F
E
A T
U
R
E
S
tation is expected to drive a significant increase in ADC utilization throughout the industry including foundries (Figure 3), because it improves the efficiency of process monitoring programs. References 1 . An early re f e rence is “Automatic Defect Classification,” L. Bre a u x , D. Kolar, Solid State Te c h n o l o g y, Vol. 39 No. 12, pp. 89-96 (1996). 2 . See for example “Tracking the Perf o r man ce of Phot o-li th ograp h ic P rocesses with Excursion Monitori n g , “ E r ic H . B o k e l b e r g a nd Michael E. Pariseau, MICRO, Vo l . 16, No., 1, pp. 47-59 (1998).
F i g u r e 3. Th e improved set -up time pr ovided by IMPACT XP ena bles in crea sed uti liza tion of ADC at foundries and ASIC manufacturing sites — where the ability to quickl y modify defect con trol
s t r a t e g i e s i s es pecially 3 . The hard w a re improvements for SmartGallery include dual Pentium II 450 MHz micro p rocessors, 512 MB RAM, RAID arc h it e c t u re, plus upgrades to the hard drive and backup media.
4 . “ R e a l - Time Classification Streamlines Yield Management P rocess,” Rebecca Howland Pinto, Yield Management Solutions, Autumn, pp. 10 – 14 (1999).
cr itical.
5 . Results from IBM study presented at Yield Management Solutions Seminar during SEMICON/West 1999.
For more information please contact: phil.march@kla-tencor.com or v e r l y n . fis c h e r @ k l a - t e n c o r. c o m
KLA-Tencor Trade Show Calendar February 29-March 1
SPIE Microlithography Conference, Santa Clara, California
March 2-3
CMP-MIC, Santa Clara, California
March 15- 16
SEMICON/China, Shanghai, China
April 4-6
SEMICON/Europa, Munich, Germany
April 13-14
Photomask Japan, Yokohama, Japan
April 27-29
Quality Expo, Rosemont, Illinois
May 1-2
Metrology 2000, San Jose, California
May 4-5
SEMICON/Singapore, Singapore
July 5-7
IITC, Burlingame, California
July 10-14
SEMICON/West, San Jose and San Francisco, California Spring 2000
Yield Management Solutions
15