MICROLAB
OPEN ACCESS CLEANROOM FOR GLASS & SILICON ETCHING OF MICROSTRUCTURED DEVICES
CLEANROOM
• All technology available for entire process flows, incl. patterning, etching, bonding and dicing.
• Wafer size of 100 mm.
• Feature size < 1 μm.
• Foster multidisciplinary research.
• Intensify cooperation with industry.
• Focus on microfluidic solutions for medical, pharma and biotech applications.
CONTACT
MICROLAB
Vrije Universiteit Brussel Pleinlaan 2 - 1050 Brussels
Prof. Dr. Ir. Wim De Malsche, Scientific Director wim.de.malsche@vub.be
Ir. Filip Legein Operational Manager filip.legein@vub.be
WE OFFER
• Deep reactive ion etching (DRIE) of glass
• DRIE of Si
• Lithography
• Thermal evaporation
• LPCVD furnace
• Plasma cleaning
• Wafer bonding
• Wafer dicing
• Wet benches
• Characterization (SEM, optical microscopes, profilometer, …)
WWW. MICROLAB.RESEARCH.VUB.BE
300 m2 class 100 area
250 m2 technical area
Capacity of 5-8 FTE
Flexible office for users
Accessible with wheelchair
Located at Etterbeek Campus, Centre of Brussels
