O
V
E
R
L
A Y
M
E
T
R
This work was supported by the “MAGNET� program of the Chief Scientist Office at the Israeli Ministry of Industry and Trade, Consortium of Emerging Dielectric and Conductor Technologies for the Semiconductor Industry. A version of this article originally published in the 2003 SPIE Microlithography proceedings 5038, SPIE Microlithography Conference, February 2003, Santa Clara, California, USA. References 1 . Luci, Alberto; Ballarin, Eugenio G. Optimization of Overlay Markers to Limit measurement error Induced During Exp o s u re by lens Aberration Eff e c t s , M e t ro l o g y, Inspection, and process Control for Microlithography XVI, Proceedings of SPIE Vol. 4690 (2002), p.374. 2 . Schmidt, Sebastian; Charles, Alain B.; Ganz, Dietmar; H o rnig, Steffen R.; Hraschan, Guenther; Maltabes, John G.; Mautz, K arl E.; Met zdor f , Th omas; Otto, Ralf ;
O
L
O
G
Y
Scheurich, Jochen; Schedel, Thorsten; Schuster, Ralf., The effect of Non-linear Errors on 300 mm Wafer Overlay Perf o rm a n c e , Optical Microlithography XIII, Proceedings of SPIE Vol. 4000 (2000), p. 857. 3 . Yang, Jin-seok; Lee, Sang B.; Oh, Seung-Chul; Huh, Hoon; Han, Sang-Bum, Novel Design of WIS-free Overlay Measurement Mark, Metrology, Inspection, and process C o n t rol for Microlithography XIV, Proceedings of SPIE Vol. 3998 (2000), p.764. 4 . Hideki Ina et. al. Alignment Mark Optimization to Reduce Tool- and Wa f e r-Induced Shift for XRA-1000, Jpn. J. Appl. Phys. Vol. 38 (1999) pp. 7065-7070. 5 . Will Conley et al., Understanding Mask error Factor for sub-0.18 (m Lithography, P roceedings of the Micro l i t h ography Symposium INTERFACE 2000, p. 69. 6 . M. Adel, M. Ghinovker, B. Golovanevsky, P. Izikson, E. Kassel, D. Ya ffe, F. Bruckstein, R. Goldenberg, Y. Rubner, M. Rudzsky, Optimized overlay metrology fiducials: theory and experiment, to be published in IEEE Transactions on Semiconductor Manufacturing.
KLA-Tencor Trade Show Calendar July 14-16
SEMICON West, San Francisco, California
August 18-22
Canadian Semi. Tech. Conference, Ontario, Canada
September 9-10
BACUS/Photomask 2003, Monterey, California
September 14-18
SIMS XIV, San Diego, California
September 15-17
SEMICON Taiwan, Taipei, Taiwan
September 30- October 1
SEMI Expo CIS, Moscow, Russia
October 9
FSA, San Jose, California
1
Spring 2003
Yield Management Solutions