2016 – 2026 GLOBAL PHOTOLITHOGRAPHY EQUIPMENT MARKET FORECAST & OPPORTUNITIES
www.techsciresearch.com MARKET INTELLIGENCE . CONSULTING
Scope of Report
Product of Interest (POI): Photolithography Equipment
Photolithography, also called optical lithography or UV lithography, is a process used in microfabrication to pattern parts on a thin film or the bulk of a substrate (also called a wafer). It uses light to transfer a geometric pattern from a photomask (also called an optical mask) to a photosensitive (that is, light-sensitive) chemical photoresist on the substrate.
Market Segmentation TYPE
DEVICE WAVELENGTH
APPLICATION
• EUV (Extreme Ultraviolet)
• Mercury Lamps
•
Front End
• DUV (Deep Ultraviolet)
• Fluorine Lamps
•
Back End
• I-line
• Excimer Lasers
• ArF (Argon fluoride)
• Lased Produced Plasma
Base Year
• KrF (Krypton fluoride)
• 370nm-270nm 270nm-170nm • 170nm-1nm
Review Period
2016 – 2019
• ArFi (Argon fluoride immersion)
WAVELENGTH
Year Range
2020 END-USE • IDMs (Integrated Device Manufacturer)
• Foundries
REGION •
North America
•
Europe
•
Asia-Pacific
•
Middle East & Africa
•
South America
Estimated Year
2021 Forecast Period
2022 – 2026
2
Table of Contents S. No.
Contents
1.
Product Overview (Definition of product and major terminologies used in the report)
2.
Research Methodology Detailed description of the methodology used to conduct the research, Raw data backup, list of all secondary sources, List of respondents for primary surveys)
3.
Impact of COVID-19 on Global Photolithography Equipment Market
4.
Executive Summary (This chapter covers summary of the complete study.)
5.
Voice of Customer
6.
Global Photolithography Equipment Market Outlook, 2016-2026F (This chapter includes a brief overview of the product of interest market such as total market’s growth rate, expected growth rate, key growth levers, leading region, top grossing product types, etc. It includes more of a qualitative information about the market.) 6.1.
Market Size & Forecast 6.1.1.
6.2.
6.3.
Page No.
By Value
Market Share & Forecast
6.2.1.
By Type (EUV, DUV, I-line, ArF, ArFi, KrF)
6.2.2.
By Wavelength (370nm-270nm, 270nm-170nm, 170nm-1nm)
6.2.3.
By Device Wavelength (Mercury Lamps, Fluorine Lamps, Excimer Lasers, Lased Produced Plasma)
6.2.4.
By End-Use (IDMs, Foundries)
6.2.5.
By Application (Front End, Back End)
6.2.6.
By Region
6.2.7.
By Company (2020)
Product Market Map
3
Table of Contents S. No. 7.
Contents
Page No.
Asia-Pacific Photolithography Equipment Market Outlook
7.1.
Market Size & Forecast 7.1.1.
7.2.
7.3.
By Value
Market Share & Forecast 7.2.1.
By Type (EUV, DUV, I-line, ArF, ArFi, KrF)
7.2.2.
By Wavelength (370nm-270nm, 270nm-170nm, 170nm-1nm)
7.2.3.
By Device Wavelength (Mercury Lamps, Fluorine Lamps, Excimer Lasers, Lased Produced Plasma)
7.2.4.
By End-Use (IDMs, Foundries)
7.2.5.
By Application (Front End, Back End)
7.2.6.
By Country
Asia-Pacific: Country Analysis 7.3.1.
China Photolithography Equipment Market Outlook 7.3.1.1.
Market Size & Forecast 7.3.1.1.1.
7.3.1.2.
By Value
Market Share & Forecast 7.3.1.2.1.
By Type
7.3.1.2.2.
By Wavelength
7.3.1.2.3.
By Device Wavelength
7.3.1.2.4.
By End User
7.3.1.2.5.
By Application
4
Table of Contents S. No.
Contents 7.3.2.
India Photolithography Equipment Market Outlook 7.3.2.1.
Market Size & Forecast 7.3.2.1.1.
7.3.2.2.
7.3.3.
Page No.
By Value
Market Share & Forecast 7.3.2.2.1.
By Type
7.3.2.2.2.
By Wavelength
7.3.2.2.3.
By Device Wavelength
7.3.2.2.4.
By End User
7.3.2.2.5.
By Application
Singapore Photolithography Equipment Market Outlook 7.3.3.1.
Market Size & Forecast 7.3.3.1.1.
7.3.3.2.
By Value
Market Share & Forecast 7.3.3.2.1.
By Type
7.3.3.2.2.
By Wavelength
7.3.3.2.3.
By Device Wavelength
7.3.3.2.4.
By End User
7.3.3.2.5
By Application
5
Table of Contents S. No.
Contents 7.3.4.
Japan Photolithography Equipment Market Outlook 7.3.4.1.
Market Size & Forecast 7.3.4.1.1.
7.3.4.2.
7.3.5.
Page No.
By Value
Market Share & Forecast 7.3.4.2.1.
By Type
7.3.4.2.2.
By Wavelength
7.3.4.2.3.
By Device Wavelength
7.3.4.2.4.
By End User
7.3.4.2.5.
By Application
South Korea Photolithography Equipment Market Outlook 7.3.5.1.
Market Size & Forecast 7.3.5.1.1.
7.3.5.2.
By Value
Market Share & Forecast 7.3.5.2.1.
By Type
7.3.5.2.2.
By Wavelength
7.3.5.2.3.
By Device Wavelength
7.3.5.2.4.
By End User
7.3.5.2.5.
By Application
6
Table of Contents S. No. 8.
Contents
Page No.
Europe Photolithography Equipment Market Outlook 8.1.
Market Size & Forecast 8.1.1.
8.2.
8.3.
By Value
Market Share & Forecast 8.2.1.
By Type (EUV, DUV, I-line, ArF, ArFi, KrF)
8.2.2.
By Wavelength (370nm-270nm, 270nm-170nm, 170nm-1nm)
8.2.3.
By Device Wavelength (Mercury Lamps, Fluorine Lamps, Excimer Lasers, Lased Produced Plasma)
8.2.4.
By End-Use (IDMs, Foundries)
8.2.5.
By Application (Front End, Back End)
8.2.6.
By Country
Europe: Country Analysis 8.3.1.
France Photolithography Equipment Market Outlook 8.3.1.1.
Market Size & Forecast 8.3.1.1.1.
8.3.1.2.
By Value
Market Share & Forecast 8.3.1.2.1.
By Type
8.3.1.2.2.
By Wavelength
8.3.1.2.3.
By Device Wavelength
8.3.1.2.4.
By End User
8.3.1.2.5.
By Application
7
Table of Contents S. No.
Contents 8.3.2.
Germany Photolithography Equipment Market Outlook 8.3.2.1.
Market Size & Forecast 8.3.2.1.1.
8.3.2.2.
8.3.3.
Page No.
By Value
Market Share & Forecast 8.3.2.2.1.
By Type
8.3.2.2.2.
By Wavelength
8.3.2.2.3.
By Device Wavelength
8.3.2.2.4.
By End User
8.3.2.2.5.
By Application
United Kingdom Photolithography Equipment Market Outlook 8.3.3.1.
Market Size & Forecast 8.3.3.1.1.
8.3.3.2.
By Value
Market Share & Forecast 8.3.3.2.1.
By Type
8.3.3.2.2.
By Wavelength
8.3.3.2.3.
By Device Wavelength
8.3.3.2.4.
By End User
8.3.3.2.5.
By Application
8
Table of Contents S. No.
Contents
8.3.4.
Italy Photolithography Equipment Market Outlook 8.3.4.1.
Market Size & Forecast 8.3.4.1.1.
8.3.4.2.
8.3.5.
Page No.
By Value
Market Share & Forecast 8.3.4.2.1.
By Type
8.3.4.2.2.
By Wavelength
8.3.4.2.3.
By Device Wavelength
8.3.4.2.4.
By End User
8.3.4.2.5.
By Application
Spain Photolithography Equipment Market Outlook 8.3.5.1.
Market Size & Forecast 8.3.5.1.1.
8.3.5.2.
By Value
Market Share & Forecast 8.3.5.2.1.
By Type
8.3.5.2.2.
By Wavelength
8.3.5.2.3.
By Device Wavelength
8.3.5.2.4.
By End User
8.3.5.2.5.
By Application
9
Table of Contents S. No. 9.
Contents
Page No.
North America Photolithography Equipment Market Outlook
9.1.
Market Size & Forecast 9.1.1.
9.2.
9.3.
By Value
Market Share & Forecast 9.2.1.
By Type (EUV, DUV, I-line, ArF, ArFi, KrF)
9.2.2.
By Wavelength (370nm-270nm, 270nm-170nm, 170nm-1nm)
9.2.3.
By Device Wavelength (Mercury Lamps, Fluorine Lamps, Excimer Lasers, Lased Produced Plasma)
9.2.4.
By End-Use (IDMs, Foundries)
9.2.5.
By Application (Front End, Back End)
9.2.6.
By Country
North America: Country Analysis 9.3.1.
United States Photolithography Equipment Market Outlook 9.3.1.1.
Market Size & Forecast 9.3.1.1.1.
9.3.1.2.
By Value
Market Share & Forecast 9.3.1.2.1.
By Type
9.3.1.2.2.
By Wavelength
9.3.1.2.3.
By Device Wavelength
9.3.1.2.4.
By End User
9.3.1.2.5.
By Application
10
Table of Contents S. No.
Contents 9.3.2.
Mexico Photolithography Equipment Market Outlook 9.3.2.1.
Market Size & Forecast 9.3.2.1.1.
9.3.2.2.
9.3.3.
By Value
Market Share & Forecast 9.3.2.2.1.
By Type
9.3.2.2.2.
By Wavelength
9.3.2.2.3.
By Device Wavelength
9.3.2.2.4.
By End User
9.3.2.2.5.
By Application
Canada Photolithography Equipment Market Outlook
9.3.3.1.
Market Size & Forecast 9.3.3.1.1.
9.3.3.2.
10.
Page No.
By Value
Market Share & Forecast 9.3.3.2.1.
By Type
9.3.3.2.2.
By Wavelength
9.3.3.2.3.
By Device Wavelength
9.3.3.2.4.
By End User
9.3.3.2.5.
By Application
South America Photolithography Equipment Market Outlook 10.1.
Market Size & Forecast 10.1.1.
10.2.
By Value
Market Share & Forecast 10.2.1.
By Type (EUV, DUV, I-line, ArF, ArFi, KrF)
11
Table of Contents S. No.
Contents
10.3.
10.2.2.
By Wavelength (370nm-270nm, 270nm-170nm, 170nm-1nm)
10.2.3.
By Device Wavelength (Mercury Lamps, Fluorine Lamps, Excimer Lasers, Lased Produced Plasma)
10.2.4.
By End-Use (IDMs, Foundries)
10.2.5.
By Application (Front End, Back End)
10.2.6.
By Country
Page No.
South America: Country Analysis 10.3.1.
Brazil Photolithography Equipment Market Outlook 10.3.1.1.
Market Size & Forecast 10.3.1.1.1
10.3.1.2.
10.3.2.
By Value
Market Share & Forecast 10.3.1.2.1.
By Type
10.3.1.2.2.
By Wavelength
10.3.1.2.3.
By Device Wavelength
10.3.1.2.4.
By End User
10.3.1.2.5.
By Application
Argentina Photolithography Equipment Market Outlook
10.3.2.1.
Market Size & Forecast 10.3.2.1.1
10.3.2.2.
By Value
Market Share & Forecast 10.3.2.2.1.
By Type
10.3.2.2.2.
By Wavelength
10.3.2.2.3.
By Device Wavelength
10.3.2.2.4.
By End User
12
Table of Contents S. No.
Contents 10.3.2.2.5. 10.3.3.
By Application
Colombia Photolithography Equipment Market Outlook 10.3.3.1.
Market Size & Forecast 10.3.3.1.1
10.3.3.2.
11.
Page No.
By Value
Market Share & Forecast 10.3.3.2.1.
By Type
10.3.2.2.2.
By Wavelength
10.3.2.2.3.
By Device Wavelength
10.3.2.2.4.
By End User
10.3.3.2.5.
By Application
Middle East & Africa Photolithography Equipment Market Outlook 11.1.
Market Size & Forecast
11.1.1. 11.2.
11.3.
By Value
Market Share & Forecast 11.2.1.
By Type (EUV, DUV, I-line, ArF, ArFi, KrF)
11.2.2.
By Wavelength (370nm-270nm, 270nm-170nm, 170nm-1nm)
11.2.3.
By Device Wavelength (Mercury Lamps, Fluorine Lamps, Excimer Lasers, Lased Produced Plasma)
11.2.4.
By End-Use (IDMs, Foundries)
11.2.5.
By Application (Front End, Back End)
11.2.7.
By Country
Middle East & Africa : Country Analysis
13
Table of Contents S. No.
Contents 11.3.1.
South Africa Photolithography Equipment Market Outlook 11.3.1.1.
Market Size & Forecast 11.3.1.1.1.
11.3.1.2.
11.3.2.
By Value
Market Share & Forecast 11.3.1.2.1.
By Type
11.3.1.2.2.
By Wavelength
11.3.1.2.3.
By Device Wavelength
11.3.1.2.4.
By End User
11.3.1.2.5.
By Application
Saudi Arabia Photolithography Equipment Market Outlook 11.3.2.1.
Market Size & Forecast 11.3.2.1.1.
11.3.2.2.
11.3.3.
Page No.
By Value
Market Share & Forecast 11.3.2.2.1.
By Type
11.3.2.2.2.
By Wavelength
11.3.2.2.3.
By Device Wavelength
11.3.2.2.4.
By End User
11.3.2.2.5.
By Application
UAE Photolithography Equipment Market Outlook 11.3.3.1.
Market Size & Forecast 11.3.3.1.1.
By Value
14
Table of Contents S. No.
Contents 11.3.3.2.
12.
Page No.
Market Share & Forecast 11.3.3.2.1.
By Type
11.3.3.2.2.
By Wavelength
11.3.3.2.3.
By Device Wavelength
11.3.3.2.4.
By End User
11.3.3.2.5.
By Application
Market Dynamics (This chapter assesses the major demand drivers and restraints.) 12.1.
Drivers
12.2.
Challenges
13.
Market Trends & Developments (This section captures recent trends pertaining to manufacturing or consumption, market movements in terms of points of production and consumption, advancements and development)
14.
Competitive Landscape 14.1.
Company details
14.2.
Financials (As Reported)
14.3.
Product & Services
14.4.
Key market focus and geographical presence
14.5.
Expansion Strategies
14.6.
Key Management Personnel
15.
Strategic Recommendations (Based on the findings of the report strategic recommendations on how to enter and expand market share)
16.
About Us & Disclaimer
15
RESEARCH METHODOLOGY
Research Methodology
Market Profiling
In-depth secondary research was conducted to determine top players in the global photolithography equipment market, overall market size and segmental market size.
Formulating Questionnaire
In order to conduct industry experts’ interviews, TechSci formulated a detailed discussion guide.
Developing List of Respondents
Data Collection
Data Validation
Data obtained as a result of primary and secondary research was validated through rigorous triangulation.
TechSci conducted interviews with industry experts and industry players for data collection and verification.
List of industry players and industry specialists was developed.
Primary Research
Data Collection
Data Filter & Analysis
Research & Intelligence
Actionable Insights
Business Solution
LinkedIn TechSci Internal Database
✓ Recent Developments ✓ Market Changing Aspects/Dynamics ✓ Government Policies ✓ Final Conclusion
✓ Identifying Key Opinion Leaders ✓ Questionnaire Design ✓ In-depth Interviews
Primary Research ✓ ✓
Desk Research
Secondary Research ✓ ✓ ✓ ✓ ✓ ✓ ✓
Company Websites Company Annual Reports White Paper Study Financial Reports Investor Presentations Regulatory Body Associations, etc.
Data Analysis
The data was scrutinized using MS-Excel, statistical tools and internal proprietary database to obtain qualitative and quantitative insights about the global photolithography equipment market.
Company Analysis ✓ Market Participants ✓ Key Strengths
Paid Sources
✓ ✓
Factiva Hoovers
17
Research Methodology Baseline Methodology
Our dedicated team of industry experts has monitored and analyzed various aspects of the global photolithography equipment market. The team has analyzed the outlook of various segments of this market, while considering the major influencing factors such as growing demand
from the semiconductor market. The study includes market forecasting, which would enable our clients to take better decisions while planning their strategy to achieve sustainability in the global photolithography equipment market.
Methodology Followed for Calculation of Market Size:
•
Market Size By Value: Market size, in terms of Value, for the year 2020 was calculated based on information collected through exhaustive secondary research and primary surveys, with various key opinion leaders/stakeholders, such as as photolithography equipment companies, channel partners, market influencers & end users, industry experts, and other industry participants.
•
The team interviewed more than 15 – 20 as photolithography equipment companies, 45 – 50 channel partners, 80 – 100 end users, and 15 – 20 Industry experts and other Value chain stakeholders in the global photolithography equipment market to obtain the overall market size for 2016-2020, which was validated by the Delphi technique. Taking standard deviation into consideration, the market size was averaged out, to arrive at the market size data during 2016-2020.
18
Research Methodology •
Respondents were asked about the current and future market growth rates, market shares by type, by wavelength, by device wavelength, by end use, by application, by each region and by company. Removing the outlier responses, the geometric mean of growth estimates and supplier wise revenue shares generated across various segments were considered, to arrive at the final revenue shares. Revenue shares generated across various segments were further triangulated from other stakeholders.
Methodology Followed for Calculation of Market Shares: Market shares by type, by wavelength, by device wavelength, by end use, by application, by each region and by company were calculated based on the responses received through primary surveys with industry experts, in which the respondents were asked about the market shares or revenue generated from various segments of global photolithography equipment market. The final shares were calculated by taking the geometric mean of the responses gathered from key opinion leaders after eliminating the outliers. Methodology Followed for Forecasting: •
TechSci Research performed periodical checks on data collected through the surveys with logic checks and analyzed the survey results in SPSS/Tableau Software.
•
Data triangulation techniques were applied to fill the gaps and to present a more meaningful picture of the market. To forecast global photolithography equipment market, TechSci Research used various forecast techniques such as: ✓
Moving Average
✓
Time Series Analysis
✓
Regression Analysis
✓
Econometric and Judgmental Analysis
19
Research Methodology TechSci Research used its own forecast tool, which is based on the growth of various allied industries in respective regions. TechSci Research also used the impact analysis during short, medium and long term period to estimate the demand and to reach accurate market numbers. It should be noted that the figures compiled are only for the organized market including market share data.
Partial List of Companies Interviewed
Key Secondary Sources
▪ ASML Holding N.V.
▪ World Bank
▪ Canon Inc.
▪ TechSci Research Proprietary Database & Knowledge
▪ Eolith AG
Repository
▪ EV Group
▪ Company Annual Reports
▪ GlobalFoundries Inc.
▪ Industry Magazines ▪ Industry Reports ▪ News Dailies
▪ Credible Paid Databases
20
Industry Brief According to TechSci Research report, “Global Photolithography Equipment Market By Type (EUV (Extreme Ultraviolet), DUV (Deep Ultraviolet), I-line, ArF (Argon fluoride), ArFi (Argon fluoride immersion), KrF (Krypton fluoride)), By Wavelength (370nm-270nm, 270nm-170nm, 170nm-1nm), By Device Wavelength (Mercury Lamps, Flourine Lamps, Excimer Lasers, Lased Produced Plasma), By End-Use (IDMs (Integrated Device Manufacturer), Foundries), By Application (Front End, Back End), By Region, Competition, Forecast & Opportunities, 2026”, Global photolithography equipment market was valued at USD11.26 billion in 2020 and is projected to grow at a CAGR of around 8.56% during the forecast period, owing to the mounting demands of IC chips from the semiconductor industry, budding adoption of digital distribution, high demand from IoT sector, and increased government support for carrying out these advancements. Additionally, expansion in the demand from the semiconductor market and requirement in the IT and automobile sector is also expected to drive the market. To meet the rising technological demands across the globe, ASML has been a continuous market leader for the past ten years and the company proves to be a boon for the photolithography equipment market on the account of its high reliability. However, high manufacturing and R&D costs and costs for equipment, raw material, maintenance, facilities, and labor charges can hamper the growth of the market. Additionally, market manufacturers rely on raw materials and labor for efficient production so process overheads can further restrict the evolution of the market. The global photolithography equipment market is segmented based on Type, Wavelength, Device Wavelength, End-Use, Application, Region, and Company. Based on region, the market can be fragmented into Asia Pacific, Europe, North America, South America, and Middle East & Africa. Europe contributes the highest share of 35.99% in the market and is expected to grow at a significant pace on account of its high technological ventures’ new user engagement and because of high consumer demands. Based on wavelength, the market can be divided into 370nm-270nm, 270-170nm,170-1nm. The 170nm-1nm segment dominates the market with a share of 41.27% in 2020, primarily due to its special feature that can implement structures minutely with full accuracy and precision and due to the increasing number of smartphones and PCs, etc., as photolithography is used when it comes to the production of IC chips. Based on device wavelength, the market can be apportioned into Mercury Lamps, Flourine Lamps, Excimer Lasers, Laser Produced Plasma. The Laser produced plasma segment dominates the market with a share of 36.42% in 2020 due to its firing high-intensity beams of light, and because they have been used to create short bursts of x-rays to accelerate particles which are called plasma-based accelerators. Based on end-use, the market can be split up into IDMs, and Foundries. The IDM segment dominates the market with a share of 54.99% in 2020 as they perform both the functions, design as well as manufacture the IC chips. Based on application, the market can be apportioned into Front-end and Back-end. The Front-end segment dominates the market with a share of 51.73% in 2020 because in the frontend type, the construction of the components of the IC is directly done inside the wafer without covering the wafer, which makes the pattern more precise. ASML, Canon, Nikon, EV Group, Global Foundries, Eulithia AG are some of the leading players which are operating in the global photolithography equipment market. ASML here plays a role of a monopoly market contributing to the highest share of 91.6% in the market with its major customers being Samsung, Intel, and TSMC. ASML has been the key market player for the past 10 years and is expected to lead the market in the future as well on account of its high reliability and importer satisfaction. These companies are launching highly reliable, photolithography techniques with progressive instruction sets, technologically advanced light beam techniques with high frequency, accuracy, and precision. The companies operating in the market are using organic strategies such as new product launches and merges & collaborations to boost their shares in the market and meet consumer demands. “Global photolithography equipment market is anticipated to grow at a significant pace during the forecast period due to the increasing technological advancements, new customer engagement, need of semiconductor IC chips in numerous sectors, increased government investments for photolithography equipment.”, said Mr. Karan Chechi, Research Director with TechSci Research, a research based global management consulting firm.
21
Sample Data - Snapshot Global Photolithography Equipment Market Size, By Value (USD Million), 2016–2026F
5.00
2016
6.00
7.00
8.00
CAGR By Value
XX%
9.00
10.00
2020
2021E
11.00
15.00
2026F
CAGR By Value
YY%
2016 2020
14.00
13.00
12.00
2021E 2026F
Europe Photolithography Equipment Market Share, By Type, By Value, 2016–2026F EUV DUV I-line ArF ArFi 2026F 2025F 2024F 2023F 2022F 2021E 2020 2019 2018 2017 2016
25% 25% 25% 25% 25% 25% 25% 25% 25% 25% 25%
25% 25% 25% 25% 25% 25% 25% 25% 25% 25% 25%
10% 10% 10% 10% 10% 10% 10% 10% 10% 10% 10%
20% 20% 20% 20% 20% 20% 20% 20% 20% 20% 20%
KrF 10% 10% 10% 10% 10% 10% 10% 10% 10% 10% 10%
10% 10% 10% 10% 10% 10% 10% 10% 10% 10% 10%
Germany Photolithography Equipment Market Share, By Wavelength, By Value, 2016–2026F 370nm-270nm 2026F 2025F 2024F 2023F 2022F 2021E 2020 2019 2018 2017 2016
30% 30% 30% 30% 30% 30% 30% 30% 30% 30% 30%
270nm-170nm 40% 40% 40% 40% 40% 40% 40% 40% 40% 40% 40%
170nm-1nm 30% 30% 30% 30% 30% 30% 30% 30% 30% 30% 30%
22
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Report Name: GLOBAL PHOTOLITHOGRAPHY EQUIPMENT MARKET FORECAST & OPPORTUNITIES 2016 – 2026
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About Us & Disclaimer
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proprietary forecasting models use various analyses of both industry-specific and macroeconomic variables on a state-by-state basis to produce a unique ‘bottom-up’ model of a country, regional and global industry prospects. Combined with the detailed analysis of company activity and industry trends, the result is a uniquely rich evaluation of the opportunities available in the market.
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