SSC125 - MINI SPUTTER SOURCE The power to innovate • Test novel thin film ideas • Speed up process development • Eliminate costly test targets The SSC125 is a “mini” sputter source intended for both development and production. The source is flange mounted in single, dual, triple or quadruple combinations. Power supply configurations enable operation of the individual cathodes in series or simultaneously for development of alloys, phase change materials or complex dielectric stacks avoiding extended development times with expensive test alloy targets. Source shutters can be fitted for each cathode or according to planned operational mode. Targets are water cooled individually to ensure optimum conditions are maintained for each cathode and the source flange opens through 180 for simple target exchange. The source flange can be fitted to either Single or Batch Process Modules and is fully integrated within the Radiance software architecture.
Example configuration showing four SSC125 installed on a Single Process Module (SPM)
SSC125 - MINI SPUTTER SOURCE
Specifications Nominal Target Diameter
125mm
Sputter Modes
DC, DC Pulsed, Mid Frequency, or RF
Configuration Options
Single Source Dual Source Triple Source Quadruple Source
Operation Modes
Individually or simultaneously according to Sputter Mode and Power Supply Configuration
Target Cooling
Indirect
Single SSC125 mounted on hinged flange in Single Process Module
Evatec Ltd. Lochrietstrasse 14 CH-8890 Flums Switzerland Tel: + 41 81 720 1080 Fax: + 41 81 720 1081 info@evatecnet.com www.evatecnet.com Product descriptions, photos and data are supplied within the brochure for general information only and may be superseded by any data contained within Evatec quotations, manuals or specifications.