V OLUME 3 I SSUE
3
FA L L
20 0 1
$ 5. 00 U S
Yield Management
S O L U T I O N S Yield Acceleration Strategies for the Semiconductor Industry
SPECIAL ISSUE: ISSUE: A Focus on Lithography 15 15 COVER COVER STORY STORY — — A N A AUTOMATED UTOMATED M METHOD ETHOD FOR FOR AN O OVERLA VERLAY Y SAMPLE AMPLE P LAN LAN O OPTIMIZATION PTIMIZATION 38 38 E EFFECTIVE FFECTIVE D DEFECT EFECT M MANAGEMENT ANAGEMENT IN IN THE LITHOGRAPHY ITHOGRAPHY CELL CELL THE L 50 SPECTROSCOPIC PECTROSCOPIC C CRITICAL RITICAL DIMENSION IMENSION (SCD) METROLOGY ETROLOGY FOR FOR CD CD C CONTROL ONTROL AND STEPPER TEPPER CHARACTERIZATION HARACTERIZATION AND S