimise investment & minimise operation costs by reducing the total number of system components needed.

Sensor Tube

Metal Valve Seal Sensor Seals Metal Valve Plug Bypass

Valve Orifice

Gaseous Flow Rate A gas flow rate describes a pressure change within a defined volume versus time. Common measurement units include the mbar.L/s (millibar x litres/seconds), SCCM (Standard Cubic Centimetres per Minute) & slm = standard litres per minute

Pressure Unit Conversion Table

atm.cc/s

Pa.m3/s mbar.L/s Torr.L/s

Lusec SCCM

atm.cc/s

0.1

0.76

760

Pa.m3/s

7.5

7,500

600

mbar.L/s

0.1

0.76

760

1.3

0.13

1.3

1,000

78.7

Lusec

1.3 x 10-3

1.3 x 10-4

1.3 x 10-3

10-3

7.87 x 10-2

SCCM

1.66 x 10-2

1.66 x 10-3

1.66 x 10-2

1.27 x 10-2

12.7

Torr.L/s

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Vacuum & Nanotechnology Solutions Guide

Thermal Based MFCs & Meters Gas/Vapour flow control can be either controlled with Mass Flow Controllers (MFC), Mass Flow Meters (MFM) or flow verifiers. Accurate, reliable gas flow delivery & control is crucial to many of today’s advanced processes. Thermal based meters sense the flow by measuring the thermal transfer between a heated tube wall & the gas stream (heat loss being directly proportionate to the gas flow).

Fast & Repeatable Performance G Series

IP66 Rated for Harsh Conditions I Series

High Performance P Series

General purpose thermal MFCs & MFMs suitable for most applications elastomer & metal sealed

Designed for industrial MFC applications (protect against water & dust) elastomer & metal sealed

Ideal for critical applications where accuracy, repeatability & pressure insensitivity are vital

High Flow

GE50A

IE50A

P9B

Full Scale Flow Rate (N2 equivalent)

5 sccm to 50 slm

Accuracy (N2 calibration gas)

±1% of Set Point

Repeatability

±0.3% of Reading

Resolution

0.1% of Full Scale

Leak Integrity - External

<1 x 10-10 scc/sec He

Input/Output Options

Analog & Digital

Full Scale Flow Rate (N2 equivalent)

5 sccm to 50 slm

Accuracy (N2 calibration gas)

±1% of Set Point

Repeatability

±0.3% of Reading

Resolution

0.1% of Full Scale

Leak Integrity - External

<1 x 10-10 scc/sec He

Input/Output Options

Analog & Digital

Full Scale Flow Rate (N2 equivalent)

5 sccm to 50 slm

Accuracy (N2 calibration gas)

±1% of Set Point

Repeatability

±0.3% of Reading

Resolution

0.1% of Full Scale

Leak Integrity - External

<1 x 10-10 scc/sec He

Input/Output Options

Analog & Digital

General Purpose

Rate

General purpose MFC for diverse applications in research & industry

IP66 Rated for Harsh Conditions

General purpose, elastomer sealed, MFC (resistant to liquid & dust)

Industrial use MFC, elastomer sealed (resistant to liquid & dust)

Choice of options to suit your requirements

GE250A

Full Scale Flow Rate (N2) Accuracy Repeatability Resolution Leak Integrity - External Input/Output Options

Special Applications

100 to 250 slm

IE250A

IE1000A

250 to 1,000 slm

100 to 250 slm

1% of Set Point

±1% of Set Point

±0.5% of Reading

0.1% of Reading

<1 x 10-9 scc/sec He

Analog & Digital

Certain process vapours & gases require MFC’s of a special design specific to the material plus process conditions - requiring flow control at elevated temperatures &/or low pressure drop conditions given the source material characteristics Contact us for further information regarding your specific needs

1640A

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General Purpose & Compact MFC

Wide range of analytical, enviro, PVD & coating applications MFM versions are available MF-1

Full Scale Flow Rate (N2 equivalent)

10 to 50,000 sccm

Accuracy (N2 calibration gas)

+0.2% of Full Scale

Repeatability

±0.2% of Full Scale

Resolution

0.1% of Full Scale

Leak Integrity - External

<1 x 10-9 scc/sec He

Input/Output Options

Analog & Digital

In-Situ Mass Flow Verifiers Provide fast, accurate verification of MFC & MFM performance - fully integrated diagnostic instruments that measure a pressure rate-of-rise into a known volume at a known temp to determine mass flow (±1% of Reading)

Fully Integrated Diagnostics ▀▀ ▀▀

Tru-Flo MFV consists of a small gas volume, MKS Baratron pressure sensor, shut off valves & control electronics combined into a single compact package Provides in situ verification of MFC performance on semiconductor process tools

Tru-Flo

Fast & Accurate Verification of MFCs & MFMs ▀▀ ▀▀

HA-MFV (High Accuracy-Mass Flow Verifier) is designed for use on process tools Gas flows are verified significantly better than older rate-of-rise devices or process chamber rate-of-rise methods 1HA-MFV

Flow Ratio Controllers Delta Series ▀▀ ▀▀ ▀▀ ▀▀

Critical process control instrument providing the latest in gas flow ratio measurement & control technology Provides the ability to distribute gas or gas mixtures to 2, 3 & 4 different zones respectively Divides & controls mixed process gas flows to multiple chambers or zones at ratios specified by the user Widely used in a variety of flow splitting applications such as etching, stripping & PECVD

General Purpose Delta II

Pressure Controllers

Delta III

Delta IV

Electronic Pressure Controller

Electronic Pressure Controller with Mass-Flo® Meter

Integrated Pressure Controller

Integrated Pressure Controller with MFM

640B

649B

πPC

πPC with MFM

Used to contol pressure/vacuum applications where precise pressure control is required

Pressure Range (Full Scale)

10 mbar to 6.9 bar

10 to 1,300 mbar

1,300 mbar to 6.9 bar

Orifice Range (Full Scale)

50 to 50,000 sccm

50 to 5,000 sccm

50 to 50,000 sccm

50 to 30,000 sccm

Reading Accuracy

±0.5% of Reading

±1.0% of Reading

>2 to 100% of Full Scale

Conrol Range

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Vacuum & Nanotechnology Solutions Guide

Gas Analysis - Mass Spectrometry Vacuum Quality Monitor (VQM) Systems World’s Fastest, Lowest Power Mass Spectrometer ▀▀ ▀▀ ▀▀

▀▀ ▀▀ ▀▀

Full data collection, spectral deconvolution & data logging Ultimate vacuum range (mbar): 10-5 to <10-10 Mass Range (& Scan Time): 1 to 145 amu (in 85 msec); 1 to 300 amu (in 120 msec) Consists of auto-resonant ion trap mass spectrometer gauge, VQM controller & VQM viewer software Smaller, easier to calibrate & 20 times faster than traditional Quadrupole RGAs Instant access to critical measurement information including the 10 most prevalent gases in normalised, percentage & absolute values plus total & partial pressure trend graphs 835 VQM System JMG No: #124966

Extends Pressure Range of 835 VQM Up to 4 mbar ▀▀ ▀▀ ▀▀ ▀▀

Ultimate vacuum range (mbar): 4 to 10-10 Applications include monitoring gas reactions, detecting contaminants, controlling the amount of reactive gas introduced, leak detection, detecting when to start a process Calibration completed in seconds with just a few clicks of the mouse Intuitive graphical user interface software

835 VQM Differential Pump System JMG No: #124966

Residual Gas Analysers - Quadrupole General Purpose RGA ▀▀ ▀▀ ▀▀ ▀▀ ▀▀ ▀▀

Ranges (amu) 100 or 200 Maximum data acquisition speed <3ms per point for analog scans Max operating pressure 10-4 Minimum detectable partial pressure: Faraday (2.6 x 10-11 mbar), Multiplier (6.7 x 10-14 mbar) Dedicated real-time acquisition processor with web-server interface Applications include leak detection of vacuum lines, welds & seals, vacuum diagnostics, pump down monitoring, chamber bake out monitoring, monitor cryo-pump performance

e-Vision 2

Stability, Accuracy & Speed Come Together ▀▀ ▀▀ ▀▀ ▀▀ ▀▀

Ranges (amu) 100, 200 or 300 Collects data at <3 milli-second speeds per data point for analog scanning Max operating pressure 10-4 Min detectable partial pressure: Faraday (2 x 10-11 mbar), Microchannel plate (5 x 10-14 mbar) Ideal for applications where knowing the contents of your chamber is critical - semiconductor manufacturing, large scale coating tools, ultra-high vacuum & harsh environments Microvision 2

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Non-Dispersive InfraRed (NDIR) Refer Selection Guide on pages 55-57 to personalise your needs Atmospheric Quadrupole Mas Spec ▀▀ ▀▀

▀▀

▀▀ ▀▀

Work beyond the limits of conventional quadrupole MS technology - more easily detect & monitor trace gases for extreme detection capability The proven quadrupole MS platform utilises patented V-lens ion optics with a double-focussing & deflection capability (producing a consistently low baseline for any gas species - enabling trace level detection with greater clarity & confidence) Ideal for on-line monitoring & analysis of gases & gas mixtures - including trace contaminants in process gases, solvent vapours, hydrocarbons, atmospheric & inorganic gas species (including corrosives), freons & noble gases Easy to install & operate - features automatic start-up & shut-down routines plus built-in vacuum & heater inter-locking for system protection Versatile, compact design plus powerful automatable software control

CIRRUS 3XD

Fourier Transform InfraRed Spectroscopy (FTIR) Refer Selection Guide on pages 55-57 to personalise your needs Real Time, Continuous Detection of Toxic Gases ▀▀ ▀▀ ▀▀ ▀▀ ▀▀

Self-contained, ultra-sensitive, FTIR based gas analyser that rapidly detects toxic gases & chemical warfare agents (with no false positive alarms & >97% detection) Single-digit parts per billion (ppb) detection of a broad range of threats Rapid response - typically <20 seconds Ethernet connectivity for remote monitoring Compact & rugged design for reliable performance

AIRGARDPlus CWA/TIC

Complete Continuous Emissions Monitoring Systems (CEMS) ▀▀ ▀▀ ▀▀ ▀▀ ▀▀ ▀▀

Designed for integration with complete continuous emissions monitoring systems to measure gaseous emissions from stationary sources such as waste incinerators, power plants, cement kilns, large combustion plants, turbine engines Meets DIN EN 15267-3 standard Spectral Resolution 0.5 cm-1 Directly analyses hot, wet effluent gas streams without the need for sample pre-treatment Permanent reference calibration spectra (all but eliminates costly calibration gas cylinders)

MGS300

Gas Component

Certification Range

Supplementary Range 1

Supplementary Range 2

Detection Limit

NH3

0 to 10 mg/m3

0 to 75 mg/m3

0 to 75 mg/m

0 to 300 mg/m

0 to 1,500 mg/m

0.50 ppm

SO2

0 to 75 mg/m

0 to 300 mg/m

0 to 2,000 mg/m

0.60 ppm

0.35 ppm 3 3

0 to 200 mg/m

0 to 400 mg/m

0 to 1,500 mg/m

0.50 ppm

NO2

0 to 50 mg/m

0 to 100 mg/m

0 to 1,000 mg/m

0.40 ppm

HCI

0 to 15 mg/m3

0 to 90 mg/m3

0 to 200 mg/m3

0.20 ppm

0 to 3 mg/m3

0 to 10 mg/m3

0.25 ppm

CH4

0 to 15 mg/m

0 to 50 mg/m

0 to 500 mg/m

0.30 ppm

0.025%

CO2

0 to 25%

H2O

0 to 40%

N2O

0 to 50 mg/m

3 3

0 to 100 mg/m

0.25%

0 to 500 mg/m

0.10 ppm

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Vacuum & Nanotechnology Solutions Guide

Thin Film Systems

Refer Selection Guide on page 58 to personalise your needs

PVD Turn-Key Systems ▀▀ ▀▀ ▀▀ ▀▀

▀▀

Highly versatile semi-automated or fully automated customised systems Magnion Series are integrated into flexible, versatile thin-film deposition systems Magnetron cathodes operate in DC, pulse-DC, AC or RF biasing Option to include Plume Series (remote plasma source for reactive sputter deposition) typically substrate holders have rotary motion & option to include heating, biasing & manual or automated axial motion Magnion Series include: o Hybrid deposition systems o R2R web deposition systems o Table-top & compact deposition systems

Magnetron Sputtering

Compact Table-Top Systems Integrate virtually all features of larger PVD, CVD, PECVD, PE, RIE & hybrid systems Includes process automation, data acquisition & remote access in small footprint ▀▀ Can be integrated into glovebox ▀▀ Deposition & processing tools available: o Magnion sputtering magnetron: target 1” to 3” in diameter, planar, conducting or dielectric; balanced or unbalanced magnetic geometry; RF or DC generator; shutter (optional); water-cooling o Flarion reactors: ICP or CCP reactors; RF power continuous or pulsed; suitable for PECVD & etching applications o EVAD evaporation source modules o Hybrid PVD: combined magnetron & evaporation ▀▀ ▀▀

Compact & Table-Top

CVD, MOCVD, ALD, PECVD & PE-ALD Reactors ▀▀ ▀▀ ▀▀

▀▀

Parallel plate configuration used for most coatings of semiconductor wafers In parallel plate PECVD, the showerhead is typically the biased electrode For industrial PECVD applications, work pieces & holders are biased & reactor wall is the ground CVD-based reactors are configured as ‘hot wall’ or ‘cold wall’ - controlling wall temperature prevents or minimises condensation of vapours on reactor walls - the substrate or work piece holders are heated to high temperature to optimize the molecular disintegration of gases & vapours & reactive formation of solid coatings

Flarion Series

Plasma Assisted Processing Flarion-RF Series plasma reactors – either: ▀▀ Capacitively Coupled Plasmas (CCP) in etching reactors are generated between 2 parallel electrodes - the power is applied to lower (Reactive Ion Etching, RIE) or upper electrode (Plasma Etching, PE) - the lower electrode is the substrate holder & top electrode forms the gas showerhead ▀▀ Inductively Coupled Plasmas (ICP) are generated by coupling the RF field of a coil-shaped antenna to plasma through a dielectric - in ICP reactors, the substrate holder is often biased, allowing independent control of plasma density & the energy of ions bombarding the substrate (required for Deep Reactive Ion Etching [DRIE] process)

Capacitively Coupled Plasma

Inductively Coupled Plasma

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Horizontal Tube Furnaces – CVD, PECVD & ALD ▀▀ ▀▀ ▀▀ ▀▀ ▀▀

▀▀

EVAD Series

▀▀

EVAD series CVD & PECVD horizontal tube furnaces are highly versatile units allowing deposition & synthesis of various materials from gaseous, vapour, liquid & solid sources Rotary versions are also used for treatment & synthesis of powders Provisions to tilt furnace for loading & unloading the powder can also be integrated The furnaces have the option to operate with single or multi heating zones Combined with Flocon series gas, vapour & liquid flow management systems, these furnaces offer unparalleled flexibility Combining PLUME series ICP plasma sources with furnace allows conversion to PECVD furnace

Plasma Systems for Lab & Small Series Production ▀▀

▀▀ ▀▀ ▀▀ ▀▀

▀▀

Process is fully monitored by controller - simply control process time, power & 4 pressure settings (1 of which is variable) Ideally suited for cleaning or surface modification of small components Internally pre-program process & attach different gasses – very flexible system As well as plasma cleaning & degreasing, etching & coating are all easily performed Applications include: Surface coatings to achieve hydrophobic (water repellent), hydrophilic (water wetting), lipophobic (grease repellent), oleophobic (oil repellent) Flecto systems are used for medical, engineering, R&D in semiconductor industry, plastics engineering, electrical engineering & auto industry SmartPlasma 30

Plasma Systems for Production Applications such as pre-cleaning, surface structuring & activation plus widely used for coating to make surfaces either hydrophobic or hydrophlic, to be anti-fogging & in order to modify the coefficient of friction ▀▀ Time, pressure & power variable parameters ▀▀ Industry applications: o Plastics: surface modification without using aggressive fluids o Metal Working: 3 dimensional cleaning of complex parts & corrosion protection o Electronics: anti-static process for cleaning surfaces & particle removal o Medical: Non-contaminating & sterile plus create extremely pure surfaces o Automobile: good adhesion of paints, plastics to metal & elastomers o Elastomer Technologies: bonding of elastomers to high performance polymers (eg pump diaphragms) for corrosive applications, high performance seals, etc ▀▀ Double door system as entry point for parts in a controlled area ▀▀

PlasmaActivate 100 DT

Thin Film Deposition System Materials Sputtering Targets o Deposition sources, power supplies, spares & accessories ▀▀ Evaporation Materials o Electron beam & thermal resistive evaporation deposition sources, power supplies, controls, monitors, spares & accessories o Resistive evaporation deposition sources, power supplies, controls, monitors, spares & accessories ▀▀

Sputtering Targets

Evaporation Materials

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Vacuum & Nanotechnology Solutions Guide

Nano Fabrication Electron Beam Lithography Encompassing fields such as nanophotonic & solid state circuits, microelectromechanical systems & microfluidic systems

ELS-F125

Lithography Performance

Electron Optics System

Lithography Unit

ELS-G100

Drawing Method

Vector scan

Stage Movement

Step & repeat

Electron Beam Shape

Spot beam (Gaussian)

Lithography Field Size

2,400 µm x 2,400 µm (max)

3,000 µm x 3,000 µm (max)

Minimum Line Width

<5 nm

<6 nm

Emitter

Zr0/W thermal field emitter

Beam Diameter

1.7 nm

1.8 nm

Exposure Area

210 mm x 210 mm

130 mm x 150 mm

Stage Movement Range

X direction: 210 mm

X direction: 156 mm

Y direction: 230 mm

Y direction: 156 mm

Z direction: 10 mm

Z direction: 5 mm

Max Specimen

8” wafer & 8” square mask (max)

6” wafer & 5” square mask (max)

Solvent Purification Systems Material

#304 stainless steel

Common Solvent

Toluene, acetonitrile ,hexane, ether, THF, DMF,

methylene chloroform, etc

Number of Solvents

3, 5 or 7 (per user requirements)

Purification Capacity/Unit

≈1,200 L

Flow Rate

Up to 800 mL/minute

Technical Parameter

H2O <1 ppm; O2 <1 ppm

Fluid Reservoir

17 L

Internal Material

Dehydration & deoxygenisation material

Particle Filter

Included

Gas Supply System

Included

Working Gas

99.99% N2-Ar

Gas Connection

1 gas supply port/solvent

Vacuum System

1 dry pump

Explosion-Proof Cabinet

Fire-proof cabinet

7 Column

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Plasma & Surface Modification MKS is the leading manufacturer of high reliability, compact, solid state, mid to extended (VHF) frequency RF power generators, impedance matching networks & plasma metrology, RF amplifiers for MRI equipment plus pulsed & continuous DC power generators in power levels up to 60 kW

Direct Current Power Generators Optima® series offer process versatility & performance via a variety of output regulation modes, user adjustable settings & control options OPT 400

Pulsed Direct Current Power Generators RPDG series provide asymmetric bipolar & unipolar pulsed DC power while retaining accuracy, repeatability & flexibility

Power Output

5 to 100 kW

Max Output Voltage

800 V

Power Limits

5.25 to 63 kW

Current Limits

5 to 126 A

Linearity/Accuracy ±0.1% Regulation Modes

Volts, Amps, Watts

Power Output

5 to 100 kW

Max Output Voltage

800 V

Power Limits

5.25 to 63 kW

Current Limits

5 to 126 A

Linearity/Accuracy ±0.1% RPDG 200

Regulation Modes

Volts, Amps, Watts

Radio Frequency Power Generators High Power Density, Exceptional Stability & Generous Power Margins ▀▀ ▀▀ ▀▀

Cover the full range of frequencies (from 2MHz to VHF) & power ranges (from 300 to 13,000 W) Response time to power set point changes & process transitions is 500 µS (advanced RF plasma generation & control for low cost & high yield in the most demanding thin film processing applications) Applications include semiconductor & thin film (etch, deposition), solar cells (PECVD, PVD), LED (deposition, etch)

Choice of 3 models Elite™ products feature excellent stability, generous power margins & field proven reliability plus can be enhanced with various pulse capabilities - Rated Power Outlet: 1 to 750 W - Frequency: 13.56 MHz - Stability & Accuracy: ±0.005% - Dynamic Power Range: 200 to 750 W

▀▀

SurePower® platform: - Most advanced class of 13.56 MHz generators commercially available - Highest reliability, reproducibility & accuracy of any generator in the marketplace today - Power levels from 3.5 to 13.0 kW

▀▀

GHW platform offers power accuracy, repeatability & high yield: - Rated Power Outlet: 1,250 to 5,000 W - Frequency: 13.56 MHz - Stability & Accuracy: ±0.005% - Dynamic Power Range: 10 to 5,000 W

▀▀

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Vacuum & Nanotechnology Solutions Guide

Microwave Power Generators Designed for Demanding Semiconductor Fabrication & Plasma Applications

Power Output

Cost effective, field-proven & high performance family of microwave generators for demanding semiconductor fabrication

180 W to 6.0 kW

Frequency

2440 to 2470 MHz

Regulation

>1% of output power

Output Accuracy ±1.5% Ripple

±1% of output power

AX2500

Air Cooled & State-of-the-Art Generator ▀▀ ▀▀ ▀▀

▀▀

SG 524

▀▀

Small form factor with solid state design 48 cm rack-mountable for easy integration Advanced high-frequency transistor design for precision power & output frequency control Integrates a dynamic frequency tuning capability to minimise the ratio of reverse to forwarded power Withstands up to 100% reverse power conditions for optimum reliability

Microwave Source & Generator Packages ▀▀ ▀▀

▀▀ ▀▀ ▀▀

Rugged & reliable switch mode power supplies for demanding industrial applications Compact generators up to 3 kW in a 48 cm standard rack with a remote head & integrated isolator Equipped with reflected power detection Proven switch mode technology Extremely compact & light weight AL20000

915 MHz Industrial Microwave Generators ▀▀ ▀▀ ▀▀ ▀▀ ▀▀ ▀▀

Provides 15 to 75 kW power Continuous powerline control Safety interlocks A variety of interface options (plus optional remote control) Switch mode power supply systems with continuous power control Rugged, light weight & modular microwave generator systems

GS Series

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Surface Science Analysis Quantum Transport Measurement

Measurement speed increase of up to 1000x compared to conventional measurement systems with superior performance Small footprint plus plenty of signals & a powerful/customisable user interface for sophisticated scientific research High-resolution AD/DA conversion, signal conditioning & fast signal processing Complete measurement platform with advanced data optimisation algorithms & framework that can be further adapted with a wide range of add-on modules Higher-performance & higher-speed replacement for DC sources, lock-in amplifiers, multimeters, oscilloscopes, etc

▀▀ ▀▀ ▀▀ ▀▀ ▀▀

Nanonis Tramea

Specialised System for Surface Analysis ▀▀ ▀▀ ▀▀ ▀▀ ▀▀ ▀▀ ▀▀ ▀▀

5 nm resolution, 90° magnetic deflector Cold field emitter, Energy filter (optional) Rapid LEED/LEEM switching, Fast sample exchange Energy filtered PEEM with focussing UV source UVS 300 Aberration corrector (upgrade option), <2 nm resolution The magnetic prism transfers both LEEM image & LEED pattern astigmatically (allowing switching between real image & diffraction) Sophisticated energy filter enables imaging with energy resolution down to 250 meV Applications: PEEM (Photoelectron Emission Microscopy), MEM (Mirror Electron Microscopy), dark field imaging, phase contrast, reflectivity contrast, LEED (Low Energy Electron Diffraction), micro-diffraction, spectroscopy with energy filter

FE-LEEM/PEEM P90 Series

Electron Spectroscopy for Chemical Analysis Under Environmental Conditions

Enables analyses at pressures far above UHV Designed for high-throughput analysis & opens up new applications in the fields of medical technology, biotechnology & life sciences Shortest loading-to-measurement time on samples of all types (including liquids, tissue, plastics & foils, powders, soil, zeolites, rocks, minerals plus ceramics) Controllable atmosphere (sample loading to analysis) Compatible with all kinds of samples/sizes up to Ø 60 mm & 40 mm in height Sample journal for complete documentation Reproducible analysis recipes , μ-Focus X-ray source High resolution XPS

▀▀ ▀▀ ▀▀ ▀▀ ▀▀ ▀▀

EnviroESCA JMG No: 1282082

▀▀ ▀▀

ARPES & PEEM Spectrometer ▀▀ ▀▀ ▀▀ ▀▀ ▀▀ ▀▀ ▀▀ ▀▀ ▀▀ ▀▀

Time-of-flight momentum microscope Direct imaging of energy filtered 2D-momentum space Parallel detection of up to 1,000 energy slices Energy resolution <15 mev, angle resolution <0.1°, lateral resolution <50 nm Easy switching to PEEM mode Allows image electrons emitted from a surface with lateral resolution (optical imaging) plus energy & angular dispersive measurements (ARPES) Ideal for combined microscopic & spectroscopic measurements & allows collecting photoelectron spectra instantly at the same spot as seen in the microscopy mode Real-space as well as k-space imaging is possible via on-the-fly switching Lens can collect the complete hemisphere of ejected electrons (±90° in x & y) Main benefit is measurements can be performed with high transmission (eg with very high intensity on a short time scale)

METIS

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Vacuum & Nanotechnology Solutions Guide

XPS Chemical Mapping

X-ray photoelectron spectroscopy (XPS) & ultraviolet photoelectron spectroscopy (UPS) is used to analyze the surface chemistry of a material ▀▀ XPS spectra are obtained by illuminating the sample surface with monochromatic X-rays & measuring the photo emitted electrons ▀▀ Centrepiece for electron spectroscopy, the flexible hemispherical analyzer PHOIBOS is available in multiple configurations for ESCA, XPS, ARXPS, ARPES, UPS, AES, SAM, ISS, snap shot data acquisition & 2D detection modes ▀▀ Depending on the application, suitable excitation sources include: o X-ray sources for XPS/ESCA including twin anode X-ray source XR 50 & monochromatic X-ray source FOCUS 500 & special μ-FOCUS sources o Electron source EQ 22 for AES & electron sources for SEM/SAM down to 100 nm lateral resolution o Variety of UV sources for UPS o Flood Gun FG 15/40 for charge compensation o Ion sources for sample preparation, depth profiling & ISS o Sample manipulator with up to 6 axis with heating & cooling facilities ▀▀

SEM/SAM+XPS System

Hemispherical Energy Analyzer ▀▀

▀▀ ▀▀ ▀▀

Phoibos100/150

▀▀ ▀▀

Combines excellent performance and highest reliability for the largest possible variety of experimental conditions. The most advanced and sophisticated computer simulations were used to fully characterize and optimize the electron optical properties of the analyzer and transfer lens. Available with 100, 150 & 225 mm mean radius Due to modular construction, easily adapted for special requirements Lens system constructed entirely from non-magnetic materials inside μ-metal shielding Ultimate resolution with superior performance in XPS, UPS, AES, ISS Applications: angular mapping, high pressure XPS, small spot XPS analysis, XPS imaging

Near Ambient Pressure Hemispherical Energy Analyser ▀▀ ▀▀ ▀▀

▀▀

True 180° hemispherical energy analyzer with 150 mm mean radius Constructed entirely from non-magnetic materials inside the μ-metal shielding Transfer optics: the first aperture is shaped conically with a half angle of 35° (with diameter down to 0.3 mm, maximizes differential pumping & brings pressure down to 10 to 3 mbar range a few millimetre from the sample - this cone is detachable & can be exchanged by similar cones with different aperture diameters) Differentially pumped electrostatic pre-lens, with a three-stage differentially pumped Phoibos 150 analyzer - providing 4 separate pressure stages separated by apertures Phoibos 150 NAP

Channeltron Detector ▀▀ ▀▀ ▀▀ ▀▀ ▀▀

Extended Range Channel Electron Multiplier (CEM)

▀▀

Phoibos analyzer is equipped with either 1, 5 or 9 single channel electron multipliers (SCD, MCD-5 or MCD-9) Specially formed & treated glass tube which has the effect of multiplying a single electron at input to a pulse of ≈108 electrons at output Due to low resistance, the extended range is suitable for extremely high count rates Maximum (measured) count rate detectable is 16.8 Mcps (standard CEMs: 5.6 Mcps) per channel Linearity & non-extended dead time behaviour up to 10 Mcps true count rate Applications: CEM 5 or 9 channeltron detector for the PHOIBOS analyzer is suitable for extremely high count rates without serious degradation

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Chemical Mechanical Polishing Lapping & Polishing Lapping: mechanical process involving counter rotating plates using a chemical abrasive within a defined grain size distribution for material removal with minimum specimen damage. Polishing: chemical, mechanical process often seen as the final material removal process that takes place after lapping, to reduce the amount of surface & sub-surface damage to the specimen.

Lapping & Polishing System Combined - Benchtop ▀▀ ▀▀ ▀▀ ▀▀ ▀▀ ▀▀

Highly flexible, able to work with many different materials including gallium arsenide, silicon, rock & soils Provides ability to produce specimens repeatedly with superior quality Process up to 100 mm/4’’ wafers Bluetooth automatic-plate-flatness control provides continuous in-situ measurement of the plate flatness with real-time data collection & feedback Recipe mode allows operators to create, save & re-call multistage process recipes All process conditions are controlled via a graphical user interface

PM6

Lapping System ▀▀ ▀▀ ▀▀ ▀▀

4 station unit with process capacity of up to 200 mm per station Lapping jigs are motor driven allowing for high geometric accuracy & consistent sample rotation resulting in excellent wafer uniformity Material removal rates can be monitored & controlled to micron levels of accuracy Individual jigs can be programmed to automatically lift when target removal amounts have been reached - allowing for automated operations & preventing over processing

DL4

Polishing System ▀▀ ▀▀ ▀▀ ▀▀ ▀▀

4 station unit with process capacity of up to 260 mm per station Polishing carrier head can apply up to 50 kg per carrier head of download Manual mode: individual process parameters & variables can be controlled Automatic mode: operators can save & re-call multi-stage process recipes Graphical representation of key parameters displayed during processing (real-time analysis) DP4

Chemical Polishing Chemical polishing: widely used as a finishing process for applications that require stringent control over wafer geometry in terms of surface finish, flatness, specimen parallelism & thickness – provides excellent surface polish.

Wafer Process Capacity up to 100 mm Diameter

Compact system designed to fit inside existing fume extraction cabinet Process up to 3 x 112 mm samples at once Typical applications are final chemical etch polishing before device fabrication or epitaxial growth analysis of the following materials: o Cadmium telluride & mercury cadmium telluride for use in infra-red detectors & other devices o Thin & ultra-thin wafers of semiconductor materials

o Cadmium Sulphide & similar electro-optic materials

▀▀ ▀▀ ▀▀

CP3000

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Vacuum & Nanotechnology Solutions Guide

Chemical Mechanical Polishing Chemical mechanical polishing (or planarization): process of smoothing surfaces with the combination of chemical & mechanical forces removes material & even out any irregular topography, making the wafer flat or planar

Bench Top ▀▀ ▀▀ ▀▀ ▀▀ ▀▀ ▀▀

Process part & full wafers up to 100 mm on 400 mm polishing plate Produces laser quality surfaces (0/0 scratch dig) Highly versatile system can be tailored through the use of different carrier heads, polishing templates, wet bench modules or end point detection Collect numerous data variables via multiple sensors in order to identify & analyse various in-situ factors on the material samples Ability to automate an entire CMP process consisting of various sub-processes - freeing up operators time Recipe mode allows users to build, save & re-call multi-stage recipes CMP Tribo

Floor Standing ▀▀ ▀▀ ▀▀ ▀▀

High capacity workspace for two samples up to 200 mm (or multiple smaller samples through use of templates) Produces results typically seen on production scale equipment whilst keeping a laboratory scale footprint Allows for bespoke approach in machine set-up & operation by allowing operator to configure a wide range of parameters & process conditions via touch screen interface Highly adaptable system can be utilised for back-end IC manufacturing, Micro-Electromechanical Systems (MEMS) fabrication, OptoMEMS & Bio-MEMS fabrication

CMP Orbis

Bonding & Impregnation Semiconductor wafer bonding systems for process lapping preparation & vacuum impregnation for pre-process core stability for porous or brittle materials

Wafer Substrate Bonding Units ▀▀ ▀▀ ▀▀ ▀▀ ▀▀

Premium bonding for processing fragile semiconductor materials such as indium phosphide & gallium arsenide Available as single or 3 station benchtop with wafer process capacity of 100 mm or 150 mm Range allows operators to bond single or multiple wafers simultaneously Recipe mode allows creation & re-call recipes to ensure easy process repeatability Full pressure bonding process (evacuation of wafer chamber, heating, pressure bonding & cooling) completed within the bonding chamber automatically

WSBU

Vacuum Impregnation Units ▀▀ ▀▀ ▀▀ ▀▀

Self-contained bench top unit for high quality encapsulation & impregnation of specimens with synthetic resins Ideal for impregnation where material types are too soft or friable for processing from raw state (including soils, concretes, cements & clay) Large sample capacity for sections up to 150 mm x 100 mm Independent evacuation of resin & samples

IU30

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Test & Measurement Contact Measurement Gauge ▀▀ ▀▀ ▀▀ ▀▀

For linear dimensional measurement applications Connect to PC where data can be recorded for analysis Available for samples either up to 150 mm or 200 mm Probe details: o Linear measuring range: 10 mm o Accuracy over full range: 1 µm o Repeatability: 0.2 µm o Resolution: 0.1 µm o Gauging force: 0.6 to 0.9 N (0.135 to 0.203 lbf) o Zero drift: 0.1 µm/°C

CG10

Flatness Measurement ▀▀ ▀▀ ▀▀ ▀▀ ▀▀

Grazing incidence interferometer provides high precision flatness measurement of ground, lapped or semi-polished samples up to 150 mm diameter Measure 2 µm per fringe with excellent clarity Surface roughness measurement from 1 nm to 300 nm Ra Unlike conventional fizeau interferometers, it can be used for measuring non-reflective surfaces Applications are virtually limitless - whether for flatness measurement or quality assessment - excellent solution when processing semiconductor wafers, optical components, machined components & geological samples

G120

Angle Measuring ▀▀ ▀▀ ▀▀ ▀▀ ▀▀

Used in production of parallel specimens Ideal for measuring small angles - internal & external angular measurement of porro prisms & testing for wedge difference Setting accuracy >2 seconds of arc Suitable for use with low reflectivity specimens Specimen holding facilities make it possible to set or adjust accurately the alignment of upper surface of specimen to produce either parallel surfaces or a desired angle of specimen orientation

LG2 Autocollinator

Slicing & Cutting Precision Annular Slicing & Peripheral Cutting ▀▀ ▀▀ ▀▀

Ideal for slicing samples such as wafers, crystals or semiconductor components up to 55 mm in diameter (with minimal kerf loss) or for precision dicing of wafers up to 100 mm in diameter Easily operated through set parameters (eg cut depth, cut thickness & number of cuts to be carried out) Applications include cutting & wafering of crystals, sectioning of electronic components, dicing semiconductor components, slotting to depth plus cutting a wide range of glasses, ceramics, rock samples & electro-optic materials

APD1

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Vacuum & Nanotechnology Solutions Guide

Gloveboxes Between the 2 traditional seals, Vigor has incorporated a vacuum train that eliminates diffusion from either side

No Diffusion With Vigor Seal

Diffusion Through Standard Seal

Benefits: ▀▀ Ultra-low leakage rate (<0.05% vol/hour industry standard) ▀▀ Ultra-low impurity levels (02 & H20 <1 ppm) ▀▀ Low regeneration frequency (usually once per year) ▀▀ Long seal lifetime (often >10 years) ▀▀ Ultra-low energy consumption Wide range of glovebox solutions to satisfy various applications

Standard ▀▀ ▀▀ ▀▀ ▀▀

Chemistry Synthesis

3 & 4 port Double-sided single (4 port) Double-sided three port (6 port) Double-sided double (8 port)

▀▀ ▀▀ ▀▀ ▀▀

OLED/OPV ▀▀ ▀▀ ▀▀ ▀▀

Cleanroom environment Substrate cleaning, spin coating, thermal treatment & vacuum deposition equipment Manual & automatic with temperature control Vacuum controlled drying systems

Lithium Battery & Super-Capacitor ▀▀ ▀▀ ▀▀

Nuclear Research & Industry ▀▀ ▀▀ ▀▀

Protection device for moisture & oxygen sensors Strong resistance to organic solvents Integrate with different vacuum heating &/or drying technologies

Low leakage(< 0.001% vol/h) Excellent purifier capacity (02: 60-70 L) Accurate moisture & oxygen detection Infrequent regeneration

Radiation protection: lead plate, flint glass, leaded gloves Perform no-leak/contaminated glove changing under negative box pressure Safe transfer of nuclear materials: bag-in-bag-out technologies

Additive Manufacturing ▀▀ ▀▀ ▀▀ ▀▀

Low O2 & H2O gas management integration Pre- process powder packaging enclosures Post-process de-powdering enclosures Hermetic powder storage with on-board O2 monitoring

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Freeze Drying Refer Selection Guide on page 59 to personalise your needs

FreeZone Freeze Dryers ®

4 Steps to Selecting a Freeze Dryer

Collector Temperature

FreeZone Product Lines

Aqueous Samples

Freeze Dryers

Aqueous/Solvent Mixtures

(15oC to 20oC

Aqueous/Methanol Mixtures

colder than sample freezing point)

Collector Size

All-In-One

(Total sample volume x2)

2.5 L

4.5 L

2.5 L

12 L

18 L

PTFE option for corrosive chemicals available on all models

Lab Benchtop

Lab

Lab Triad Benchtop

Lab

Console and Console with Stoppering Tray Dryer

except all-in-one

Accessories

Extras

Chambers

Accessories Tray Dryers Tray Dryers

Vials

Drying DryingChambers Chambers

Manifolds Manifolds

Trays

Flasks

Manifolds

End-Zone

Chambers

Add-ons

Vacuum Pumps

Vacuum Pump

Rotary Vane Rotary Vane Pump

-50° C

Australia: 1300 501 555

Combination or Scroll Combination Pump

-84° C

-105° C

New Zealand: 0800 651 700

Combination or Scroll Scroll Pump

-84° C

-105° C

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Vacuum & Nanotechnology Solutions Guide

Benchtop Freeze Dryers Ideal for light to moderate sample loads Vacuum break valve prevents oil back-streaming ▀▀ Vacuum control valve maintains set point vacuum level to speed drying process ▀▀ Refrigeration temperature range options: o -50°C (for samples containing water) o -84°C (for low eutectic point samples containing water or acetonitrile) o -102°C (for low eutectic point samples containing water, acetonitrile or dilute methanol or ethanol (4.5 L only) ▀▀ Capacity options 2.5 L, 4.5 L or 8.0 L (-50°C only) ▀▀ Stainless steel or PFTE-coated stainless steel ▀▀ ▀▀

FreeZone Benchtop Dryer with Chamber

All-In-One Freeze Dryers ▀▀ ▀▀ ▀▀ ▀▀ ▀▀ ▀▀ ▀▀ ▀▀

Perfect for small sample loads or numerous sample batches containing water or acetonitrile Versatile - 4 valve ports lets you freeze dry samples in flasks & on shelf at the same time Containers are stoppered while chamber is under vacuum (without use of compressed gas) No freezer or accessories needed Samples may be frozen on the shelf at a controlled rate Refrigeration temperature range -85°C Bottle capacity from 2.0 mL up to 125 mL Shelves range from -55°C to +50° (maximum of -75°C during pre-freezing)

FreeZone Triad Dryer

Lab Freeze Dryers ▀▀ ▀▀ ▀▀ ▀▀ ▀▀

▀▀ ▀▀

Suitable for moderate to large sample loads or numerous sample batches Durable steel cabinet has casters for mobility Optional built-in mini vacuum drying chamber Optional purge valve isolates vacuum pump from freeze dryer Refrigeration temperature range options: o -50°C (for samples containing water) o -84°C (for low eutectic point samples containing water or acetonitrile (6 L & 12 L only) Capacity options include 6.0 L, 12.0 L or 18.0 L (-50°C only) Stainless steel or PFTE-coated stainless steel

FreeZone Console Dryer with Stoppering Tray Dryer

Stoppering Tray Dryers ▀▀ ▀▀ ▀▀ ▀▀ ▀▀

FreeZone Stoppering Tray Dryer

▀▀

HCFC/CFC-free refrigeration system and electric heater cool and heat fluid medium that is circulated through the shelves to maintain shelf temperatures within ±1°C Pre-freeze samples on shelves at a controlled rate (annealing) – improves sample quality & eliminates need for a separate freezer & product transfer Three large adjustable shelves accommodate bulk trays or batches of serum bottles or ampules – samples may be lyophilized & then stoppered on the shelves Optional built-in 6-port tray dryer manifold increases flexibility & capacity Temperature range from -40°C to +40°C Sample volume from 2.0 mL up to 125 mL

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Containment Enclosures Extensive range of product & personal protection enclosures – to protect from exposure to hazardous particulates & vapours. ▀▀

Categories:

▀▀ ▀▀ ▀▀ ▀▀

Applications: Substances: Styles: Filtration:

Pilot plant, lab automation, glovebox workstations, chemical fume hoods, contained environments, multi-task systems, benchtop (scale up), steel manufactured, nanotechnology, compounding Drug discovery, scale up, quality control, pilot plant, manufacturing, compounding Vapour, powder, liquid, nanoparticles, aerosol, bulk powder, gas, other Glove boxes, open face, sliding door, sliding sash, removable glove panel, swing doors, draft shield No fan/no filter, dual/single HEPA, dual/single HEPA (carbon), remote fan/filter, inlet HEPA, no filter

Glovebox Workstation

Sputter Coater API Hybrid Isolator

Nanotechnology Enclosure with Stacked HEPA-Carbon Filtration

Process Equipment Enclosure

Bulk Powder Hybrid Isolator

Distillation Fume Hoods

Compounding Hood

Carbon & HEPA Filtered Vented Enclosure

Cybio DNA/RNA Research

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Vacuum & Nanotechnology Solutions Guide

Essential Lab Instruments Complimentary Vacuum Instruments

Vacuum Filtration Manifold ▀▀ ▀▀ ▀▀ ▀▀ ▀▀

Advantec 353130 JMG No: 1004624

▀▀ ▀▀

Significantly reduce process time compared to gravity methods 2 & 3 way valves feature PTFE stopcocks for smooth control Valves provide independent control at each branch for vacuum and venting Connect 3 or 6 filter holders to one vacuum source 3 way valve enable the branch to vent to atmosphere without breaking the vacuum connection PTFE valves for each branch providing individual control of vacuum & air venting Autoclavable

Sterile MCE Filters ▀▀ ▀▀ ▀▀ ▀▀ ▀▀

Advantec Sterile MCE Filters

Pre-sterilized membranes: 0.45 µm, 47 mm diameter & 100 per pack Suitable for microbiological analysis of water, wastewater, pharmaceuticals or beverages Offered with or without grid lines (grid lines facilitate counting colonies on the membrane surface) Grid squares measure 3.1 mm & represent 1/100 of area of 47 mm membrane Black membranes maximize contrast between colonies & filter; green membrane enables viewing of black, white & colourless colonies on a single filter

JMG No: 1130972

Tygon Transparent Vacuum Tubing (E-3603 vacuum formulation) ▀▀ ▀▀ ▀▀ ▀▀

Tygon E-3603

▀▀

Applications include general lab, food & beverage plus biopharma Vacuum service of 29.9” Hg (760 mm Hg) at 23°C Non-DEHP, phthalate-free plasticizer - flexible, biodegradable, crack-resistant, nontoxic, & nonoxidizing Brittle temperature -46°C Sterilize: Ethylene oxide or autoclave for 30 minutes at 121°C, 15 psi (1 bar)

JMG No: 1011993

Digital Gauge, 760 Torr; 1/4”; NPT (M) ▀▀ ▀▀ ▀▀ ▀▀

Digital Gauge

▀▀

Replace mercury manometers for monitoring vacuum systems ±0.25% test gauge accuracy; 316 stainless steel wetted parts Fast response (3 readings per second) Use for monitoring lab or industrial vacuum manifolds, pumps & systems The 760 Torr absolute scale measures atmospheric pressure when gauge port is open & reads zero at full vacuum

JMG No: 1307289

Rotary Evaporator Hand or Motor Lift Configurations ▀▀ ▀▀ ▀▀ ▀▀ ▀▀

Individually control by pre-programming vacuum gradients Features built-in vacuum controller, leading safety standards & features for superior ease of use plus reduced cost of ownership Large 11 cm colour graphics display - features all parameters, integrated vacuum controller plus programs for automated distillations Automatic process timer turns off evaporator at a pre-programmed time All connected devices recognized by evaporator - eliminating the need to configure the unit manually

Hei-VAP Precision with G3 Vertical Condenser & Motor lift JMG No: 8027695

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Heating / Drying Ovens

Universal Vacuum Oven ▀▀ ▀▀ ▀▀ ▀▀

Gentle, powerful plus energy-saving Digital pressure control ensures rapid & gentle vacuum drying Intelligent direct heating via individually placeable thermoshelves with separate sensors guarantees short heating & process times Memmert is only manufacturer to offer turbo drying technology – best for vacuum drying large quantities of powder or granulate

VO29 JMG No: 1309095

Standard Delivery Cooled Vacuum Oven Ensures rapid & uniform temperature control of food, cosmetics, PCBs or injection moulds, without the loss of heat Temperature range from +5°C to +90°C, with vacuum range from 5 to 1100 mbar ▀▀ Heating concept: o Thermoshelves: 1 connection o VO cooling: Peltier cooling unit ensures a surface temperature distribution with maximum deviation of ±1 K across the entire temperature range o VO direct heating: fuzzy-supported MLC (Multi-Level-Controlling) microprocessor controller adapting its performance to the volume (local temperature sensing) ▀▀ ▀▀

VO29 cool

Universal Mechanical Convection Oven ▀▀ ▀▀ ▀▀ ▀▀

Direct heating concept unique to Memmert; the best temperature uniformity on the market! Fan speed and air inlet both programmable easily at the controller; flexibility in application Fresh air is preheated before it enters the chamber, to keep the temperature uniform inside the chamber, and to decrease drying times. Easy to use large TFT display with touch buttons; looks fantastic, and is extremely user friendly

UF30

Climate Chambers Perfect Environmental Simulation ▀▀ ▀▀ ▀▀ ▀▀

Active humidity control from 20% to 95% rh & unsurpassed homogeneity of temperature & humidity over the entire interior Ideally suited for environmental testing, environmental simulation, accelerated service life tests & 85/85 tests according to IEC 60068-2-67 & IEC 60068-2-78 Temperature range up to +90°C 4 model sizes: 56 L to 241 L

Spark-Free Refrigerator Store Explosive & Highly Flammable Substances ▀▀ ▀▀ ▀▀ ▀▀ ▀▀ ▀▀ ▀▀ ▀▀ ▀▀

Interiors comply with safety requirements of EU Directive 94/9/EC (ATEX 95) Dynamic cooling system Precision electronic controller with digital temperature display Flexible, height-adjustable glass-shelves; Self-closing door with integrated lock Visual & audible temperature & door alarm Integrated data memory with min/max temperatures RS 485 interface enabling external documentation Maximum temperature stability & consistency according to IEC 60068-3 Select from an extensive range

Spark-Free Refrigerator JMG No: 1323881

46 Australia: 1300 501 555

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Vacuum & Nanotechnology Solutions Guide

Temperature Control Water Bath ▀▀ ▀▀ ▀▀ ▀▀ ▀▀

For routine applications (eg cell cultivation), temperature control of samples, incubation, corrosion tests, test food & beverages, life sciences, pathology labs, etc Temperature range from -10°C to +40°C Cooling capacity @ 20°C: 0.25 kW Fill volume 2.6 L Flow rate: 15 L/minute PURA 10

JMG No: 1335099

Recirculating Chiller - Economical ▀▀

▀▀ ▀▀ ▀▀ ▀▀

Economical recirculated chiller for cooling of Peltier elements, particularly for automated analysis units & CCD cameras, polarimeters, refractometers, electrophoresis chambers, single rotary evaporation, etc Temperature range from -10°C to +40°C Cooling capacity @ 20°C: 0.25 kW Fill volume 2.6 L Flow rate: 15 L/minute

F250

JMG No: 1130235

Recirculating Chiller - Powerful ▀▀ ▀▀ ▀▀ ▀▀ ▀▀

Cool multiple rotary evaporators, bio-reactors/fermenters, Soxhlet apparatus, distillation & vacuum systems, gas chromatographs, spectrometers, etc Temperature range from -20°C to +40°C Cooling capacity @ 20°C: 0.2 kW Fill volume 17.0 L Flow rate: 40 L/minute FL1203 JMG No: 1130972

Centrifuges ASTM Compliant - Intuitive, Powerful & Safe ▀▀ ▀▀ ▀▀ ▀▀ ▀▀

Heated bench top centrifuge Choice of rotors: Swing-out (4 x 800 mL); Fixed-angle (6 x 500 mL) Maximum speed up to 13,500 rpm Magnetic rotor identification prevents rotor from over speeding Temperature range from +4°C to +70°C

6-16HS

JMG No: 1021082

Versatile, General Purpose & Benchtop ▀▀ ▀▀ ▀▀ ▀▀ ▀▀

Maximum speed up to 15,300 rpm Capacity up to 4 × 400 mL tubes Intuitive interface with one-button control & illuminated buttons Various angle & swing-out rotors available Choice of operations: o Non-refrigerated (3-16L) o Refrigerated (3-16KL) (guaranteed 4°C at max speed for all rotors)

3-16L

JMG No: 1020908

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Balances Analytical Balances ▀▀ ▀▀

Best seller; Shock proof construction High corner load performance

Model

Calibration

ABJ-220-4NM

JMG No: 1136912

Internal

220 g

0.1 mg

ABJ-120-4NM

JMG No: 1136910

Internal

120 g

0.1 mg

▀▀ ▀▀

Weighing Range (max)

Readout

Automatic internal adjustment (if temp changes >0.5°C); Shock proof construction Advanced single-cell weighing technology

Model

Calibration

ABT-220-4M

JMG No: 1137008

Internal

220 g

ABT-120-5DM

JMG No: 1137007

Internal

120 g

0.01 mg

JMG No: 1137009

Internal

220 g

0.01 mg

ABT-220-5DM

Weighing Range (max)

Readout 0.1 mg

Precision Balances ▀▀ ▀▀

Programmable weighing unit Optional internal/external battery pack for field use

Model

Calibration

Weighing Range (max)

Readout

KB-3600-2N

JMG No: 1161120

External

3,600 g

0.01 g

KB-650-2NM

JMG No: 1161123

External

650 g

0.01 g

Stirring & Mixing Digital Stirring Hotplate – Round Maintains constant speed irrespective of viscosity changes ▀▀ Aluminium plate ensures optimal heat transfer ▀▀ Ceramic coated (chemically resistant) top plate ▀▀ Precise temp & speed control; IP42 rated die-cast body ▀▀ Includes PT100 sensor JMG No: 1218678

Variable Speed Vortex Mixer ▀▀ ▀▀ ▀▀ ▀▀

Superior mixing Integrated port to support a lab rod for holding vessels in place during continuous operation Use at 200 rpm for more gentle mixing - all the way up to 2,500 rpm Choose between ‘touch ’ on or continuous modes

JMG No: 1237573

Electro-Chemistry Benchtop pH Meter ▀▀ ▀▀ ▀▀ ▀▀ ▀▀

Large easy to read display yet compact pH range from 0 to 14.00 (accuracy ±0.01 pH) 5-point calibration with auto-buffer recognition Data logging capable up to 100 data sets Includes meter, stand, buffers & pH/ATC probe

pH 700 JMG No: 8012092

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Vacuum & Nanotechnology Solutions Guide

Pipettes Extensive selection of mechanical, electric or motorised pipettes - contact us for details of our full Gilson range

Pipette for Problem Liquids - Viscous & Solvents ▀▀ ▀▀ ▀▀ ▀▀ ▀▀

100% protection against contamination (no air-to-liquid interface) Desired volume aspirated rapidly & accurately - no calibration required Volume securing button; Large selection of Capillary Pistons QuickSnap - tips fit like a normal pipette Choice of 6 models (volumes from 1 to 1,000 μL)

Microman E

Lockable Volume Ensures Accuracy ▀▀ ▀▀ ▀▀

Adjustable tip ejector (left & right-handed use) - metal or plastic ejectors Optimum traceability with 2D identification code Choice of models: o Single Channel: Select from 4 options (volumes from 0.2 µL to 10 mL) o 8 & 12 Channel: Select from 4 options (volumes from 0.5 µL to 300 µL) Pipetman L - Single & Multi

Complete Pipetting Starter Kit - 4 Pipettes ▀▀ ▀▀ ▀▀ ▀▀ ▀▀ ▀▀ ▀▀ ▀▀

4 X Pipetman G pipettes: P2G, P20G, P200G, P1000G (metal ejectors) 3 X Packs of Pipetman Tips: DL10, D200 & D1000 4 X Comfort Handles (with 12 stickers) 1 X Comfort Handle leaflet 4 X Single pipette holders 1 X Gilson Guide to Pipetting Handbook 1 X 2 minute inspection poster 1 X User Guide

Pipetman G 4 Pipette Starter Kit JMG No: 1289197

Guaranteed ISO Specification on Standard & Repetitive Pipetting ▀▀ ▀▀ ▀▀ ▀▀ ▀▀

Intuitive interface with 5 pipetting modes: standard, repetitive, mix, reverse & custom Fully motorised with lockable volume & adjustable speed piston Plastic clip tip ejectors for easy dismantling & greater tip fitting Independent speeds for aspirating & dispensing for varying solution densities Choice of models: o Single Channel: Select from 8 options (volumes from 0.5 µL to 10 mL) o 8 & 12 Channel: Select from 6 options (volumes from 0.5 µL to 1.2 mL) Pipetman M - Single & Multi

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Additional Lab Instruments

Refractometers ▀▀ ▀▀ ▀▀

Various scales - Brix, Baume, Refractive Index, etc Numerous types for pharma reagents, food, salt, wine, sugar, salinity, aviation, alcohol, moisture, ABBE, in-line, etc Pocket, hand-held & benchtop models - water proof & non-water-proof

Homogenisers ▀▀ ▀▀ ▀▀

Hand held or bench top, manual or automated Large selection of high precision probes with various lengths Chemically compatible with all cleaning methods & most reagents

Ismatec Pumps ▀▀ ▀▀ ▀▀ ▀▀

Independent channel control pumps - control flow & direction of each channel via keypad or PC Low flow high accuracy pumps - planetary drive provides smooth, precise flow & longer tubing life Reglo compact multi-channel pumps – easily adjust speed of compact multi-channel pump

Hydrometers ▀▀ ▀▀ ▀▀

Select from general purpose, precision, glass, plastic, ASTM, Brix sugar scale, salt brine, etc Lengths from 163 mm to 381 mm Wide selection of ranges, temperature & divisions

Particle Counters ▀▀ ▀▀ ▀▀

Ideal for use in cleanrooms, indoor air quality, filter testing & contamination migration studies Particle sizing from 0.3 to 10 µm Store up to 5,000 data records with flow rates from 0.1 cfm; Built-in camera also available

Collapsible Containers & Carboys ▀▀ ▀▀

Nest uniformly when empty & expand readily when filled with liquid - include polypropylene (PP) caps with injection-molded threads Extensive range of carboys - with/without spigots & faucets, numerous shapes & sizes, with/without handles, etc

Nitrile & Latex Gloves – Large Selection ▀▀ ▀▀ ▀▀ ▀▀ ▀▀

Shape: flat with roller edge Insides: Smooth, powder-free; Outside (textured) Lengths: 240 mm & 300 mm Sizes: XS, S, M, L & XL Wall thickness (double): 0.12 mm, 0.16 mm, 0.20 mm & 0.22 mm

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Date: DD / MM / YYYY Contact Name:

Organisation:

Phone:

Email:

Vacuum & Nanotechnology Solutions Guide

Vacuum Pump Selection Guide To ensure we provide the right solution to meet your needs, please complete the following information & email to us (refer bottom of page)

Please briefly describe the application(s) to be performed

What substances will be pumped?

Type of Gas

Information regarding process pressure

Type of Process Run

(if you use complex substances please also add the CAS number [Chemical Abstracts Service] in addition to the name)

CAS No. (optional if known)

Continuous

Batch

Pressure at Given Flows/Base Pressure (please include units)

Pump Down Requirements: Starting Pressure (unit)

Target Pressure (unit)

Pump-Down Time (unit)

Information regarding chambers & pipes

Vacuum Chamber Volume (unit) Surface of Chamber (unit)

Materials (unit)

Outgassing Rate of Materials (unit) Length of Piping (unit)

Type of project

New

Diameter of Piping (unit)

Replacing Existing Pumps

Please Describe Your Requirements

eg pump type (fore vacuum, high vacuum), pump combination, requested pumping speeds (unit), number of pumps, requirements for Explosive Protection

Installation requirements

Mains Voltage (V)

Mains Frequency (Hz)

Cooling Media (water or air) Ambient Temperature (Â°C) System Footprint

Intake Temperature (Â°C)

Length (meters)

Do you have any attachments to support your

Vacuum Schematic

requirements? (if yes, please select & attach)

Other (specify)

Width (meters)

Installation Drawing

Height (meters)

Material Safety Data Sheet

What is your budget? (this helps to determine the most suitable instrument)

Is the Pump Funded?

Yes

No (or for Budgetary Purposes

Yes

No)

When do you need your pump? Anything else we need to know to assist you?

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Date: DD / MM / YYYY Contact Name:

Organisation:

Phone:

Email:

UHV Design Heater Module Selection Guide To ensure we configure the right solution to meet your needs, please complete the following information & email to us (refer bottom of page)

Please describe your application

What substrate materials will you be using? Size of substrates (tick all that apply) 1” (solid SiC element only) 150 mm (CF250, CF300 & CF350 flanges only)

2” 100 mm 200 mm (CF300 & CF350 flanges only)

Other (non-standard option - please specify) What is the process chamber’s ultimate (base) pressure? What maximum temperature at base pressure due you wish to heat the substrate to in vacuum? How long do you need to maintain this temperature? If gases or vapours are involved in your process, please complete required information

Gas

Partial Pressure mbar

Torr

Maximum Temperature °C

Duration

1 2 3 4 5 6

Are any of these materials incompatible with your process?

Tick all that apply: Tantalum Molybdenum

Heater element selection

Does your intended process involve the use of high partial pressure of O2?

Stainless Steel

Inconel

YES / NOT SURE

Silicon carbide coated graphite (SiCg) heater element

Solid silicon carbide (sSiC) heater element

Standard heating element – not recommended for prolonged use at high partial pressures of O2 at very high temperatures.

Heating element option - recommended for use in oxidising atmospheres

Type K

What type of thermocouple do you require?

Type C  quantity required

One

Two

How soon do you need your instrument?

Yes

Would you like to receive information concerning our Service Maintenance Agreements?

Anything else we need to know to assist you?

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Vacuum & Nanotechnology

Date: DD / MM / YYYY Contact Name:

Organisation:

Phone:

Email:

Solutions Guide

Vacuum Gauge Selection Guide To ensure we provide the right solution to meet your needs, please complete the following information & email to us (refer bottom of page)

Description of application to be performed

What gases/vapours will be present?

Please specify the maximum (vacuum) pressure measurement?

Please specify the maximum & minimum

Atmosphere Above Atmosphere (specify) Below Atmosphere (specify) Maximum (mbar)

Minimum (mbar)

(vacuum) pressure measurement? What is your preferred measuring unit?

mbar Pascal

Yes No No Yes Yes No

Torr Other (specify) Please specify the flange/fitting required?

KF16 CF 16 (1.33”) Swagelok (specify)

What kind of display would you require?

Integrated (within gauge) Remote (separated from gauge)

Do you require any particular communication protocol?

Do you need a specific accuracy on the reading?

Would you require an ongoing annual calibration service?

KF25 CF 38 (2.75”) NPT Thread (specify)

Analog

Yes

DeviceNet™

Yes

RS232

Yes

Profibus® Other (specify)

Yes

Yes No Yes

<1%

±1%

±5%

±10%

KF40 6/8 mm DN Hose Other (specify)

±25%

How soon do you need your gauge? What brand(s) of gauges do you currently use? What is your budget? (this helps to determine the most suitable instrument)

Anything else we need to know to assist you?

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Organisation:

Phone:

Email:

Mass Flow Controller Selection Guide Description of application to be performed

MFCs #1

MFCs #2

Description of application to be performed

What are the gas types required? What is the maximum inlet pressure? From

What is the flow rate range for each gas?

sccm

slm

From

sccm

slm

What required fittings do you need? Swagelok 4 VCR male

Yes

Swagelok 4 VCO male

Yes

¼” Swagelok ⅛” Swagelok (≥ 10000 sccm N2)

Yes Yes Yes

No No No

Yes Yes Yes

No No No

½” Swagelok (≥ 10000 sccm N2)

Yes

6 mm Swagelok

Yes

8 mm Swagelok

Yes

Standard - Analog 0 to 5 VDC (15 pin D connector)

Yes

Analog 0 to 5 VDC (9 pin D connector)

Yes

Analog 4 to 20 mA (15 pin D connector) RS485 (uses 9 pin connector)

Yes Yes Yes

No No No

Yes Yes Yes

No No No

Profibus®

Yes

Would you like dedicated PC control with data logging capabilities?

Yes

Would you require an ongoing annual calibration service?

Yes

Swagelok 8 VCR male (≥10000 sccm N2)

Other (specify)

Do you need a particular communication protocol?

DeviceNet™

What is your budget per MFC? (this helps to determine the most suitable instrument)

Anything else we need to know to assist you?

54 Australia: 1300 501 555

New Zealand: 0800 651 700

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Vacuum & Nanotechnology

Date: DD / MM / YYYY Contact Name:

Organisation:

Phone:

Email:

Solutions Guide

MKS FTIR or Tunable Filter Spectroscopy (TFS) Selection Guide To ensure we provide the right solution to meet your needs, please complete the following information & email to us (refer bottom of page)

Please describe your application or process

eg continuous emissions monitoring, ethylene production (alkanes, alkynes, alkenes), natural gas metering (C1-C6), acid &/or sour gas monitoring, LNG, LPG, Syngas, Biogas, CNG, power generation (BTU, Methane Number, Wobbe Index), trace impurities in natural gas (ie moisture &/or sulfur), total BTU measurement (ie burner of furnace control)

What methods or instruments do you currently use & why are they insufficient? examples: • GC-TCD, GC-FID, FTIR, NDIR, TDL Residual Oxygen, etc • Need to lower the cost of testing • Wants faster response with hydrocarbon speciation • In-line unattended monitoring is critical, etc

Sample conditions

Requested Information

Range

Additional Notes

Sample temp (°C)

Min

Nominal

Max

Sample pressure at tap/ sampling point

Min

Nominal

Max

ATM

PSIG

Torr Yes

If pressure >20 psig, can it be dropped to 20 psig? Sample flow rate (L/minute)

Min

No Nominal

Max

Desired plumbing interface for TFS sensor (size & type of fittings)

Other information

FTIR Analyzer Only

Do you have any previous experience with FTIR? Yes (with which manufacturer/model)? No

FTIR Temperature

MKS FTIRs are configured to run hot & wet gas streams however there is a limit on how high the gas stream temperature can be If temperature >191°C can it be dropped to 191°C?

Yes

FTIR Detector Options MKS uses high sensitivity MCT detectors. For the broadest range of components Liquid N2 (LN2) is needed to cool the detector every 14-18 hours. For 24/7 use an external 5 L dewar can be added to allow up to 3-5 days of unattended use. MKS also has thermal electrically (TE) cooled detectors (which do not need LN2, & run continuously) but they have a more limited list of components • Can LN2 be used to cool the detector?

Yes

• If YES, do you want to include the external 5 L Dewar?

Yes

… continued next page

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MKS FTIR or Tunable Filter Spectroscopy (TFS) Selection Guide (continued) Gas List

Please list all gas component names, measurement ranges, accuracy requirements for each application: • If compound is to be measured - select ‘Yes’ in Measured column • If only the background of the composition measured – select ‘No’ in Measured column List all gases that will be present at high concentrations (possible interferents) even if you do not need to measure them (eg H2O, CO2, Air, Matrix Gas)

Component Name

Installation related questions

Component Concentration Min

Normal

eg 1: CH4

90%

100%

eg 2: NH3

0 ppm

300 ppm

1000 ppm

0.1 ppm

Requested Information

Max

Required Detection Accuracy/ Measured Repeatability Limits

Range or MKS Available Options

Ambient temp (°C)

Min

Nominal

±1% absolute/ <0.1% absolute ±3% relative/ <1% relative

Yes

Additional Notes

Max

Ambient humidity (%RH) Where will the analyzer be housed?

eg climate controlled shelter, environmental shelter, open air, etc

… continued next page

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Vacuum & Nanotechnology Solutions Guide

MKS FTIR or Tunable Filter Spectroscopy (TFS) Selection Guide (continued) Installation related questions (continued)

Is this area climate controlled

Yes No (any extreme conditions (humidity, vibration, direct sunlight, etc)?

Analyzer voltage requirement

220 V/50 Hz Other (specify)

Other information

Data aquisition & interface measurements

Requested Information Desired measurement rate

MKS Available Options 5 Hz (200 msec) 

1 Hz (1sec)

5 sec 

60 sec

30 sec 

Additional Notes

Other (specify) Desired data OUTPUT interface & protocol (TFS only)

Analog, Digital, I/0s

Desired data INPUT/ OUTPUT interface & protocol (TFS only)

AK Protocol

OPC 

MODUS

Other (specify)

Analog, Digital, I/0s OPC Toolweb (free) MODUS

Other information

Hazardous area classification

CSA Class1 Div1

CSA Class1 Div2 

ATEX ZONE 1 

IECEx 

TIIS 

ATEX ZONE 2

Other (specify)

Any special analytical or acceptance criteria needed? eg specific EPA, ASTM or DIN regulations

TFS only options

Portable (general purpose rated) Rack mounted (4U general purpose rated) SS 316L low-carbon stainless steel enclosure SS 316L low-carbon stainless gas cell & wetted parts Stream switching Local HMI/display Analog outputs 3 year total warranty package

How soon do you need your instrument? Anything else we need to know to assist you?

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Date: DD / MM / YYYY Contact Name:

Organisation:

Phone:

Email:

Physical Vapour Deposition System Selection Guide To ensure we provide the right solution to meet your needs, please complete the following information & email to us (refer bottom of page)

Please briefly describe the application(s) to be performed (ie used in R&D, pilot production, production)

Some questions to help us understand your system requirements

Substrate Quantity Substrate Material Substrate Size(s) Is Your Substrate: Substrate Bias:

Static Rotating RF DC Both

Single Axis

Do You Require Substrate Heating or Cooling? Yes Substrate Pre-Clean: Glow Discharge Ion Source Substrate Load-Lock: Single Multi-Water Glovebox Interface: Yes No Materials to be Deposited

Dual Axis

Linear Motion

No (if Yes, Temperature

Â°C)

Film Thickness Process: Magnetron Sputtering Thermal Evaporation E-Beam Evaporation Do You Require Film Thickness Monitor Yes No Film Thickness Controller Yes No No. of Deposition Sources Required Configured for Co-Deposition: Ion Assisted Deposition:

Yes No Yes No

Process Gases to be Used Sputtering Orientation:

Down

Off Axis

Source-To-Substrate Distance (if known): If Receiving Sputtering, Will a Substrate Process Gas Ring be Required? Yes No Does Your Process Involve Lift-Off?

Yes

If Sputtering: RF DC Both Power Requirement Do You Require Other Magnetron Accessories: Flex Chimneys

Yes Yes

Process Pressure Performance: Rate

No No

Shutters Gas Injection

Yes Yes

No No

System Based Pressure Uniformity

Throughput

Throughput: Do You Have Written Specifications? Yes (Please Provide) Level of System Automation Basic Computer Control Yes Recipe Driven Computer Control Yes PLC With Touch Screen Yes

No No No No

What is your budget?

(this helps to determine the most suitable instrument)

When do you need your system? Anything else we need to know to assist you?

58 Australia: 1300 501 555

New Zealand: 0800 651 700

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Vacuum & Nanotechnology

Date: DD / MM / YYYY Contact Name:

Organisation:

Phone:

Email:

Solutions Guide

Freeze Drying Selection Guide To ensure we provide the right solution to meet your needs, please complete the following information & email to us (refer bottom of page)

Please describe the application to be performed

Are there any solvents present?

Yes

(specify)

Estimated water content per batch?

2.5 L

4.5 L

12 L

16 L

>16 L (specify)

How much residual moisture is allowed to be present in the dried product?

What product(s) are to be freeze dried? What size containers will the products be dried in?

(ie specimen jars, centrifuge tubes, round bottom flasks, etc)

Quantity of containers to be dried in 1 batch? Do you require sealing under vacuum/N2?

Yes

Are you interested in vacuum pressure control to reduce your drying time up to 40%?

Yes

Are you interested in heated shelves to reduce your drying time up to 40% & enable reproducible results?

Yes

Do you need to log/document your results automatically?

Yes No

(specify)

Do you need to fulfil any regulatory requirements?

Yes No

Would you be interested in additional servicing â&#x20AC;&#x2DC;piece-of-mindâ&#x20AC;&#x2122; benefits offered by John Morris Group?

GLP/GMP

CFR

TGA

FDA

Installation & Training

Yes

Preventative Maintenance

Yes

Extended Warranty

Yes

Other (specify)

How soon do you need your freeze dryer? What brand(s) of freeze dryer do you currently use? What is your budget? (this helps to determine the most suitable instrument)

Anything else we need to know to assist you?

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Melbourne

Brisbane

Adelaide

Perth

Auckland

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Unit 7, 53 Metroplex Av,

Suite 17, 22 Greenhill Rd

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18 St. Benedicts St,

Chatswood NSW 2067

Deepdene VIC 3103

Murarrie QLD 4172

Wayville SA 5034

Bentley WA 6102

Eden Terrace NZ 1010

Australia Phone: 1300 501 555

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Petrochemical Analysis

Whilst John Morris Group has taken every care to ensure the accuracy of information contained within this Guide, no responsibility for errors or omissions is accepted.

We provide nationwide service & repair facilities allowing us to deliver fast & personal local support to safeguard & enable your equipment to perform to its optimum