BAV 2000

901 1101 1250 1401

TURN THE MOST AMBITIOUS PRODUCTION PLANS INTO REALITY

BAV 2000

501 641 701 761

BAV 2000

Platform summary New high efficiency pumping solutions for fast cycle times Space for multiple sources Custom source and tooling solutions Innovate new quartz monitoring technology for management of multiple sources

The BAV2000 is designed for high throughput production with the largest batch sizes

600

1. CHOOSE YOUR CHAMBER GEOMETRY Standard Throw - for typical metals and dielectrics depostion Extended Throw - for “lift off” Split Chamber - for reactive materials Extended rear for custom dep & etch requirements

2000

1800

TYPICAL LAYOUT

2900

2. CHOOSE YOUR SOURCES EBS electron beam guns (multiple) A wide range of thermal sources Barrel sources and effusion cells Ion and plasma sources for PIAD or etch Back & front side heating Linear and round sputter cathodes 3. CHOOSE YOUR TOOLING

2000

Dome as standard Additional options for:-- Flip systems -- Planetary -- Custom designs

3900

4. CHOOSE YOUR PROCESS CONTROL Substrate size

Capacity

Segmented dome* 4” 240 5” 144 6” 108 8” 60 *Planets also available on request

Evatec AG Hauptstrasse 1a CH-9477 Trübbach Switzerland

Single dome 256 164 114 65

Tel: + 41 81 403 80 00 Fax: + 41 81 403 80 01 info@evatecnet.com www.evatecnet.com

Khan system & process controller as standard Additional options for:-- Quartz or optical monitoring layer termination -- Optical pyrometry - temperature control

Product descriptions, photos and data are supplied within the brochure for general information only and may be superseded by any data contained within Evatec quotations, manuals or specifications.

Edition 1: Printed November 2013