300 mm S
P
E
C
I
A
L
F
O
C
U
S
Challenges for the Sub-0.18 µm Era by Didier Lamouche, ALTIS Semiconductor
The primary challenge for the sub-0.18 µm era lies in bringing the semiconductor industry to maturity. In this paper the concept of a mature industry will be discussed, the gaps between the present state of our industry and a mature version will be explored, and suggestions for how to drive the maturity of the industry will be offered.
Familiar classical predictions of the challenges of the sub-0.18 µm era include the following:
out of the door and accelerate the yield curves, it is worthwhile to look ahead to see what challenges accompany sub-0.18 µm technology.
• Lithography will push the limits of optical resolution.
Our immature industr y
• Plasma etch and deposition will be challenged by issues of aspect ratio and selectivity. • Planarization will be a key challenge, as CMP becomes the pervasive technique, and brings issues of uniformity and end point control.
Figure 1 illustrates how the industry has been progressing since 1993. This chart shows the area of silicon needed to make up 256 MB of memory, whether from sixteen 16 MB chips, (Luna E and the ES chips, 1993-1997); four 64 MB chips (Prism, La Tierra and Viper, 1997-1999), or one 256 MB chip (Cromus, 1999). The silicon area needed for 256 MB of DRAM is shrinking rapidly—and the latest generation of chips is a factor of two smaller than Cromus.
• Silicon area efficiency will emerge as an important issue, as feature size continues to decrease, and the I/O density begins to limit the shrinking of the overall device. While each of these technical arguments has merit, the more general topic of the maturity of the industry has received less attention. For that reason, this article will bypass the classical arguments and focus on the larger perspective. To discuss the challenges for sub-0.18 µm device manufacturing does not imply that all problems for the pre-0.18 µm technology node have been solved. Most fabs today still struggle to scale the reliability curves for technologies that remain above 0.18 µm. As the industry works to get more chips 54
Spring 2001
Yield Management Solutions
F i g u re 1. The sil icon area re q u i red to comprise 256MB of DRA M using 16MB, 64MB or 256MB chi ps has shrunk dramat ically since 1993.