We offer more than 'just the box'
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Solutions
Sales
Service
Support
Vacuum Division Summary Vacuum Pumps
Coarse to Rough Pumps
Diaphragm
Scroll
Rotary Vane/Hybrid
Roots Booster
Multi-Stage Roots Booster
Screw
Central Network Systems
Industrial Vacuum Systems
Turbomolecular
Oil Diffusion
Cryogenic & Cryostats
Ion (Sputter)
Vacuum Valves
Traps & Filters
Pages 4 - 11 High to Ultra High Vacuum Pumps
Pages 12 - 14 Remanufactured Vacuum Pumps
We supply an extensive range of remanufactured pumps
Page 14
Vacuum Components
Flanges/Fittings & Oils/Fluids
Feedthroughs
Page 15
Vacuum Chambers
Page 15
Vacuum Manipulation (Heating & Cooling) Page 15
Leak Detection
Motion feedthroughs, sample transfer & rotation, translation devices, XYZ & Z only manipulation, rotary & linear drives, wobble sticks, etc Heating & cooling stages from 1,800 °C to liquid helium temperatures
Overpressure (Sniffer)
Vacuum Test - Portable
Vacuum Test - Production
Vacuum Gauges & Transducers (Gas-Type Independent)
Vacuum Gauges & Transducers (Gas-Type Dependent)
Vacuum Gauge Controllers
Thermal Based MFCs & Meters
In-Situ Mass Flow Verifiers
Flow Ratio Controllers
Page 16
Vacuum & Pressure Measurement
Pages 17 - 21
Mass Flow, Control & Verification (Gas & Vapour)
Pressure Controllers
Pages 22 - 24 Front Cover image courtesy Australian Synchrotron – soft x-ray beamline
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Gas Analysis - Mass Spectrometry
Vacuum Quality Monitor (VQM) Systems
Residual Gas Analysers (Quadrupole)
Non-Dispersive InfraRed (NDIR)
Fourier Transform InfraRed Spectroscopy (FTIR)
Physical Vapour Deposition (PVD)
Chemical Vapour Deposition (CVD)
Plasma Enhanced Chemical Vapour Deposition (PECVD)
Atomic Layer Deposition (ALD)
DRIE & RIE
Organic Deposition & Metalisation System
Thin Film System Components & Materials
Nanomaterials
Pages 25 - 26
Thin Film Systems, Nano Fabrication & Materials
Pages 27 - 29
Recirculating Chillers
Perfect for PVD, Etching, Sputtering, Wet Benches
Page 29
Plasma & Surface Modification
Direct Current Power Generators
Pulsed Direct Current Power Generators
Gloveboxes
Anhydrous Solvent Purification
Routine Lab Applications
Advanced Applications
Radio Frequency Power Generators
Microwave Power Generators
Pilot Applications
Production Applications
Pages 30 - 31
Gloveboxes & Anhydrous Solvent Purification Page 32
Freeze Drying Pages 33 - 35
Rotational Vacuum Concentrators
Various models from basic requirements to HCI resistant & infrared heating
Page 35
Maintenance & Repair Services Page 36
Installation & Customisation Page 37
We service all types of vacuum pumps for all brands
Our trained engineers custom design & install purpose-built solutions plus conduct staff training on your premises
We offer more than 'just the box'
To ensure you select the right instruments for your needs, contact John Morris Vacuum for professional assistance
New Zealand - Toll Free: 0800 651 700
Solutions
3
Sales
Service
Support
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Vacuum Pump Selection Guide To determine the correct type of pump for your particular application consider the following factors.
Ultimate Vacuum Range The lower a vacuum pump’s pressure (eg 10-10) the higher the vacuum level (as there are less gas molecules within the vacuum chamber) - measured in millibar (mbar), Torr, Pascal, etc.
Pumping Speed Measures a pump’s capacity to remove gas from the chamber (measure of the gas volume displaced versus time) - common units of measurement are m3/hour & L/second
Vacuum Pump Types
Pumping Speed Conversion Table
i
m3/sec
L/sec
m3/sec L/sec m3/hour l/mn CFM
1 10-3 2.78 x 10-4 1.67 x 10-5 4.72 x 10-4
103 1 0.278 1.67 x 10-2 0.472
<10-10
10-10
10-9
10-8
Ultra High Coarse to Rough
l/mn
3,600 3.6 1 6 x 10-2 1.699
CFM
6 x 104 60 16.7 1 28.32
2.12 x 103 2.12 5.89 x 10-1 3.53 x 10-2 1
Ultimate Vacuum (mbar)
Pumping Speed Range Min Max
m3/hour
10-7
10-6
10-5
High
10-4
10-3
10-2
10-1
100
Rough
101
102
103
Coarse
Pages 5 -11
Diaphragm - Turbo Backing
0.7 to
25 m3/hour
- Chemistry Resistant
0.7 to
25 m3/hour
- Liquid Aspiration
-
0.7 m3/hour
Scroll
5.4 to
60 m3/hour
Rotary Vane/Hybrid
1.5 to
1,200 m3/hour
Roots Blower
250 to
10,000 m3/hour
16 to
4,800 m /hour
270 to
5,000 m3/hour
Multi-Stage Roots Booster Screw
Depends on staging configuration
3
Central Network Systems
Depends on configuration
Depends on staging configuration
Industrial Vacuum Systems
Depends on configuration
Depends on staging configuration
High to Ultra High Turbomolecular
Pages 12 -14 7.5 to
3,200 L/sec
Oil Diffusion
3,000 to
50,000 L/sec
Cryogenic & Cryostats
2,600 to
60,000 L/sec
Ion (Sputter)
0.2 to
1,200 L/sec
Transfer v’s Capture Pumps
Transfer Pumps - force gas molecules in a preferred direction by positive displacement or momentum exchange where the gas is compressed until slightly above atmospheric pressure when ejected
Capture Pumps - immobilise gas molecules from re-entering the vacuum system via a cold surface or by ionisation
Wet v’s Dry Pumps
Wet Pumps - use low vapour pressure oil in the pumping mechanism for sealing/lubricating the vacuum compression stages (rotary vane) or compressing the gas molecules in vapour form (diffusion)
Dry Pumps - have no oil sealing fluid which avoids hydrocarbon contamination. Some pumps truly have no oil lubricants while others may have lubricated gears/bearings sealed from the vacuum track by o-rings/seals
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Coarse to Rough Vacuum Pumps Diaphragm Pumps Description
Rough Vacuum • Gas Transfer Removal Method • Dry Pump
Operation
A flexible diaphragm mechanically moves to increase/decrease a pumping chamber volume - this change in volume compresses & expands process gas to create a vacuum
Applications
Vacuum filtration, rotary evaporation, distillation, gel drying, centrifugal concentration, vacuum drying & turbo backing applications
Turbo Backing Ultimate Vacuum mbar (without gas ballast)
Pumping Speed (m3/h) 50 Hz
MV 10 NT VARIO
0.3
12.1
Divac 0.8 LT
≤0.5
0.77
1
3.8
Divac 1.4HV3
≤1.5
1.3
MD 1
1.5
1.2
Divac 4.8VT
≤2.0
4.8
-
Suitable for small hybrid turbo pumps (<700 L/s)
Divac 0.8 T
≤3.0
0.77
-
Suitable for small hybrid turbo pumps (<150 L/s)
Model
MD 4 NT
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ATEX Category 3 (internal Atm only)
Comment/ Application
Variable speed control motor & ideal for larger turbo pumps (>500 L/sec)
-
Suitable for small hybrid turbo pumps (<150 L/s)
For hybrid turbo pumps (<700 L/sec)
-
Suitable for small hybrid turbo pumps (<300 L/s)
Suitable for small hybrid turbo pumps (<300 L/s)
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Chemistry Resistant Model
PC 3003 VARIO
Ultimate Ultimate Vacuum Vacuum mbar mbar (without (with gas gas ballast) ballast)
0.6
2
Pumping Speed (m3/h) 50 Hz
2.8
Base Pump
ATEX Category 3 (internal Atm only)
MV 2C NT VARIO
Inlet/ Outlet Catchpot
Suitability
Both
Evaporating high boiling point solvents
Both
Rotational vacuum concentrators, multiple rotary evaporators & large vacuum ovens
Optional
Variable speed for rotary evaporation & rotational vacuum concentration
MD 4C NT+ AK+ EK
1.5
3
3.4
MD 4C NT
Divac 1.4HV3C
≤2
-
1.3
-
Both
Automatic rotary evaporation, rotational vacuum concentration & vacuum ovens
-
PC 3001 VARIO Pro
2
4
2.0
MD 1C VARIO -SP
MZ 2C NT+ AK+ EK
7
12
2.0
MZ 2C NT
Both
Rotary evaporation, rotational vacuum concentration & vacuum ovens
PC 101 NT
7
12
2.0
ME 2C NT
Both
Gel drying
Divac 0.6L
≤8
-
0.6
-
-
Optional
Small volume evaporation (rotary & rotational vacuum)
Divac 2.2L
≤8
-
2.0
-
-
Optional
Evaporation (rotary & rotational vacuum)
Divac 1.2L
≤8
-
102
-
-
Optional
Small volume evaporation (rotary & rotational vacuum)
MZ 1C
12
20
0.75
-
-
Rotary/parallel evaporation
ME 2C NT
70
-
2.0
-
Both
Multiple filtrations & solid phase extraction
ME 1
100
-
0.7
-
Both
Aqueous filtration only
ME 1C
100
-
0.7
-
Both
Solvent filtration & solid phase extraction
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Liquid Aspiration Single stage diaphragm pump with good suction power Excellent chemical compatibility for solvent sample & disinfecting Vacuum regulation to define the aspiration flow rate Collection flask with sterile filter to protect the pump & workplace from biological hazards
BVC Basic
BVC Control
BVC Professional
-
ME 1C
ME 1C
Mechanical
Electronic
Electronic
Ideal for labs with ‘central house’ vacuum
With integrated ME 1C Vacuum pump - quiet & vibration free
Integrated vacuum pump & non-contact liquid level sensor
Base Pump 4 L PP Collection Flask Pressure Switch Type Comments
Scroll Pumps Description
Rough Vacuum • Gas Transfer Removal Method • Dry Pump
Operation
2 open spiral metal strips are nested together (one is fixed & the other ‘orbits’) sealed with a tip seal. As the orbit occurs, the connection with the inlet closes, trapping & compressing a volume of gas until it reaches a minimum volume & maximum pressure at the spirals’ centre (where outlet is located)
Applications
Suited in applications requiring dry & clean vacuum (typically replacing rotary vane pumps) - predominantly for backing turbo pumps within leak detection systems, accelerators/synchrotrons, surface analysis instruments, scanning electron microscopes, load lock/transfer chambers, spectroscopy
Low Base Vacuum & High Effective Pumping Speed
Scrollvac Pumps
Low noise & vibration Completely oil free & easy to maintain Nominal Pumping Speed (50 Hz): 5.4 to 60.0 m3/h Attainable Ultimate Vacuum: Down to 0.01 mbar Leak Rate: 10-6 mbar L/s
Rotary Vane/Hybrid Pumps Description
Coarse or Rough Vacuum • Gas Transfer Removal Method • Wet (Oil-Sealed)
Operation
An eccentric rotor compresses process gas within a pump chamber (stator). Oil is injected into the stator to create the vacuum seal, lubrication & cooling
Applications
Rough Pumps - used primarily as backing pumps for roots/high-vacuum gas transfer pumps (eg turbomolecular & diffusion) Coarse Pumps - used in freeze drying, vacuum filtering/vacuum impregnation, materials handling & ‘house’ vacuum systems
Single-Stage Pumps
Sogevac range of pumps are market leading for industrial, manufacturing & R&D rough vacuum applications ATEX RL 94/9/EC certified versions available (explosion protected) Pumping Speed (50 Hz): 9.5 to 1,150 m3/h Ultimate Partial Pressure (without gas ballast): Down to 5 x 10-2 mbar Water Vapour Capacity: 20 to 34,000 grams/hour
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Sogevac SV 10B
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Dual-Stage Pumps
Ideal for continuous operation ATEX RL 94/9/EC certified version available (explosion protected) Low & easy maintenance Large range of accessories to suit your application Model
Nominal Pumping Speed (m3/h) 50 Hz
Ultimate Ultimate Water Vapour Vacuum mbar Vacuum mbar Capacity (without (with gas (grams/hour) gas ballast) ballast)
Inlet Flange (KF)
Motor Rating (Watts)
S1.5
1.9
3 x 10-2
5 x 10-1
19
16
80
RZ 2.5
2.3
4 x 10-4
1 x 10-2
62
16
180
Trivac D4B
4.8
10-4
<5 x 10-3
95
16
370
RZ 6
5.7
4 x 10-4
1 x 10-2
163
16
300
5.9
4 x 10-4
1 x 10-2
>163
16
370
Trivac D8B
9.7
10-4
<5 x 10-3
160
16
370
Trivac D 16 B
18.9
10-4
<5 x 10-3
305
25
550 to 750
Trivac D 25 B
29.5
10-4
<5 x 10-3
480
25
750
Trivac D 40 B
46.0
10-4
<5 x 10-3
1,185
40
2,200
Trivac D 65 B
75.0
10-4
<5 x 10-3
1,925
40
2,200
RC 6
Chemical resistant with unique â&#x20AC;&#x2DC;hybridâ&#x20AC;&#x2122; design
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Roots Booster Pumps Description
Coarse to Rough Vacuum • Gas Transfer Removal Method • Dry Pump
Operation
A positive displacement lobe pump which pumps gases with a pair of contactless meshing lobes
Applications
High gas load/high pumping speed requirements
High Reliability & Rapid Pumpdown
Ruvac WAU 501
Ruvac WH 7000
Increased process gas throughput via significantly exhanced pumping speed Suitable for multitude of industrial & R&D applications Ultimate Pressure down to 10-4 mbar (3 stage system) Vertical & horizontal gas path configurations ATEX (94/9/EG) compliant versions available
710 to 10,000 m3/h
253 to 2,050 m3/h
Max Permissible Pressure Difference (continuous operation)
30 to 75 mbar
50 to 80 mbar
Motor Power
2.2 to 11 kW
≤1.1 to 7.5 kW
Nominal Pumping Speed (50 Hz):
Multi-Stage Roots Booster Pumps Description
Rough Vacuum • Gas Transfer Removal Method • Dry Pump (Atmosphere to 10-4 mbar)
Operation
Similar to Roots Blower but have multiple stages for improved ultimate vacuum
Applications
Turbo pump backing, load locks, PVD systems, analytical instruments (LCMS, ICPMS), electron microscopes, oxygen plasma systems & helium cryostats - ideal for replacing wet pumps plus Scroll type dry vacuum pumps
Non-Contact Pumping Mechanism
EV-A03
EV-A06
EV-A10
15
36
60
1 x 10-2/10-1
1 x 10-2/10-1
1 x 10-2/2 x 10-2
250 grams/hour
350 grams/hour
500 grams/hour
NW25/NW25
NW40/NW25
NW40/NW25
0.34
0.59
1.1
Dry roughing pump achieves 10-2 mbar ultimate vacuum Highest water vapour pumping & vacuum level of any air-cooled dry pump Single & three-phase motors also available Low power at ultimate vacuum
Pumping Speed (m3/h) Ultimate Pressure (mbar) - Gas Ballast Off/On Max Water Vapour Pumping Rate - Gas Ballast Off Connection - Gas Inlet/Outlet Power at Ultimate Vacuum (kW)
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Screw Pumps Description
Rough Vacuum • Gas Transfer Removal Method • Dry Pump
Operation
Two contra-rotating ‘screws’ mesh (but don’t touch) with each other & when the screws are rotated, gas is compressed/transferred from one end to the other. The construction material enables operation in the harsh environments of aggressive gases & particulates found in semiconductor etching & CVD processes
Applications
Industrial, food & beverage, freeze drying & central vacuum systems
Dry Vacuum Solution for Industrial Applications
Dry compressing pumps for special industrial applications where reliable, compact & low maintenance vacuum technology is demanded Ideal alternative to conventional oil-sealed vacuum systems Effective Pumping Speed (50 Hz): 270 to 630 m3/h Ultimate Pressure: ≤0.01 mbar
ScrewLine Pumps
One Design Platform - Numerous Configurations
Dry vacuum pumps designed for applications in the photovoltaic production chain (eg PECVD, PVD & crystal growing, etc.), coating applications & process industry in general Rugged, reliable & durable - ready to fulfill stringent process requirements Nominal Pumping Speed (50 Hz): 450 to 5,000 m3/h Ultimate Pressure: 5 x 10-3 mbar
Dryvac
Power plus High Performance
Range of pumps ideal for rough applications & high process throughput Optimised performance for light gases Nominal Pumping Speed (50 Hz): 80 to 3,800 m3/h Ultimate Pressure: 1 x 10-2 mbar Leyvac LV 140
Central Network Systems
At John Morris we provide a total solution in catering for your vacuum network needs - from conceptual design, co-ordination of external contractors (plumbers, electricians, etc), complete installation & commissioning plus staff training & equipment servicing. Subject to your particular requirements, we provide a number of options in designing your central vacuum systems requirements building-wide (‘house’) & local area networks
Building-Wide (‘House’) Central Vacuum Systems Modular systems engineered for improved operational reliability with frequent varying vacuum requirements … delivery of turnkey ready-to-operate & tested units Industrial duty quality Typically consisting of SOGEVAC pump(s), buffer vessel, electrical cabinet with controller & all connecting components Pumping speeds from as low as 25 m3/h up to large turn-key installations Ultimate pressure down to 10-3 mbar Vessel volume starting from 60 L Control type BASIC or full featured
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Local Area Vacuum Networks (VACUU•LAN) Modular in design allowing you to tailor your specific needs & make it easy to supply several different work stations with 1 vacuum pump Avoids the drawbacks of a central ‘house’ vacuum supply (expensive redundancy, rigid pipe work & limited chemical resistance) Modules are solvent resistant Built-in check valves ensure adjacent applications do not contaminate or interfere with one another Ideal for new or existing laboratories with harsh sovents/chemical vapours
Base Pump Ultimate Vacuum mbar (without gas ballast) Ultimate Vacuum mbar (with gas ballast) Pumping Speed (m /h) 50 Hz 3
PC 3004 VARIO
PC 3016 NT VARIO
MD 4C NT VARIO 1.5
ME 16C NT VARIO 70
3
100
4.6
19.3
Chemical Resistant ATEX - Category 3 (internal Atm only) Separator Catchpot Exhaust Vapour Condenser
Industrial Vacuum Systems Design & manufacture of custom industrial vacuum solutions High flexibility & reliability Integrated forevacuum & high vacuum pump systems for custom requirements Custom software programming and customisation On-site commissioning & training
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High to Ultra High Vacuum Pumps Turbomolecular Pumps Description
High & Ultra Vacuum • Gas Transfer Removal Method • Dry Pump
Operation
Pumping effect is created by multiple spinning rotor discs which transfer momentum to gas molecules through various compression stages
Applications
High energy physics, synchrotrons, microscopy, mass spectrometers, surface analysis, thin film coating, space simulation chamber & optical lasers
Mechanical Rotor Suspension Clean high & ultra high vacuum generation with ceramic life-time lubricated bearings Pumping speed up to 1,150 L/s Versions with high resistance to mechanical shocks & shock venting, plus removable electronics for radiation applications Pumping Speeds (L/sec): N2
Ar
He
H2
33 to 1,150
30 to 960
36 to 1,150
28 to 690 Turbovac SL 300
Maintenance-Free Turbo Pump - Hybrid Bearings
Hybrid design with permanent magnet upper & ceramic lower bearing Industry leading pumping speeds for light gases (He & H2) Lower ceramic bearing is field replaceable with no oil/operating fluid changes Integrated electronics Forevacuum connection: DN 25 KF Pumping Speeds (L/sec): Model
N2
Ar
He
H2
Turbovac 350 i Turbovac 450 i Turbovac T 350 i Turbovac T 450 i
290 430 290 430
260 400 260 400
360 440 360 440
350 420 320 400
Magnetically Levitated Turbomolecular Pumps 100% maintenance free with no mechanical bearings Eliminate the need for a conventional rack-mounted controller & inter-connecting cables via fully integrated converter & power supply High Vacuum Flange: 100 to 250 ISO-K/CF
Pumping Speeds (L/sec) Maximum Forevacuum Pressure (N2) Nominal Speed (min-1)
• N2 • Ar • He • H2
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Flange Size DN100 (ISO/CF) DN160 (ISO/CF) DN100 (ISO/CF) DN160 (ISO/CF)
Turbovac 450 i
Forevacuum Pressure (Max) 10 mbar 10 mbar 0.5 mbar 0.5 mbar
Turbovac Magintegra
300 to 2,100 1,050 to 1,900 260 to 2,050 190 to 1,750 2.5 to 8.0 mbar 30,600 to 58,000
12
Turbovac Mag Digital
300 to 3,200 260 to 3,000 260 to 3,000 190 to 2,250 2.0 to 8.0 mbar 28,800 to 58,800
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Compact Turbomolecular Pump System Fully assembled & ready-to-use high vacuum system Wide range turbomolecular pump system with ceramic ball bearings (200,000 hour life-time) Dual-stage, DIVAC 0.8 T diaphragm vacuum pump All connection & sealing components are located within pump system assembly High vacuum connection: DN 63 ISO-K/CF or DN 63 CF Pumping speed for N2: 65 L/sec Ultimate pressure: 10-8 mbar (max)
Turbolab 80
Oil Diffusion Pumps
Description
High Vacuum • Gas Transfer Removal Method • Wet (Oil-Sealed)
Operation
Vacuum oil is heated, vapourised & accelerated (to speed of sound) & collides with gas molecules, forcing them towards the pump exhaust - thus creating a vacuum
Applications
Suitable for applications requiring huge pumping speeds (molecular beam systems, large scale vacuum furnace processing, space simulation chambers)
High Vacuum Without Moving Parts
Leybojet 630
Inlet Connections: From ISO 250 to ISO 1,000 DN Flange Pumping speed for air: From 3,000 to 50,000 L/s Ultimate total pressure <5 x 10‐7 mbar Integrated water-cooled cold cap baffle guarantees low oil back-streaming into the chamber
Cryogenic Pumps & Cryostats
Description
High & Ultra High Vacuum • Gas Capture Removal Method • Dry Pump
Operation
Traps gases & vapours by condensing them on a cold surface
Applications
Suited for non-aggressive processes where oil-free operation & high pumping speeds are essential
Cryopumps & Systems
No moving parts within vacuum system (low maintenance) Single, double or multiple systems - choose from 30 models Intelligent regeneration prevents formation of ignitable gas mixtures (H2 & O2) Highly effective pumping speed for all gases (water vapour in particular) 100% available pumping speed & capacity after each regeneration run Insensitive to mechanical disturbances (eg process particles or external vibrations) High Vacuum Flange (160 to 1250 ISO-F DN) - Forevacuum Flange (25 KF to 63 ISO-K) Pumping Speeds (L/sec):
Coolvac
H2O
Ar
N2
H2
2,600 to 18,000
640 to 47,000
800 to 57,000
1,000 to 60,000
Capacity (bar x L): Ar/N2 (300 to 6,500); H2 at 10-6 mbar (4.5 to 150) Max Forevacuum Pressure (N2): 2.5 to 8.0 mbar
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Cold Heads for Cooling Cryo Pumps/Cryostats
Gas refrigerating systems for cryogenic temperature generation (based on Gifford-McMahon principle) Designed for cooling super-conductors (magnets, samples) for medical research Long maintenance-free operating time with low vibration Refrigerating capacity: two-stage down to 8 K; single-stage down to 25 K Resistant to particles & deposits Simple & intuitive operation No need for liquid helium & liquid nitrogen
Coolpower
Ion (Sputter) Pumps
MAGNET
Ti/Ta PLATES
Description
Ultra High Vacuum (dependent upon design) • Gas Capture Removal Method • Dry Pump
Operation
The process gas is ionised & is attracted to a cathode plate (typically titanium) with sufficient force to sputter the titanium. The sputtered material coats the process gas & traps it within the ion pump, creating a vacuum
Applications
Primarily the choice for all true UHV chamber - they are clean, bakeable, vibration-free, operate from 10-5 to 10-12 mbar & have long operating lives
Choice of 3 options dependent upon desired orientation
Pumping Speed (L/sec) Ultimate Pressure (mbar) Max Start Pressure (mbar)
Small Ion Pumps
Tall Profile Ion Pumps
Low Profile Ion Pumps
Mounted in any orientation
Orientates the elements horizontally
Orientates the elements vertically
3 to 75 (Dioxide)
300 to 250 (Dioxide)
100 to 1,200 (Dioxide)
0.2 to 60 (Noble Dioxide)
240 to 250 (Noble Dioxide)
80 to 960 (Noble Dioxide)
<10-11
<10-11
<1 x 10-4
<1 x 10-4
<10
-11
<1 x 10-4
Remanufactured Vacuum Pumps We supply an extensive range of remanufactured pumps from quality manufacturers - all types, dry or wet … simply contact us to discuss your requirements
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Vacuum Components We provide a comprehensive range of vacuum components as building blocks for any vacuum system For the full range, price & availability see www.johnmorrisgroup.com
Flanges, Viewports & Fittings (KF, CF, ISO, ASA)
Feedthroughs (Electrical, Instrumentation, Gas, Liquid)
Traps & Filters
Vacuum Valves
Oils, Fluids & Greases
Vacuum Chambers Off-the-shelf & turn-key options available High & ultra-high vacuum chambers for R&D & production environments Choice of chambers include Box, Spherical, Cylindrical, Service Well & Water Cooled
Vacuum Manipulation (Heating & Cooling) Vacuum manipulation mechanically moves an object inside a vacuum chamber without breaking the vacuum
Devices include motion feedthroughs, sample transfer, translation devices, XYZ & Z only manipulation, sample rotation, rotary & linear drives, wobble sticks, etc Heating & cooling stages from 1,800 째C to liquid helium temperatures
MultiMotion XYZT
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Leak Detection All components/systems leak gas to varying degrees. It is important to quantify the leakage rate to determine if it is within acceptable application guidelines (the ‘leak rate’ is typically measured in mbar x Liters x seconds-1). Leakage Rate (mbar L/s)
Vacuum Pump Types
<10-10
10-10
10-8
10-9
10-7
10-6
10-5
10-4
10-3
10-2
10-1
100
101
102
103
Overpressure (a test piece is pressurised which forces the gas out where leak occurs) Bubble Testing Pressure Decay Thermal Conductivity Hydrogen Sniffer Helium Sniffer Vacuum Test (a test piece is evacuated under vacuum & a tracer gas is used to meaure leakage rate) Helium/Hydrogen Leak Detector
Overpressure Helium Sniffer - Selective Ion Pump Based
Portable with probe & sampling line High sensitivity for helium (1 x 10-6 mbar L/sec) Response time <0.1 seconds; Extremely short clean-up time Automatic tuning & zeroing PHD-4
Vacuum Test Helium/Hydrogen Leak Detector - Mass Spectrometer Based Intuitive touch-screen operation with iPad control Integrated data storage to generate test reports for accurate quality assurance Automatic calibration with integrated test leak plus automatic functions Robust & low maintenance Available in oil or dry vacuum pump systems
Portable (with or without cart)
Production
iPad Touch-Screen
Fastest mobile leak detector on the market
Most compact unit in its class Phoenix L300i
Phoenix L300i Dry
Phoenix L500i
Smallest Leak Rate (Vacuum)
≤5 x 10 mbar L/sec
≤3 x 10 mbar L/sec
≤5 x 10-12 mbar L/sec
Smallest Leak Rate (Sniffer)
<1 x 10-7 mbar L/sec
<1 x 10-7 mbar L/sec
<1 x 10-7 mbar L/sec
>2.5 L/sec
>2.5 L/sec
50 L/sec
< 1 sec
< 1 sec
< 0.2 sec
-12
Helium Pumping Speed Response Time
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Vacuum & Pressure Measurement There are 2 common types of pressure measurement - the right choice depends on the pressure range & the residual gases in the vacuum for your application. Gas-Type Independent: Have liquid or solid diaphragms that change position under the force of all the gas molecules bouncing off them & measure absolute pressures unaffected by gas/vapour properties Gas-Type Dependent: Measure a bulk property (thermal conductivity, ionisation or viscosity) & the pressure is dependent upon gas composition
Ultimate Vacuum (mbar)
Vacuum Gauge Types & Pressure Ranges Gas-Type Independent
<10
-10
10
-10
10
-9
10
10
-8
-7
10
-6
10-5
10-4
10-2
10-3
10-1
100
101
102
103
Pages 19 - 20
Bourdon Capsule Diaphragm Capacitance Manometers (Baratron速) Gas-Type Dependent
Pages 20 - 21
Piezo Gauge Thermocouple Pirani Convection/Pirani Spinning Rotor Hot Cathode (Ionization) Cold Cathode (Ionization)
In addition to pressure range other features need to be considered: how it is affected by radiation, magnetism, temperature, vibration & corrosive gases; damage caused by switching it on at atmospheric pressure
Pressure Unit Conversion Table
i
atm
g/cm2
Torr
mbar
inch.Hg
psi
1.02 x 10-5
0.9869 x 10-5
1.02 x 10-2
0.75 x 10-2
10-2
0.2953 x 10-3
0.1451 x 10-3
1
1.02
0.9869
1,020
750
1,000
29.53
14.51
0.980 x 10
0.980
1
0.968
1,000
735
980
28.94
14.22
1.013 x 10
1.013
1,033
760
1,013
29.92
14.70
98
0.735
0.98
0.02894
1.422 x 10-2
1 Torr 1 mbar
1 Pa 1 bar
Pa
bar
Kg/cm2
1
10-5
105
1 Kg/cm
2
1 atm
5
1.033
1
0.098 x 10
10
0.968 x 10
1
133.3
0.1333 x 10-2
1.36 x 10-3
1.31 x 10-3
1.36
1
1.33
0.0394
0.0193
100
1 x 10-3
1.02 x 10-3
0.9869 x 10-3
1.02
0.750
1
0.02953
0.01451
1 inch.Hg
3,386
3.386 x 10-2
0.03454
0.03327
34.53
25.4
33.78
1
0.4910
1 psi
6,890
6.89 x 10
0.0703
0.068
70.3
51.71
68.947
2.036
1
1 g/cm
5
2
-2
-2
-3
-3
1 Torr = 1 mm Hg
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Vacuum Gauge Descriptions Bourdon Gauge The circular arc (Bourdon tube) is connected to the vacuum system & due to the external atmospheric pressure exerted, the end of the tube bends (more or less) during the evacuation process which moves the pointer
Capsule Vacuum Gauge Contains a hermetically sealed, evacuated, thin-walled diaphragm capsule - as the pressure reduces, the capsule deflects & mechanically moves a pointer to display a vacuum reading
Diaphragm Vacuum Gauge A sealed & evacuated vacuum chamber is separated by a diaphragm from the vacuum pressure to be measured. This serves as the reference quantity. With increasing evacuation, the difference between the pressure (which is to be measured) & the pressure within the reference chamber becomes less, causing the diaphragm flex.
Piezo A silicon crystal diaphragm is placed over a vacuum reference pressure. The measured change in resistance (as a result of diaphragm deflection) serves as a parameter for the pressure. These gauges are accurate between the pressures of 1 mbar to ATM.
Thermocouple A wire filament is heated by running current through it. A thermocouple or resistance thermometer (RTD) is used to measure the temperature of the filament. This temperature is dependent on the rate at which the filament loses heat to the surrounding gas & therefore indicates vacuum level.
Pirani (Thermal Conductivity) Gauge Utilises the thermal conductivity of gases. The filament within the gauge head forms one arm of a Wheatstone bridge. The heating voltage which is applied to the bridge is controlled in such a way that the filament resistance & thus the temperature of the filament remains constant regardless of the quantity of heat given off by the filament. Since the heat transfer from the filament to the gas increases with increasing pressures, the voltage across the bridge is a measure of the pressure.
Convection/Pirani A standard Pirani gauge has an accurate measuring range 10-4 to 10 mbar. By taking advantage of the convection currents that are generated above 1 mbar, convection-enhanced Pirani gauges increase the accuracy of the vacuum range to atmosphere.
Spinning Rotor Measures the amount a rotating ball is slowed by the viscosity of the gas being measured. The ball is magnetically levitated inside a steel tube closed at one end & exposed to the gas to be measured at the other. The ball is brought up to speed & the speed measured after switching off the drive, by electromagnetic transducers - most useful in calibration & R&D laboratories where high accuracy is required.
Hot Cathode (Ionization) Gauge Commonly use 3 electrodes. A hot cathode emits electrons which impinge on an anode. The gas is ionized & the resulting positive ion current is detected through the third electrode (ion detector) & this current is used as the pressure measurement (hot cathode sensors are based on the Bayard-Alpert principle).
Cold Cathode (Ionization) Gauge (Penning) Pressure is measured through a gas discharge (within a gauge head) which is ignited using a magnetron source - the resulting ion current is measured & is proportional to the prevailing pressure.
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Vacuum Gauges & Transducers Gas-Type Independent Single Range Gauges Capacitance Manometers (Baratron® Gauges) ‘Capacitive measurement’ is a plate capacitor comprising of a variable diaphragm & a fixed electrode. When the distance between the 2 plates change, a change in capacitance results. This change, proportional to the pressure, is then converted into a corresponding electrical measurement signal. An evacuated reference chamber serves as the reference for the pressure measurements. Measurement Range mbar Heated or (Full Scale) Ambient
Instrument
Temp
Comments
Entry Level 141A
Absolute
1 to 1,300
Ambient
0 to 50°C
• Fully adjustable set point from 0.2% to 100% of Full Scale • Corrosion resistant • Fast response switching
142A
Absolute
1 to 1,300
Heated
100°C
• Fully adjustable set point from 0.2% to 100% of Full Scale • Corrosion resistant; Fast response switching
626B
Absolute
1 to 1,300
Ambient
0 to 50°C
• 15-pin D-subminiature electrical connector without relays • RoHS compliant
722B
Absolute
1 to 1,300
Ambient
0 to 50°C
• Helps reduce system size • 0-10 VDC or 0-5 VDC output available • Corrosion resistant; RoHS compliant
727A
Absolute
1 to 1,300
Heated
45°C
a-Baratron®
Absolute
0.1 to 1,300
Heated
• Accurate to 0.1% of Reading 45° to 100°C • 15-pin D subminiature electrical connector • RoHS compliant
631D Baratron®
Absolute
1 to 1,300
Heated
• Ideal for freeze drying & demanding etch applications 45°C/200°C • Can be sterilised
627C e-Baratron®
Absolute
1 to 1,300
Heated
i-Baratron® DMB (45°C)
Absolute
1 to 1,300
i-Baratron® DMB (Ambient)
Absolute
120AD/AD
• Smallest heated Baratron® manometer • Designed for semiconductor precursor gas delivery, biopharm & thermal processing, etc
Mid Range
45°C
• Ethernet/IP-compatible • External LEDs indicate device status • Uses MKS’ standard capacitance sensor
Heated
45°C
• DeviceNet digital or analog • Etch sensor available below 130 mbar • RoHS compliant
1 to 1,300
Ambient
0 to 50°C
Absolute
1 to 1,300
Ambient
45°C
• Five decades of measurement range • Independent of gas composition • Integrated signal conditioner
690A
Absolute
1 to 1,300
Heated
45°C
• Accurate to 0.05% of Reading • High accuracy for process or metrology environments
698A
Differential
1 to 1,300
Heated
45°C
• Accurate to 0.05% of Reading • High accuracy for process or metrology environments
121A
Absolute
1 to 33,000
Ambient
Bakeable to 200°C
• DeviceNet digital or analog • RoHS compliant
High End
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• 0-10 VDC for 10% or 100% of Full Scale • Five decades of measurement range • Independent of gas composition • Optimal for engine testing, flow test stands
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Ultimate Vacuum (mbar) <10-10
10-10
10-9
10-8
10-7
10-6
<10
10
10
10
10
10
10-5
10-4
10-3
10-2
10-1
100
101
102
103
10-1
100
101
102
103
Gas-Type Independent Single Range Gauges Burdonvac A
Burdonvac C
Connection flange: DN-16 ISO-KF Connection flange: DN-16 ISO-KF
Connection flange: Capsule Vacuum Gauge DN-16 ISO-KF Connection flange: Capsule Vacuum Gauge DN-16 ISO-KF Diavac DV 1000
Connection flange: DN-40 ISO-KF
902B
MEMS based Piezo sensor with diaphragm based sensor
(Diaphragm)
Absolute Piezo
Ultimate Vacuum (mbar)
Gas-Type Dependent
-10
-10
-9
-8
-7
-6
10-5
10-4
10-3
10-2
Single Range Gauges 615 Series
Thermocouple gauge controller with 2 set point controls
205 Series
Thermocouple controller with accurate calibration with dry air
275
Convection enhanced Pirani & factory calibrated
275
Provides high accuracy & repeatability
925
Measurement 1-2 decades lower than standard Pirani
971B
Stand-alone compact cold cathode
354
High sensitivity for low noise & higher accuracy
355
Smallest Bayard-Alper style with greater burnout resistance
347
Stabil-Ion gauge provides unmatched stability/ repeatability over time
500
Double inverted magnetron for unprecedented accuracy
274
Available with burn-out resistant filaments & standard connections
MiniConvectron® Convectron® Pirani Micro Pirani
UniMag™
Micro-Ion®
Micro-Ion® Bayard-Alpert
Stabil-Ion®
Cold Cathode Gauge Bayard-Alpert Ionization
370
Most accurate B-A - all metal gauge tube for stability & long-term repeatability
423, 431
Based on inverted magnetron design with unique dual feedthrough
Stabil-Ion® Bayard-Alpert I-Mag® Cold Cathode
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Cold Cathode Ion Sensor
Glass Nude
20
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Ultimate Vacuum (mbar)
Wide Range Gauges <10-10
910 Dual Trans™ Micro Pirani/ Absolute Piezo
Micro-Ion, Conductron & 2 Piezo sensors for extended range
901P Micro Pirani ™/ Piezo Loadlock
Fast, accurate, gas independent atmospheric measurement on loadlocks
972B
Combination cold cathode, Micro Pirani
974B QuadMag™ 392 Micro-Ion Plus
10-9
10-8
10-7
10-6
10-5
Micro Pirani & absolute Piezo for increased accuracy
390 Micro-Ion ATM
DualMag™
10-10
10-4
10-2
10-3
10-1
Micro-Ion & Conductron are combined for full range measurement
103
Absolute/Differential Diaphragm Sensor
Cold Cathode Ion Sensor
Cold Cathode Ion Sensor
102
Absolute/Differential Diaphragm Sensor
Heat-Loss Sensor
Heat-Loss Sensor
Combination cold cathode, Micro Pirani, differential Piezo
101
Absolute/Differential Diaphragm Sensor
Heat-Loss Sensor
Hot Cathode Ion Sensor
100
Heat-Loss Sensor
Absolute/Differential Diaphragm Sensor
Heat-Loss Sensor
Hot Cathode Ion Sensor
Heat-Loss Sensor
Vacuum Gauge Controllers Ultimate Vacuum (mbar) <10
-10
PDR900 For Series 900 Transducers
Stand-alone, single channel or for configuration & advanced system diagnostics
946 Vacuum System Controller
Versatile half-rack controller - pressure measurement plus flow & pressure control
307 Bayard-Alpert
Bayard-Alpert full rack controller with optional 2 Convectron gauges
10
-9
10
10
-8
-7
10
-6
10-5
10-4
10-2
10-3
10-1
100
101
102
103
Flow Range 2 x 10-3 sccm to 1,000 SLM Pressure Control Range 1 or 2 Gauges
350 Bayard-Alpert UHV
Bayard-Alpert UHV half rack controller with optional 2 Convectron gauges
358 Micro-Ion®
Micro-Ion half rack with optional 2 convectrons
370 Stabil-Ion®
Dual (sequential) Stabil-Ion full rack controller - high accuracy & repeatability
475 Convectron®
Single controller includes pre-programmed gas curves
937B Vacuum Gauge Controller
10
-10
Supports wide range of sensor technologies (eg cold & hot cathode, Pirani, Piezo & Baratron® gauges)
Optional UHV Gauge Optional 2 Convectron Gauges 1 UHV Gauge Optional 2 Convectron Gauges
1 Micro-Ion Gauge Optional 2 Convectron Gauges
1 or 2 Stabil-Ion Gauge Optional 2 Convectron Gauges
1 Convectron Gauge
Cold Cathode Sensor Heat-Loss Sensor Capacitance Diaphragm & Piezo Diaphragm Gauge
Monitor & Control the Entire Vacuum Process
Control of all vacuum components (eg fore & high vacuum pumps, up to 5 valves & 5 active sensors) Self-detection of connected vacuum devices Visualisation of the entire vacuum system on a large TFT graphic display Intuitive & easy to program with plug-&play compatibility
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Vacvision
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Vacuum Descriptions (Gas & Vapour) Mass Flow, Control & Gauge Verification A mass flow controller (MFC) is a device which sets, measures & controls the flow of a particular gas or liquid. Our range of MKS flow controllers are designed for control of gases. Applications for MFCs include the semiconductor & coating industry, flat panel display production, gas & emission analysis as well as fuel cell technology.
Connector Board
MFCs can be configured for either analog or digital communications. All MFCs have an inlet port, an outlet port, a mass flow sensor & a proportional control valve. The MFC is fitted with a closed loop control system which is given an input signal by the operator (or an external circuit/computer) that it compares to the value from the mass flow sensor & adjusts the proportional valve accordingly to achieve the required flow. The flow rate is specified as a percentage of its calibrated full scale flow & is supplied to the MFC as a voltage signal.
Valve Body Sensor Tube
Sensor Seals
Metal Valve Seal
Metal
MKS integrated products combine mass flow control options with pressure measurement & control - saving space plus helps optimise investment & minimise operation costs by reducing the total number of system components needed.
Valve Plug Bypass
Valve Orifice
Gaseous Flow Rate A gas flow rate describes a pressure change within a defined volume versus time. Common measurement units include the mbar.L/s (millibar x litres/seconds), SCCM (Standard Cubic Centimetres per Minute) & slm = standard litres per minute
Pressure Unit Conversion Table
i
atm.cc/s
Pa.m3/s
mbar.L/s
Torr.L/s
Lusec
SCCM
atm.cc/s
1
0.1
1
0.76
760
60
Pa.m3/s
10
1
10
7.5
7,500
600
mbar.L/s
1
0.1
1
0.76
760
60
Torr.L/s
1.3
1
1,000
78.7
10
1
7.87 x 10-2
1.27 x 10-2
12.7
1
0.13
Lusec
1.3 x 10
SCCM
1.66 x 10-2
-3
1.3 x 10
1.3 -4
1.66 x 10-3
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1.3 x 10
-3
-3
1.66 x 10-2
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Thermal Based MFCs & Meters Gas/Vapour flow control can be either controlled with Mass Flow Controllers (MFC), Mass Flow Meters (MFM) or flow verifiers. Accurate, reliable gas flow delivery & control is crucial to many of today’s advanced processes. Thermal based meters sense the flow by measuring the thermal transfer between a heated tube wall & the gas stream (heat loss being directly proportionate to the gas flow).
Fast & Repeatable Performance G Series
General purpose thermal MFCs & MFMs suitable for most applications elastomer & metal sealed GE50
IP66 Rated for Harsh Conditions I Series
Designed for industrial MFC applications (protect against water & dust) elastomer & metal sealed IE50A
High Performance P Series
Ideal for critical applications where accuracy, repeatability & pressure insensitivity are vital P9B
Full Scale Flow Rate (N2 equivalent)
5 sccm to 50 slm
Accuracy (N2 calibration gas)
±1% of Set Point
Repeatability
±0.3% of Reading
Resolution
0.1% of Full Scale
Leak Integrity - External
<1 x 10-10 scc/sec He
Input/Output Options
Analog & Digital
Full Scale Flow Rate (N2 equivalent)
5 sccm to 50 slm
Accuracy (N2 calibration gas)
±1% of Set Point
Repeatability
±0.3% of Reading
Resolution
0.1% of Full Scale
Leak Integrity - External
<1 x 10-10 scc/sec He
Input/Output Options
Analog & Digital
Full Scale Flow Rate (N2 equivalent)
5 sccm to 50 slm
Accuracy (N2 calibration gas)
±1% of Set Point
Repeatability
±0.3% of Reading
Resolution
0.1% of Full Scale
Leak Integrity - External
<1 x 10-10 scc/sec He
Input/Output Options
Analog & Digital
General Purpose General purpose MFC for diverse applications in research & industry High Flow Rate
General purpose, elastomer sealed, MFC (resistant to liquid & dust)
Industrial use MFC, elastomer sealed (resistant to liquid & dust)
Choice of options to suit your requirements
GE250
Special Applications
IP66 Rated for Harsh Conditions
IE250
IE1000
Full Scale Flow Rate (N2)
100 to 250 slm
100 to 250 slm
250 to 1,000 slm
Accuracy
1% of Set Point
±1% of Set Point
±1% of Set Point
Repeatability
±0.5% of Reading
±0.5% of Reading
±0.5% of Reading
Resolution
0.1% of Reading
0.1% of Reading
0.1% of Reading
Leak Integrity - External
<1 x 10 scc/sec He
<1 x 10 scc/sec He
<1 x 10-9 scc/sec He
Input/Output Options
Analog & Digital
Analog & Digital
Analog & Digital
-9
-9
Certain process vapours & gases require MFC’s of a special design specific to the material plus process conditions - requiring flow control at elevated temperatures &/or low pressure drop conditions given the source material characteristics Contact us for further information regarding your specific needs
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1640A
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Wide range of analytical, enviro, PVD & coating General Purpose & applications MFM versions are Compact MFC available MF-1
Full Scale Flow Rate (N2 equivalent)
10 to 50,000 sccm
Accuracy (N2 calibration gas)
+0.2% of Full Scale
Repeatability
±0.2% of Full Scale
Resolution
0.1% of Full Scale
Leak Integrity - External
<1 x 10-9 scc/sec He
Input/Output Options
Analog & Digital
In-Situ Mass Flow Verifiers Provide fast, accurate verification of MFC & MFM performance - fully integrated diagnostic instruments that measure a pressure rate-of-rise into a known volume at a known temp to determine mass flow (±1% of Reading)
Fully Integrated Diagnostics
Tru-Flo MFV consists of a small gas volume, MKS Baratron pressure sensor, shut off valves & control electronics combined into a single compact package Provides in situ verification of MFC performance on semiconductor process tools
Tru-Flo
Fast & Accurate Verification of MFCs & MFMs HA-MFV (High Accuracy-Mass Flow Verifier) is designed for use on process tools Gas flows are verified significantly better than older rate-of-rise devices or process chamber rate-of-rise methods 1HA-MFV
Flow Ratio Controllers Delta Series
Critical process control instrument providing the latest in gas flow ratio measurement & control technology Provides the ability to distribute gas or gas mixtures to 2, 3 & 4 different zones respectively Divides & controls mixed process gas flows to multiple chambers or zones at ratios specified by the user Widely used in a variety of flow splitting applications such as etching, stripping & PECVD
General Purpose Delta II
Delta III
Delta IV
Electronic Pressure Controller
Electronic Pressure Controller with Mass-Flo® Meter
Integrated Pressure Controller
Integrated Pressure Controller with MFM
640B
649B
πPC
πPC with MFM
Pressure Range (Full Scale)
10 mbar to 6.9 bar
10 to 1,300 mbar
1,300 mbar to 6.9 bar
1,300 mbar to 6.9 bar
Orifice Range (Full Scale)
50 to 50,000 sccm
50 to 5,000 sccm
50 to 50,000 sccm
50 to 30,000 sccm
Pressure Controllers Used to contol pressure/vacuum applications where precise pressure control is required
Reading Accuracy Conrol Range
±1.0% of Reading ±0.5% of Reading ±0.5% of Reading >2 to 100% of Full Scale >2 to 100% of Full Scale >2 to 100% of Full Scale
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±1.0% of Reading >2 to 100% of Full Scale
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Vacuum-Gauge Descriptions Gas Analysis Mass Spectrometry Vacuum Quality Monitor (VQM) Systems Worldâ&#x20AC;&#x2122;s Fastest, Lowest Power Mass Spectrometer Full data collection, spectral deconvolution & data logging Ultimate vacuum range (mbar): 10-5 to <10-10 Mass Range (& Scan Time): 1 to 145 amu (in 85 msec); 1 to 300 amu (in 120 msec) Consists of auto-resonant ion trap mass spectrometer gauge, VQM controller & VQM viewer software Smaller, easier to calibrate & 20 times faster than traditional Quadrupole RGAs Instant access to critical measurement information including the 10 most prevalent gases in normalised, percentage & absolute values plus total & partial pressure trend graphs
835 VQM System
Extends Pressure Range of 835 VQM Up to 4 mbar Ultimate vacuum range (mbar): 4 to 10-10 Applications include monitoring gas reactions, detecting contaminants, controlling the amount of reactive gas introduced, leak detection, detecting when to start a process Calibration completed in seconds with just a few clicks of the mouse Intuitive graphical user interface software
835 VQM Differential Pump System
Residual Gas Analysers - Quadrupole General Purpose RGA
e-Vision 2
Ranges (amu) 100 or 200 Maximum data acquisition speed <3ms per point for analog scans Max operating pressure 10-4 Minimum detectable partial pressure: Faraday (2.6 x 10-11 mbar), Multiplier (6.7 x 10-14 mbar) Dedicated real-time acquisition processor with web-server interface Applications include leak detection of vacuum lines, welds & seals, vacuum diagnostics, pump down monitoring, chamber bake out monitoring, monitor cryo-pump performance
Stability, Accuracy & Speed Come Together
Ranges (amu) 100, 200 or 300 Collects data at <3 milli-second speeds per data point for analog scanning Max operating pressure 10-4 Min detectable partial pressure: Faraday (2 x 10-11 mbar), Microchannel plate (5 x 10-14 mbar) Ideal for applications where knowing the contents of your chamber is critical - semiconductor manufacturing, large scale coating tools, ultra-high vacuum & harsh environments
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Microvision 2
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Non-Dispersive InfraRed (NDIR ) Atmospheric Quadrupole Mas Spec Work beyond the limits of conventional quadrupole MS technology - more easily detect & monitor trace gases for extreme detection capability The proven quadrupole MS platform utilises patented V-lens ion optics with a double-focussing & deflection capability (producing a consistently low baseline for any gas species - enabling trace level detection with greater clarity & confidence) Ideal for on-line monitoring & analysis of gases & gas mixtures - including trace contaminants in process gases, solvent vapours, hydrocarbons, atmospheric & inorganic gas species (including corrosives), freons & noble gases Easy to install & operate - features automatic start-up & shut-down routines plus built-in vacuum & heater inter-locking for system protection Versatile, compact design plus powerful automatable software control
CIRRUS 3XD
Fourier Transform InfraRed Spectroscopy (FTIR) Real Time, Continuous Detection of Toxic Gases
Self-contained, ultra-sensitive, FTIR based gas analyser that rapidly detects toxic gases & chemical warfare agents (with no false positive alarms & >97% detection) Single-digit parts per billion (ppb) detection of a broad range of threats Rapid response - typically <20 seconds Ethernet connectivity for remote monitoring Compact & rugged design for reliable performance AIRGARDPlus CWA/TIC
Complete Continuous Emissions Monitoring Systems (CEMS) Designed for integration with complete continuous emissions monitoring systems to measure gaseous emissions from stationary sources such as waste incinerators, power plants, cement kilns, large combustion plants, turbine engines Meets DIN EN 15267-3 standard Spectral Resolution 0.5 cm-1 Directly analyses hot, wet effluent gas streams without the need for sample pre-treatment Permanent reference calibration spectra (all but eliminates costly calibration gas cylinders)
MGS300 Gas Component
Certification Range
NH3
Supplementary Range 1
0 to 10 mg/m
3
0 to 75 mg/m
CO
0 to 75 mg/m
3
SO2
0 to 75 mg/m
3
NO
0 to 200 mg/m3
NO2
3
0 to 300 mg/m
3
0 to 300 mg/m
3
Supplementary Range 2
Detection Limit
-
0.35 ppm
0 to 1,500 mg/m
3
0.50 ppm
0 to 2,000 mg/m
3
0.60 ppm
0 to 400 mg/m3
0 to 1,500 mg/m3
0.50 ppm
0 to 50 mg/m3
0 to 100 mg/m3
0 to 1,000 mg/m3
0.40 ppm
HCI
0 to 15 mg/m
0 to 200 mg/m
0.20 ppm
0 to 90 mg/m
3
HF
0 to 3 mg/m
3
0 to 10 mg/m
3
-
CH4
0 to 15 mg/m
0 to 50 mg/m
3
0 to 500 mg/m
CO2
0 to 25%
H2O
0 to 40%
N2O
0 to 50 mg/m
3
3
-
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0.25 ppm 3
-
3
3
0.025%
-
0 to 100 mg/m
3
26
0 to 500 mg/m
0.30 ppm
0.25% 3
0.10 ppm
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Vacuum Gauge Descriptions Thin Film Systems, Nano Fabrication & Materials Physical Vapour Deposition (PVD) Compact Sputtering or Thermal Evaporation Thin Film Deposition System
Entry level deposition system used in university, government & industrial R&D labs Thermal evaporation system (with up to 4x Boat Sources) or Magnetron Sputter sources Wet or dry rough pumping, diffusion or turbo pump high vacuum pumping options available Simple PLC-based touch screen system control (with fully automatic pump/vent recipes) 45 L process chamber volume 6.6 x 10-7 mbar base pressure Film Thickness Control (Closed Loop PID Control) Nano 36
Popular R&D Thin Film Deposition Tool Mid-level, affordable deposition system for university, industrial & government lab R&D, OLED/PLED & organic electronics applications, photovoltaics & semiconductor devices Modular deposition sources including Thermal Evaporation, Magnetron Sputter Sources (RF, DC, Pulsed DC), electron beam & organic heaters Superior chamber design, advanced programming software & automatic substrate loading make this best of class Base Pressure: Down to 6.6 x 10-8 mbar Standard Vacuum Pumping: 685 L/sec Turbo Pump or 1500 L/sec Cryo Pump available 81 L process chamber volume
PVD 75 Pro Line
Chemical Vapour Deposition (CVD) Carbon Nanotube & Graphene Thermal CVD Solutions
Typical applications include Chemical Vapor Deposition in R&D labs, for example carbon nanostructure synthesis of Graphene, vertically aligned carbon nanotubes & silicon nano wires Easy PC interface, real time control, programmable experiment, safety alarm alerts Mass flow controllers for common gasses (Ar, H2, CH4, C2H4, N2, etc) One zone temperature 1,000°C furnace, resistance heating Constant temperature reaction zone (±2%) Quartz reaction tube 2 x 5 cm (standard CVD Cube) CVD Cube
Plasma Enhanced Chemical Vapour Deposition (PECVD) Wafer-Scale Deposition of Carbon Nanotubes & Graphene
Fast response heater, up to 300 °C/minute ramp rates Thermal CVD, plasma enhanced CVD, thermal gradient control Excellent reproducibility Closed loop infrared wafer temperature control Advanced design - Plasma with frequency & duty cycle control plus optimised geometry for uniformity Automatic process control, easy recipe editing, integrated process camera Deposit all Types of Nanotubes and Graphene for your Applications
BM Pro
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300 mm Wafer-Scale Production of Carbon Nanotubes & Graphene
1050°C substrate heater Uniform gas delivery through showerhead Precise precursor concentration control Wafer rotation during process ARGUS real-time wafer temperature mapping Optical ports at normal incidence to wafer BM 300
Atomic Layer Deposition (ALD) Thermal or Plasma Enhanced Centrally-pumped chamber for enhanced uniformity & precursor dispersion Expandable solid, liquid & gas phase precursor delivery Substrate heating up to 500°C - heated chamber, foreline & delivery lines to 200°C Heated (150°C) capacitance manometer for pressure measurement Scalable design allows for future expansion & upgrades PC-based software enabling manual & automatic recipe control Applications include university, industrial & Government lab R&D, semiconductor, photovoltaics, OLED/organic electronics
ALD 150LX (Plasma Enhanced)
ALD 150LE (Thermal)
DRIE & RIE Etching Systems for R&D Applications Flarion Series plasma reactors are designed for Deep Reactive Ion Etching (DRIE), Reactive Ion Etching (RIE), Plasma-Enhanced Chemical Vapour Deposition (PECVD) or wherever a large, high density plasma is required for surface modification
Max power from 100 W to 1,000 W - continuous or pulsed Modes with or without Faraday filter to modify capacitive coupling effects Samples up to 125 mm diameter or custom size/shape Heating (800°C) or cooling with temp control - vertical or horizontal cylindricals Vacuum to 10-7 mbar with turbomolecular pump backed with rotary vane or dry scroll mechanical pump Flarion Series
Organic Thin Film Deposition & Metalisation System
Designed Specifically for Organic R&D Applications Standard configurations with internal glovebox compatible with up to 100 mm x 100 mm square or 150 mm diameter substrates (up to 350°C heating & cooling, glovebox option available) Offers both organic & metal deposition capabilities in a single chamber Complete glovebox R&D thin film deposition tool for water/O2 sensitive devices Modular deposition sources including Thermal Evaporation, Magnetron Sputter sources & Organic heaters Applications include organic semiconductor, nanoscale devices, metal cathode deposition, organic films, Organic Electronics & Photovoltaics (OPV), OLED displays & lighting, organic electronics, MEMS/NEMS
Mini Spectros 100
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Thin Film System Components Deposition sources are components that facilitate a physical or chemical change in a base material in order to make it useful for creating thin films - typical sources include magnetron sputtering cathodes, thermal evaporation sources, electron beam evaporation sources, ion beam sources, etc
Torus Magnetron Sputtering Sources
Isoflux Inverted Magnetrons (3D Sputtering)
Thin Film Deposition System Materials
Thermal Evaporation Sources
Sputter Targets
Sputter Targets
Precious metals, ceramics, oxides, alloys & custom mixtures Material Certification & US MSDS (Australian MSDS on request) Evaporation Materials
Pellets, Pieces & Wire
Vast range of thermal evaporation & E-beam materials Various forms including pellets, pieces, wire, canes, plated rods, etc Material Certification
Wire
Thermal Boat Sources
Boats, Boxes, Crucibles & Filaments
Pure materials, evaporation sources & crucible liners for use in both thermal & E-beam evaporation plus sputter deposition processes Pure elements, compounds, alloys, ceramics & mixtures in a variety of shapes, sizes & purities We also offer sputter target bonding & precious metals reclamation services - saving you time & money
Crucibles
Nanomaterials Carbon Alltropes
Carbon Nanotubes, Fullerenes C60, C70, .., graphite, graphene nanoplatelets, monolayer graphene layer, graphene oxide, reduced graphene oxide, carbon black Applications include field emission, conductive plastics, energy storage, thermal materials, fibers & fabrics, biomedical, orthopedic prostheses, refractory materials, lubricants, aerospace applications
Quantum Dots
CdTe, CdSe/ZnS, ZnCdSeS, ZnO, ZnCuInS/ZnS, ZnCdSe/ZnS Applications include colours in stained glasses, composites, laser diodes, Led’s, optical devices, absorber mirrors, photovoltaics
Nanowires
Cobalt, lead, nickel, copper, silver, titanium, aluminum, gold, lead zirconate titanate, lead titanate, manganese oxide, vanadium oxide, tungsten oxide Applications include microelectronics, solar cells, composites, sensors, optical devices, ferromagnetic catalysis, cell manipulation, anti-fungal
Vacuum Gauge Descriptions Recirculating Chillers Perfect for PVD, Etching, Sputtering, Wet Benches
High cooling capacities with strong pumps Choose from 16 models - individually configured Temp range: -20° to 80°C Cooling capacity: 0.5 to 10.0 kW (at 20°C) Flow rate: 20 to 33 L/minute Optional integrated heater (up to 12 kW power)
FC 1600 SC2500w
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Gauge Descriptions PlasmaVacuum & Surface Modification MKS is the leading manufacturer of high reliability, compact, solid state, mid to extended (VHF) frequency RF power generators, impedance matching networks & plasma metrology, RF amplifiers for MRI equipment plus pulsed & continuous DC power generators in power levels up to 60 kW
Direct Current Power Generators Optima® series offer process versatility & performance via a variety of output regulation modes, user adjustable settings & control options
OPT 400
Power Output
5 to 100 kW
Max Output Voltage
800 V
Power Limits
5.25 to 63 kW
Current Limits
5 to 126 A
Linearity/Accuracy
±0.1%
Regulation Modes
Volts, Amps, Watts
Power Output Max Output Voltage Power Limits Current Limits Linearity/Accuracy Regulation Modes
5 to 100 kW 800 V 5.25 to 63 kW 5 to 126 A ±0.1% Volts, Amps, Watts
Pulsed Direct Current Power Generators RPDG series provide asymmetric bipolar & unipolar pulsed DC power while retaining accuracy, repeatability & flexibility
RPDG 200
Radio Frequency Power Generators High Power Density, Exceptional Stability & Generous Power Margins Cover the full range of frequencies (from 2MHz to VHF) & power ranges (from 300 to 13,000 W) Response time to power set point changes & process transitions is 500 µS (advanced RF plasma generation & control for low cost & high yield in the most demanding thin film processing applications) Applications include semiconductor & thin film (etch, deposition), solar cells (PECVD, PVD), LED (deposition, etch)
Choice of 3 models
Elite™ products feature excellent stability, generous power margins & field proven reliability plus can be enhanced with various pulse capabilities - Rated Power Outlet: 1 to 750 W - Frequency: 13.56 MHz - Stability & Accuracy: ±0.005% - Dynamic Power Range: 200 to 750 W
SurePower® platform: - Most advanced class of 13.56 MHz generators commercially available - Highest reliability, reproducibility & accuracy of any generator in the marketplace today - Power levels from 3.5 to 13.0 kW
GHW platform offers power accuracy, repeatability & high yield: - Rated Power Outlet: 1,250 to 5,000 W - Frequency: 13.56 MHz - Stability & Accuracy: ±0.005% - Dynamic Power Range: 10 to 5,000 W
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Microwave Power Generators Designed for Demanding Semiconductor Fabrication & Plasma Applications Cost effective, field-proven & high performance family of microwave generators for demanding semiconductor fabrication
Power Output
180 W to 6.0 kW
Frequency
2440 to 2470 MHz
Regulation
>1% of output power
Output Accuracy
Âą1.5%
Ripple
Âą1% of output power
AX2500
Air Cooled & State-of-the-Art Generator
SG 524
Small form factor with solid state design 48 cm rack-mountable for easy integration Advanced high-frequency transistor design for precision power & output frequency control Integrates a dynamic frequency tuning capability to minimise the ratio of reverse to forwarded power Withstands up to 100% reverse power conditions for optimum reliability
Microwave Source & Generator Packages Rugged & reliable switch mode power supplies for demanding industrial applications Compact generators up to 3 kW in a 48 cm standard rack with a remote head & integrated isolator Equipped with reflected power detection Proven switch mode technology Extremely compact & light weight
AL20000
915 MHz Industrial Microwave Generators
Provides 15 to 75 kW power Continuous powerline control Safety interlocks A variety of interface options (plus optional remote control) Switch mode power supply systems with continuous power control Rugged, light weight & modular microwave generator systems
GS Series
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Gauge Descriptions Gloveboxes & Vacuum Anhydrous Solvent Purification Gloveboxes Modular Platform Design - HE Series Easily expand existing gloveboxes to meet increasing working space requirements Expansion features include additional antechambers for thru flow work processes, spin coater, cold storage freezers, process vacuum ovens & furnaces with full line of accessories Gas purifiers provide a <1ppm O2 & H2O Inert Atmosphere required for a multitude of air sensitive applications 304 type Stainless Steel tubing material
PurLab HE 4GE 1800
Anhydrous Solvent Purification Anhydrous Solvent Purification is safe (no sodium & no heat) plus has no recirculated water (environmentally friendly)
Designed for Labs with Multiple Users Ideal when requiring easy access to more than one anhydrous solvent Multi-way valve design is regarded the most efficient & safest dispensing system on the market Facilitates proper air free dispensing techniques using our integrated manifold system Choice of 24/40, 14/20, 29/32 stainless steel glassware adaptors as standard (other connections available) Users can operate air-free dispensing system simultaneously with no cross diffusion of solvent Large capacity 19 L reservoirs with leak tight screw cap & Swagelok quick disconnect valves Available in free standing, bench top or wall mounted models (plus designed to mount on top of flammable storage cabinets and inside existing or new fume hoods) PurSolv MD 5
PurSolv MD 3
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Vacuum Gauge Descriptions Freeze Drying All Martin Christ freeze dryers are modular in design allowing added features to be easily included - choose the right instrument for your needs from the table below.
Routine Lab
Ice Condenser Capacity
Aqueous
2 kg
Alpha 1-2 LDplus
4 kg
Alpha 1-4 LDplus
Advanced
Pilot
Production Aqueous & Solvent
Solvent
Aqueous
Solvent
Aqueous & Solvent
Alpha 2-4 LDplus
Alpha 1-4 LSCplus
Alpha 2-4 LSCplus
Epsilon 1 & 2-4 LSCplus Epsilon 2-6 LSCplus
6 kg Beta 1-8 LDplus
8 kg
Beta 2-8 LDplus
Beta 2-8 LSCplus
Beta 1-8 LSCplus
Epsilon 2-10 LSCplus
10 kg 16 kg
Gamma 1-16 LSCplus
Gamma 2-16 LSCplus
24 kg
Delta 1-24 LSCplus
Delta 2-24 LSCplus
20 to >1,000 kg
Customised
Routine Lab Applications Entry Level Systems (day-to-day freeze drying applications) Alpha 1-4 LDplus
Capacity Ice Condenser
Alpha 2-4 LDplus
Beta 1-8 LDplus
2.5 to 8 kg
Performance
2 to 6 kg/hour
Temp
- Aqueous
-55°C
- Solvent
-85°C
Drying Outside Ice Chamber
3 to 5 Shelves ø 200 to 360 mm ≈920 cm2 to 0.5 m2
Product Shelves Drying in Injection Vials with Stoppering
2 to 4 Shelves ø 200 to 250 mm
Base unit + 3 shelves & 8 ports
Base unit + stoppering device, 2 shelves & 8 ports
Base unit + 5 shelves
Base unit + 8 ports
Base unit + ampoule manifold
Base unit + 3 shelves & 24 ports
≈557cm2 to 0.18m2 Drying in Round Bottom Flasks
8 to 24 Pieces
Many more chamber configurations available
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Advanced Applications More Advanced/Critical Applications (such as pharmaceutical & microbiology) Alpha 1-4 LSCplus Capacity Ice Condenser
Beta 2-8 LSCplus
Gamma 1-16 LSCplus
Delta 2-24 LSCplus
4 to 24 kg
Performance
4 to 18 kg/hour
Temp
- Aqueous
-55°C
- Solvent
-85°C
Chamber Volume Inside Condenser & Single Chamber
6.5 to 45 L 1 to 10 Shelves
Base unit + 5 heated shelves + 12 ports
Base unit + manifold for 8 ports
Base unit + 2 drying chambers
Base unit + stoppering device & 4 heated shelves
ø 200 mm ≈0.031 to 0.155 m2
Product Shelves Vials Inside with Stoppering & Single Chamber Drying in Round Bottom Flasks/Filters
2 to 4 Shelves ø 200 to 250 mm ≈0.031 to 0.18 m2 12/24/36 Pieces
Base unit + manifold Base unit + stoppering Base unit + 5 heated Base unit + 10 heated for 20 ports device & 5 heated shelves shelves & 12 ports shelves
Many more chamber configurations available
LyoCube 4-8 LSCplus
Fast front loading chamber avoids sample melting - compatible with Alpha 1/2-4 LSCplus & Beta 1/2-8 LSCplus 58 L chamber with massive shelf area up to 0.61 m2 Heated shelves with Wireless Shelf Technology (faster drying time & no cable connections) One temperature or LyoRx sensor per shelf 1 to 8 usable shelf options (with MPT or Deep-Well Plates) - total shelf area 0.08 to 0.61 m2
Unique Wireless Heated Shelving
Alpha 1-14 LSCplus with Lyocube 4-8 LSCplus (5 heated shelves)
5 heated shelves (more options available)
Up to 65% saving in drying time via unique Wireless Shelf Technology (no cables) Configuration option compatible with all Alpha, Beta, Gamma & Delta LSCplus units Temperature of each shelf is individually controlled (± 1ᵒ Kelvin)
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Chart illustrating the drying time of pure water saved using heated shelves v’s unheated shelves
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Pilot Applications Vacuum Gauge Descriptions From routine drying operations to process optimisation tasks to drying solid or liquid products to meeting stringent pharmaceutical demands
Ice Condenser
Capacity
4 to 10 kg
Performance
3 to 10 kg/hour
Temp
-55° to -85°C
Chamber Volume
40 to 50 L
Shelf Area
0.1081 to 0.98 m2
Shelf Temperature
-70° to +60°C
Shelf Temperature Accuracy
±1°C
Epsilon 2-6 LSCplus
Epsilon 1-4 LSCplus
Production Vacuum GaugeApplications Descriptions Single or Double Chamber Systems for Bulk or Vial Drying
Ice condenser capacities from 20 to > 1,000 kg Freezing & drying in the drying chamber SIP/H2O2 disinfection, CIP, IQ/OQ, etc Process integration (loading systems, peripheral equipment) GAMP5 & CFR21 Part II compliant We can design custom-build systems to meet your needs - plus install & provide training for your staff Extensive pharmaceutical reference sites Unique wireless product temperature probes
Vacuum Gauge Descriptions Rotational Vacuum Concentrators (RVC) Powerful Benchtop Models with Small Footprint
Modular vacuum pumps & cold traps tailored for your specific application Contamination free (hermetically sealed magnetic drive technology) Reproducible results (integrated vacuum control & pressure gauge) Ultra quiet concentrator (from a low 40dBA) Adjustable rotor speeds Temperature range +30° to +80° Sample Types - Aqueous/Solvent & HCL Container volume 0.2 to 500 mL
2-33 CDplus (with infrared heating)
2-18 CDplus
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Maintenance & Repair Services John Morris Vacuum provides an array of capabilities for the preventative maintenance & repair of every brand we sell. All of our service engineers are tertiary qualified (electrical, mechanical, refrigeration) and attend regular manufacturer conducted factory training programmes to maintain their technical expertise.
Areas of Expertise
Service Agreements Breakdown Service Training & Technical Support Extended Warranties
Loan Equipment Trade-In Services Testing & Commissioning Calibration & Verification
Vacuum Pump Servicing John Morris Vacuum services all types of vacuum pumps (turbomolecular, rotary vane, diaphragm, screw, roots, etc) for all brands
Mass Flow Controller, Gas Flow & Vacuum Gauge Calibration Our state-of-the-art MKS calibration bench is appointed with multiple NIST traceable standards providing accuracy to 0.02% of reading with a calibration range from 0.0005 to 1000 Torr. We are able to calibrate most sensor technologies including Baratron, Capacitive, Piezo & Pirani. Our specialised facilities are the only ones of their kind in the southern hemisphere
Our environmentally controlled facilities include: NATA certified reference gases State-of-the-art CO2 analysers NIST traceable MKS mass flow meters
Gas source solenoid actuators (200-15,000 ppm) MKS 247 4-channel MFC controller
We offer advanced service facilities nationwide - providing fast local support to ensure your equipment is running at optimum performance
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Installation & Customisation Our trained engineers can install your equipment plus offer training to your staff at your premises. For larger projects requiring purpose-built installation or modifications to existing infrastructure, our team can work with you to co-ordinate external contractors to strict deadlines & specifications in delivering customised instrumentation & solutions to meet your needs. Our customised solutions include vacuum systems, Thin Film Deposition systems, freeze drying systems, complete laboratory vacuum fit-out (including pumps, tubing, fittings, chillers, taps, instrumentation & integration with other contractors).
John Morris was chosen to install a custom-designed Kurt J Lesker CMS-18 Magnetron Sputtering system at The Robinson Research Institute - used for fabricating magnetic sensors/devices
John Morris collaborated with other contractors to deliver a complete fit-out of their Chemistry Buildings (Levels 4 & 5). Over a 3 month installation period we partnered with various staff & external contractors in designing & installing 69 vacuum pumps, 47 fume cupboards, 22 benches, 254 vacuum valves, 750m of vacuum tubing, 700 elbows, 200 Tee pieces. We are proud the project achieved ‘Perfect Delivery’.
“
Testimonial The project accomplished ‘Perfect Delivery’ which is measured on the following criteria: 1. 2. 3. 4.
Achieve handover by date of PC Zero Defects O&M Manuals and User Training within 1 week of PC Key Client Values
a. b. c.
Team Collaboration Defect Free due to restricted access post PC Deliver project on time ready for semester classes
Look forward to working together again soon. ISIS Chemistry Team
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More Than Just The ‘Box’ As you face increasing pressures (budget, time & results), the success of our offering is based on more than just supplying you with the‘box’ or its price.
We add value by: Fully supporting our entire product range throughout its operational life Supplying products across all industries from premier global manufacturers Providing you with accurate & in-depth product information & solutions
“
Testimonial The service received from John Morris Scientific has been second to none. Immediate responses to enquiries, easy trial of products and professionalism have all made our choice to deal with them a pleasure. We couldn’t have been happier with the standard of service we received and look forward to continuing the relationship in the future. University of Melbourne
All too often we hear horror stories where customers have acquired items from other sources & have been: Abandoned on service request Had goods lost in transit or blocked by customs Squandered money on the wrong solution due to incorrect recommendations Wasted precious team resources attempting to install or utilise assets without qualified & available local support
At John Morris we focus on satisfying your end-to-end needs … today & over the longer term.
Solutions Sales
We consult in designing tailored solutions to satisfy your individual requirements to complex problems We supply an extensive range of instrumentation across a wide selection of industries from premium global manufacturers
Service
We provide Service Agreements & repair facilities on all products we sell plus installation & customisation
Support
With a proud heritage spanning over 50 years, we stand behind each & every product we sell
We offer more than just the ‘box’ – we offer the full package
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Whilst John Morris Vacuum has taken every care to ensure the accuracy of information contained within this Guide, no responsibility for errors or omissions is accepted. All trademarks, servicemarks, tradenames, company names or logos of third parties are and remain the property of such parties.
We offer more than 'just the box' Solutions
Sales
Service
Support
At John Morris Vacuum we offer more than just the product - we provide the full package sales and servicing of instrumentation plus design tailored solutions to meet your needs.
Australia Address Free Call Enquiries Email Web
61-63 Victoria Avenue Chatswood NSW 2067 Australia 1800 251 799 +61 (0) 2 9496 4200 info@johnmorris.com.au www.johnmorrisgroup.com
New Zealand Address Toll Free Enquiries Email Web
78 Wellesley Street Auckland NZ 1010 0800 651 700 +64 (0) 9 366 3999 info@jms.co.nz www.johnmorrisgroup.com
John Morris Vacuum is a division of John Morris Scientific
Over 50 Years of Personal Service